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Laser Physics Letters

Pulsed loading of a magneto-optical trap on an atom chip with fast recovery of ultrahigh vacuum

Vivek Singh, Vibhuti Bhushan Tiwari, A Chaudhary, S Sarkar, Satya Ram Mishra

Published Dec 19, 2024• 0 citations
Publisher

Abstract

Abstract Here, we present studies on pulsed loading of a rubidium (Rb) magneto-optical trap (MOT) in an ultra-high vacuum (UHV) environment on an atom chip. We have used a parallel combination of Rb dispensers for better heat dissipation to achieve fast UHV recovery in the chamber after the end of the current pulse to the dispensers. We have estimated the threshold heat energy required for activation of the dispensers for different values of current pulses. Although a pulse with a higher current value and shorter duration has a lower threshold heat energy, we operated the dispensers at moderate current pulse parameters (24 A, 10 s) for protection of the circuits. Nearly, 3 × 10 7 cold 87 Rb atoms were loaded in the MOT using this current pulse, with a UHV recovery time of ∼600 ms in the chamber. This fast recovery of UHV in the MOT chamber is useful for further experiments such as magnetic trapping and evaporative cooling of atoms in the same chamber.

DOI
10.1088/1612-202x/ad9d1f

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Abstract Here, we present studies on pulsed loading of a rubidium (Rb) magneto-optical trap (MOT) in an ultra-high vacuum (UHV) environment on an atom chip. We have used a parallel combination of Rb dispensers for better heat dissipation to achieve fast UHV recovery in the chamber after the end of the current pulse to the dispensers. We have estimated the threshold heat energy required for activation of the dispensers for different values of current pulses. Although a pulse with a higher current value and shorter duration has a lower threshold heat energy, we operated the dispensers at moderate current pulse parameters (24 A, 10 s) for protection of the circuits. Nearly, 3 × 10 7 cold 87 Rb atoms were loaded in the MOT using this current pulse, with a UHV recovery time of ∼600 ms in the chamber. This fast recovery of UHV in the MOT chamber is useful for further experiments such as magnetic trapping and evaporative cooling of atoms in the same chamber.
This study presents investigations on pulsed loading of a magneto-optical trap (MOT) on an atom chip in an UHV environment. Using three parallel resistively heated Rb-metal dispensers activated by pulsed current supply, approximately 3.0 ×\times× 10710^{7}107 cold 87Rb^{87}Rb87Rb atoms were loaded into the MOT. A current pulse of ∼\sim∼ 24 A with duration of ∼\sim∼ 10 s raised the pressure in the chamber from 2.0 ×\times× 10−1010^{-10}10−10 Torr to 3.3 ×\times× 10−1010^{-10}10−10 Torr. Remarkably, the pressure recovery time after switching off the dispensers current was found to be ∼\sim∼ 600 ms, making a significant advancement in achieving fast recovery of UHV environment surrounding the MOT region. This study is very useful for laser cooling and magnetic trapping / evaporative cooling of atoms on atom chip in the same UHV chamber.
Abstract Here, we report our studies on the continuous loading of a U-magneto-optical trap (U-MOT) on an atom-chip with a rubidium-(Rb)-vapor-generated background using a dispenser source in an ultra high vacuum environment. Using the U-MOT loading curves, the partial pressure due to the Rb vapor and the pressure due to the background gas have been estimated near the MOT cloud position. The estimated pressure due to the Rb vapor increased from ∼ Torr to Torr as the Rb-dispenser current was increased from 2.8 to 3.4 A. The increase in dispenser current also resulted in a decrease in loading time as well as the lifetime of the MOT cloud. This study will be useful for magnetic trapping experiments where accurate information of the pressure in a chamber is important for the lifetime of the magnetic trap.
We have developed a compact setup which enables loading a magneto-optical trap (MOT) in ultra-high vacuum (UHV) environment. Nearly 1×1081 \times 10^{8}1×108 atoms of 87Rb^{87}Rb87Rb are trapped in the MOT at ∼2×10−10\sim 2 \times 10^{-10}∼2×10−10 Torr base pressure in the chamber. After the MOT loading, we have successfully demonstrated working of quadrupole magnetic trap in this chamber with a lifetime of $\sim 8 $ s
In this work, the UHV background pressure as low as 1.1×10−10 Torr has been measured using the loss rate characteristics of a vapor-loaded magneto-optical trap (MOT) formed on an atom chip in a UHV chamber. The loss rate due to non-rubidium (Rb) gases in the background in the chamber has been estimated by operating the MOT in low cooling beam intensities and low Rb pressure regimes simultaneously. Using this approach, we minimized the contributions of the intra-trap collisions as well as background MOT species collisions to the measured trap loss rate in our setup. These results can be useful for development of cold-atom based UHV pressure standards.
In our double magneto-optical trap (MOT) setup containing a vapor chamber MOT (VC-MOT) and an ultra high vacuum MOT (UHV-MOT) for 87^{87}87Rb atoms, we find that transfer of atoms from VC-MOT to UHV-MOT can be enhanced by employing a pulsed VC-MOT loading followed by a pulsed push beam, as compared to that obtained by focusing a continuous wave (CW) push beam on a continuously loaded VC-MOT. By choosing appropriately the VC-MOT duration and push beam duration, the number of atoms in UHV-MOT was $\sim$3-times the number obtained with a continuous VC-MOT and a CW push beam of optimized power. The processes affecting the pulsed transfer have been studied.
We have developed an improved scheme for loading atoms into a magneto-optical trap (MOT) from a directed rubidium alkali metal dispenser in <10−10Torr ultrahigh vacuum conditions. A current-driven dispenser was surrounded with a cold absorbing “shroud” held at ⩽0°C, pumping rubidium atoms not directed into the MOT. This nearly eliminates background atoms and reduces the detrimental rise in pressure normally associated with these devices. The system can be well-described as a current-controlled, rapidly switched, two-temperature thermal beam, and was used to load a MOT with 3×108atoms.