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Atom Lithography In Two-dimensional polarization gradient light fields

B. Brezger, Piet O. Schmidt, T. Schulze +3 more

European Quantum Electronics Conference (EQEC)Aug 24, 20050 citations

Light source technology: Atom optics and atom lithography

Ryuzo Omukai, Masayoshi Watanabe, 隆三大向 +1 more

Feb 21, 20050 citations

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

Wanjing Zhang, Yan Ma, Tongbao Li +4 more

Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to make further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7 S 3 → 7 P 0 4 of the chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and success of our structured mirror array is achieved.Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to make further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7 S 3 → 7 P 0 4 of the chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and success of our structured mirror array is achieved.

Chinese Physics BFeb 1, 20134 citations

Atom lithography with laser-cooled silicon atoms

Hiroshi Kumagai, Yuichi Asakawa, T. Iwane +7 more

Jan 1, 20030 citations

Polarization gradient light masks in atom lithography

B. Brezger, Th. Schulze, Piet O. Schmidt +2 more

In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.

Europhysics Letters (EPL)Apr 15, 199933 citations

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

张万经, 马艳, 李同保 +4 more

Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically(in x axis),and it is 0.55 horizontally(in y axis).The theoretical model is also simulated,and success of our structured mirror array is achieved.更多还原Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically(in x axis),and it is 0.55 horizontally(in y axis).The theoretical model is also simulated,and success of our structured mirror array is achieved.更多还原

中国物理B：英文版Jan 1, 20130 citations

Atom lithography with two-dimensional optical masks

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