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arXiv:1206.1138 · Superconductor Science and Technology

Dielectric losses in multi-layer Josephson junction qubits

David Gunnarsson, J.-M. Pirkkalainen, Jian Li, Gheorghe Sorin Paraoanu, Pertti Juhani Hakonen, Mika E. T. Sillanpää, Mika Prunnila

Published Jul 1, 2013• 23 citations
arXivHTMLPDF

Abstract

We have measured the excited state lifetimes in Josephson junction phase and transmon qubits, all of which were fabricated with the same scalable multi-layer process. We have compared the lifetimes of phase qubits before and after removal of the isolating dielectric, SiN x , and find a fourfold improvement of the relaxation time after the removal. Together with the results from the transmon qubit and measurements on coplanar waveguide resonators, these measurements indicate that the lifetimes are limited by losses from the dielectric constituents of the qubits. We have extracted the individual loss contributions from the dielectrics in the tunnel junction barrier, AlO x , the isolating dielectric, SiN x , and the substrate, Si/SiO 2 , by weighting the total loss with the parts of the electric field over the different dielectric materials. Our results agree well with and complement the findings from other studies, demonstrating that superconducting qubits can be used as a reliable tool for high-frequency characterization of dielectric materials. We conclude with a discussion of how changes in design and material choice could improve qubit lifetimes by up to a factor of 4.

