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arXiv:1007.5096 · Applied Physics Letters

Low loss superconducting titanium nitride coplanar waveguide resonators

Michael R. Vissers, J. Gao, David Wisbey, Dustin A. Hite, Chang C. Tsuei, Antonio D. Corcoles, Matthias Steffen, David P. Pappas

Published Dec 6, 2010• 189 citations
arXivHTMLPDF

Abstract

Thin films of TiN were sputter-deposited onto Si and sapphire wafers with and without SiN buffer layers. The films were fabricated into rf coplanar waveguide resonators, and internal quality factor measurements were taken at millikelvin temperatures in both the many photon and single photon limits, i.e., high and low electric field regimes, respectively. At high field, we found the highest internal quality factors (∼107) were measured for TiN with predominantly a (200)-TiN orientation. The (200)-TiN is favored for growth at high temperature on either bare Si or SiN buffer layers. However, growth on bare sapphire or Si(100) at low temperature resulted in primarily a (111)-TiN orientation. Ellipsometry and Auger measurements indicate that the (200)-TiN growth on the bare Si substrates is correlated with the formation of a thin, ≈2 nm, layer of SiN during the predeposition procedure. On these surfaces we found a significant increase of Qi for both high and low electric field regimes.

DOI
10.1063/1.3517252

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Thin films of TiN were sputter-deposited onto Si and sapphire wafers with and without SiN buffer layers. The films were fabricated into rf coplanar waveguide resonators, and internal quality factor measurements were taken at millikelvin temperatures in both the many photon and single photon limits, i.e., high and low electric field regimes, respectively. At high field, we found the highest internal quality factors (∼107) were measured for TiN with predominantly a (200)-TiN orientation. The (200)-TiN is favored for growth at high temperature on either bare Si or SiN buffer layers. However, growth on bare sapphire or Si(100) at low temperature resulted in primarily a (111)-TiN orientation. Ellipsometry and Auger measurements indicate that the (200)-TiN growth on the bare Si substrates is correlated with the formation of a thin, ≈2 nm, layer of SiN during the predeposition procedure. On these surfaces we found a significant increase of Qi for both high and low electric field regimes.
We report on the fabrication and characterization of superconducting coplanar waveguide (CPW) resonators based on titanium nitride (TiN) thin films deposited on 200\,mm diameter high-resistivity Si(100) substrates. We systematically investigate how deposition conditions, dry-etch power and in-situ resist strip temperature affect morphology, superconducting properties and dielectric losses. By tuning reactive sputtering conditions, three distinct preferred out-of-plane crystal orientations - (111), (200), and a mix of both are achieved. Our results demonstrate that all films exhibit similar minimal two-level system (TLS) losses, with TiN111 exhibiting the lowest median TLS losses δ~TLS\tildeδ_\mathrm{TLS}δ~TLS​, and greater robustness against reoxidation. The applied structuring process, in contrast, has a far greater influence on the TLS loss than the crystal orientation of the TiN film and, consequently, the intrinsic material properties of the superconducting layer. The lowest TLS losses for all TiN depositions were achieved with a low power etch and low temperature resist strip. An additional buffered oxide etch (BOE) treatment could remove high-loss interfacial oxides at the metal-air (MA) and substrate-air (SA) interface and recover the etch-induced TLS losses. Consequently, TiN resonators exhibiting δ~TLS\tildeδ_\mathrm{TLS}δ~TLS​ values as low as 9.67×10−79.67 \times 10^{-7}9.67×10−7 were realized. The corresponding median low-power loss, δ~LP\tildeδ_\mathrm{LP}δ~LP​, amounts to 11.04×10−711.04 \times 10^{-7}11.04×10−7, which translates to an internal quality factor approaching one million. These findings highlight the critical role of process induced oxide formation at the MA and SA interfaces in limiting the performance of TiN resonators and provide a scalable, low-loss process compatible with industry-grade 200\,mm CMOS qubit fabrication workflows.
We fabricated TiN coplanar waveguides using standard lithography techniques followed by ICP etch. In order to achieve high quality factor, we investigated the film growth by choosing different deposition conditions for various substrates. Quality factors of waveguide resonators were measured at 20 mK in both high and low microwave power limits. An inner quality factor of several million was achieved at high power limit for a predominantly (200)-oriented TiN film which was grown on HF cleaned silicon wafer. A quality factor of larger than one million was achieved at high power limit for TiN film grown on sapphire.
