Applied Physics Express
Frequency trimming of superconducting qubits using RF-biased ICP annealing
Zhi-Long Jia, Lei Du, Haoran Tao, Yong Chen, Hui Yang, Chi Zhang, Guoliang Xu, Long Shen, Wang-Sheng Xu, N. L. Wang, Peng Duan, Guo‐Ping Guo
Abstract
Abstract We propose a novel method for post-fabrication frequency trimming of superconducting qubits via RF-biased inductively coupled plasma (ICP) annealing. Junction resistance systematically increases with RF bias power, achieving a maximum increase of approximately 40% under O2 plasma and up to 180% under Ar plasma conditions. Specifically, oxygen-based ICP annealing notably improves qubit coherence, extending both relaxation (T 1) and coherence (T 2) times. Transmission Electron Microscopy (TEM) analysis indicates that the observed increase in junction resistance corresponds to structural changes and barrier thickening. Our results demonstrate that RF-biased ICP annealing provides a highly effective and controllable technique to tune qubit frequencies, representing a promising pathway toward improved coherence and scalability in superconducting quantum processors.