DOI
10.1088/0953-2048/26/8/085010

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We have measured the excited state lifetimes in Josephson junction phase and transmon qubits, all of which were fabricated with the same scalable multi-layer process. We have compared the lifetimes of phase qubits before and after removal of the isolating dielectric, SiN x , and find a fourfold improvement of the relaxation time after the removal. Together with the results from the transmon qubit and measurements on coplanar waveguide resonators, these measurements indicate that the lifetimes are limited by losses from the dielectric constituents of the qubits. We have extracted the individual loss contributions from the dielectrics in the tunnel junction barrier, AlO x , the isolating dielectric, SiN x , and the substrate, Si/SiO 2 , by weighting the total loss with the parts of the electric field over the different dielectric materials. Our results agree well with and complement the findings from other studies, demonstrating that superconducting qubits can be used as a reliable tool for high-frequency characterization of dielectric materials. We conclude with a discussion of how changes in design and material choice could improve qubit lifetimes by up to a factor of 4.
Josephson junctions form the essential non-linearity for almost all superconducting qubits. The junction is formed when two superconducting electrodes come within ∼1 nm of each other. Although the capacitance of these electrodes is a small fraction of the total qubit capacitance, the nearby electric fields are more concentrated in dielectric surfaces and can contribute substantially to the total dissipation. We have developed a technique to experimentally investigate the effect of these electrodes on the quality of superconducting devices. We use λ/4 coplanar waveguide resonators to emulate lumped qubit capacitors. We add a variable number of these electrodes to the capacitive end of these resonators and measure how the additional loss scales with the number of electrodes. We then reduce this loss with fabrication techniques that limit the amount of lossy dielectrics. We then use these techniques for the fabrication of Xmon qubits on a silicon substrate to improve their energy relaxation times by a factor of 5.
Dielectric loss from two-level systems (TLSs) formed by local defects have shown a significant impact on the qubit coherence time. These defects can originate in the insulation material for superconducting wires isolation or in the Josephson junction tunnel barrier material. Due to the complexity of the qubit circuit fabrication process, identifying the contribution from each decoherence source is challenging. In an effort to address this issue, we have developed superconducting qubit that consists of full epitaxially-grown NbN/AlN/NbN Josephson junctions in NbN coplanar waveguide (CPW) resonator circuit. The dielectric loss introduced from TLFs in tunnel junction barrier has been largely reduced due to the unique epitaxial feature of the tunnel junction. The quality factor Qi of the CPW resonator was measured and the dielectric loss tanδ is 3×10−4. The relaxation time inferred from the measured resonator quality factor was comparable to the qubit relaxation time.
Dielectric loss from two-level states is shown to be a dominant decoherence source in superconducting quantum bits. Depending on the qubit design, dielectric loss from insulating materials or the tunnel junction can lead to short coherence times. We show that a variety of microwave and qubit measurements are well modeled by loss from resonant absorption of two-level defects. Our results demonstrate that this loss can be significantly reduced by using better dielectrics and fabricating junctions of small area . With a redesigned phase qubit employing low-loss dielectrics, the energy relaxation rate has been improved by a factor of 20, opening up the possibility of multiqubit gates and algorithms.
Dielectric loss is one of the major decoherence sources of superconducting qubits. Contemporary high-coherence superconducting qubits are formed by material systems mostly consisting of superconducting films on substrate with low dielectric loss, where the loss mainly originates from the surfaces and interfaces. Among the multiple candidates for material systems, a combination of titanium nitride (TiN\mathrm{Ti}\mathrm{N}TiN) film and sapphire substrate has good potential because of its chemical stability against oxidization and its high quality at interfaces. In this work, we report a TiN\mathrm{Ti}\mathrm{N}TiN film deposited onto sapphire substrate achieving low dielectric loss at the material interface. Through the systematic characterizations of a series of transmon qubits fabricated with identical batches of TiN\mathrm{Ti}\mathrm{N}TiN base layers but different geometries of qubit shunting capacitors with various participation ratios of the material interface, we quantitatively extract the loss-tangent value at the substrate-metal interface, which is smaller than $8.9\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}4}$ in a 1-nm disordered layer, and a limiting quality factor of about 7.3 million. By optimizing the interface participation ratio of the two-dimensional (2D) transmon qubit, we reproducibly achieve a quality factor of 5.7 million on average. The best 2D qubits show lifetimes of up to $300\phantom{\rule{0.2em}{0ex}}\ensuremath{\mu}\mathrm{s}$ and quality factors achieving 8.1 million. We demonstrate that TiN\mathrm{Ti}\mathrm{N}TiN film on sapphire substrate is an ideal material system for high-coherence superconducting qubits. Our analyses further suggest that the interface dielectric loss around the Josephson-junction part of the circuit could be the dominant limitation of lifetimes for state-of-the-art transmon qubits.
We have developed a reliable method for the direct measurement of dielectric losses in thin films using a special design of lumped element superconducting resonators. The method presented allows obtaining quantitative values for the losses in the film volume as well as the metal/dielectric interfaces. Numerous different resonator geometries were designed and measured in order to study the losses in dielectric thin films usually used for Josephson junction fabrication, such as Nb 2 O 5 , SiO and SiN x , at low temperatures and low gigahertz frequencies. The results show that for such amorphous materials, the bulk losses clearly exceed the interface losses. Furthermore, the frequency dependence of the losses in this working regime was studied for the first time. Our results are in good agreement with the universal law describing the frequency dependence of dielectric losses and suggest that the losses are due to many-body interacting dipoles, which is an important fact for the theoretical modelling of two-level fluctuators. We also investigated the losses in multi-layer films and find that the results are in good agreement with the theoretical expectations, which allows optimization of the dielectric multi-layers used in Josephson junction and qubit fabrication.
The improvement of the coherence times of superconducting qubits depends on the reduction of the dielectric losses in the insulating materials implemented for the device fabrication. These losses depend on the density of spurious dipoles of different nature (two-level systems, TLSs) which couple to phase qubits and, hence, limit their coherence times. Hydrogenated amorphous silicon (a-Si:H), because of its lower loss tangent (tan δ) among conventional dielectrics (a-SiO, a-SiO2, a-SiNx:H), is considered as the best amorphous dielectric for superconducting qubit application. We have developed a reliable method for the direct measurement of dielectric losses in amorphous dielectric thin films using a novel design based on four lumped superconducting LC resonators connected in series without coupling capacitors. The losses are obtained as tan δ = 1/Q0, where Q0 is the intrinsic quality factor of the resonator, measured at 3 dB above the resonance frequency without any fitting procedure. The series type LC resonators with a-Si:H as dielectric were fabricated by the Nb technology. The measurements were done at the conditions of a qubit application (0.5 -10 GHz frequency range and low temperatures). The low values of the loss tangent of a-Si:H (up to 2.5 x 10−5 at 4.2 K) have required the development of superconducting housing for the resonators in order to eliminate a spurious dependence of tan δ on the microwave power, by reducing losses which were not originated in the dielectric itself. The results of the simulations agree well with the experiments.