Superconducting qubits are a promising platform for large-scale quantum computing. Besides the Josephson junction, most parts of a superconducting qubit are made of a planar, patterned superconducting thin films. In the past, most qubit architectures have relied on niobium (Nb) as the material of choice for the superconducting layer. However, there is also a variety of alternative materials with potentially less losses, which may thereby result in increased qubit performance. One such material is tantalum (Ta), for which high-performance qubit components have already been demonstrated. In this study, we report the sputter-deposition of Ta thin films directly on heated and unheated silicon (Si) substrates as well as onto different, nanometer-thin seed layers from tantalum nitride (TaN), titanium nitride (TiN) or aluminum nitride (AIN) that were deposited first. The thin films are characterized in terms of surface morphology, crystal structure, phase composition, critical temperature, residual resistance ratio (RRR) and RF-performance. We obtain thin films indicative of pure alpha-Ta for high temperature (600°C) sputtering directly on silicon and for Ta deposited on TaN or TiN seed layers. Coplanar waveguide (CPW) resonator measurements show that the Ta deposited directly on the heated silicon substrate performs best with internal quality factors Qi reaching 1xl06in the single-photon regime, measured at T=100 mK.
Using molecular beam epitaxy, we have realized thin films of titanium nitride (TiN) on c-plane sapphire that exhibit the lowest observed full-width at half maximum X-ray rocking curve width of 18 arcsec. Though the (111) oriented TiN exhibits an abrupt and crystalline interface with sapphire, for the first time we observe sub-surface defects in the sapphire substrate, which nucleate structural defects in the epitaxial TiN layer. Using quarter-wavelength coplanar waveguide (CPW) resonators in a 3 \textmu m/6 \textmu m/3 \textmu m gap/strip/gap lines in a hanger geometry, we find the internal quality factor of the TiN resonators to be >106>10^{6}>106 in the single-photon ⟨n⟩∼1\langle n \rangle \sim 1⟨n⟩∼1 limit at 5.8 GHz and 10 mK, rising to >20×106>20 \times 10^{6}>20×106 at ⟨n⟩∼106\langle n \rangle \sim 10^{6}⟨n⟩∼106. The results are of high interest for applications of superconducting TiN in several areas, and provide a path towards epitaxial Josephson junctions with crystalline barriers in the future for high coherence qubits.
In current superconducting qubit circuit development, coherence time is limited by low-frequency flux noise introduced from localized two-level systems (TLSs) in the fabricated superconducting circuit, including superconducting materials, the interface between thin films, and the substrate. As a part of the effect to tackle this issue from a substrate standpoint, we succeed in fabricating NbN (200) oriented coplanar waveguide resonator (CPWR) on a thin titanium nitride (TiN) (200) buffered Si (100) substrate. The internal loss is close to 3 × 10-5nearphoton> ~1, improved from ~2 × 10-4in NbN (200) CPWR fabricated on MgO (100). For NbN (200) resonators grown on Si (100), the internal loss shows microwave energy independent. To further clarity if this energy independence is due to the change of substrate material, we also fabricated TiN (200) CPWR on Si (100). In contrast to NbN (200) CPWR, the loss of TiN (200) resonator shows a strong microwave dependent, an indication of TLSs originated from the interface and the surface. We suggest TLSs in NbN (200) CPWR are dominated from different mechanism other than arising from the interface and surface.
Abstract Low microwave loss and regulatable kinetic inductance are two key characteristics of superconducting films to manufacture high-performance quantum devices. Epitaxial titanium nitride (TiN) thin films have been found to exhibit significant advantages in these two aspects. In this paper, we investigated into the dielectric loss and kinetic inductance of epitaxial TiN films, which were prepared on both silicon and sapphire substrates with different temperatures. Crystal structure, surface morphology, and superconducting properties were characterized systematically. The radio-frequency response of microwave resonators made of TiN films was studied at low temperatures to extract the information of kinetic inductance and quality factor. We obtained the highest internal quality factor up to 1.6 × 10 6 at single photon regime and achieved a regulation of kinetic inductance exceeding 16 times by altering the substrate and the sputtering temperature of the TiN films. This work not only provides an essential foundation for the precise design and preparation of low-loss TiN resonators for superconducting quantum bits, but also demonstrates TiN film as an excellent material platform with both low microwave loss and high kinetic inductance that can be applied in other fields such as microwave kinetic inductance detectors.