Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Log inSign up
Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Blog
Job Board
Q3AS

© 2026 Aqora Quantum S.A.S.

TermsPrivacyLegal Notice

Applied Physics Letters

NbN thin films grown on silicon by molecular beam epitaxy for superconducting detectors

Adrian Iovan, A. Pedeches, Thomas Descamps, H. Rotella, Ileana Florea, Fabrice Semond, Val Zwiller

Published Dec 18, 2023• 15 citations
Publisher

Abstract

Superconducting nanowire single photon detectors (SNSPDs) made with thin NbN films can reach high performances. While sputtering has been the deposition method of choice, here, we show that ammonia-molecular beam epitaxy (NH3-MBE) can produce pertinent epitaxial cubic NbN thin films on silicon substrates using an AlN buffer. Despite granular morphology and a high density of grain boundaries as well as the presence of rotational twins, Tc = 12.7 K for a 5.6 nm thick film and saturation of internal detection efficiency up to 850 nm are achieved. Morphology and stoichiometry as well as strain have a strong impact on the detector properties, highlighting the importance of a precise control of the growth parameters. These results pave the way for high fabrication yield of SNSPDs on large-scale silicon wafers using epitaxial NbN thin films grown by MBE.

DOI
10.1063/5.0175699

Related papers

Epitaxial niobium nitride superconducting nanowire single-photon detectors

Risheng Cheng, John G. Wright, Huili Grace Xing +2 more

Superconducting nanowires used in single-photon detectors have been realized on amorphous or poly-crystalline films. Here, we report the first use of single-crystalline NbN thin films for superconducting nanowire single-photon detectors (SNSPDs). Grown by molecular beam epitaxy (MBE) at high temperature on nearly lattice-matched AlN-on-sapphire substrates, the NbN films exhibit a high degree of uniformity and homogeneity. Even with relatively thick films, the fabricated nanowire detectors show saturated internal efficiency at near-IR wavelengths, demonstrating the potential of MBE-grown NbN for realizing large arrays of on-chip SNSPDs and their integration with AlN-based χ(2) quantum photonic circuits.

arXiv:2006.09643•Applied Physics Letters•Sep 28, 2020•44 citations

NbN-on-Si superconducting nanowire single photon detectors: effect of a sputtered AlN buffer layer

Raouia Rhazi, H. Machhadani, Catherine Bougerol +8 more

Superconducting nanowire single photon detectors stand today as the best technology, due to their near-unity detection efficiency, low dark count rates, and low timing jitter. In this work, we demonstrate the improvement of the superconducting properties of NbN thin films on 8” silicon-on-insulator wafers by using an ultra-thin (10-15 nm) sputtered AlN buffer layer. The higher crystalline quality of NbN, leads to an increase of the superconducting critical temperature up to 10 K for 9-nm-thick NbN films. The material was validated for single photon detection using a fiber-coupled vertical SNSPD with half-cavity architecture. This results opens the way for the development of CMOS compatible waveguide-integrated detectors. The implementation of such guided devices is a keystone for the development of a fully integrated quantum photonics platform able to generate, manipulate and detect a large number of photonic qubits for secure communications and quantum computing applications.

Advanced Photon Counting Techniques•Apr 8, 2021•0 citations

Improvement of critical temperature of niobium nitride deposited on 8-inch silicon wafers thanks to an AlN buffer layer

Raouia Rhazi, H. Machhadani, Catherine Bougerol +10 more

Abstract In this paper, we study the crystalline properties and superconducting critical temperature of ultra-thin (5–9 nm) NbN films deposited on 8-inch silicon wafers by reactive sputtering. We show that the deposition of NbN on a thin (10–20 nm) AlN buffer layer, also synthesized by reactive sputtering, improves the critical temperature by several Kelvin, up to 10 K for 9 nm NbN on 20 nm AlN. We correlate this improvement to the higher-crystalline quality of NbN on AlN. While NbN deposited directly on silicon is polycrystalline with randomly oriented grains, NbN on AlN(0001) is textured along (111), due to the close lattice match. The superconducting properties of the NbN/AlN stack are validated by the demonstration of fibre-coupled normal-incidence superconducting nanowire single photon detectors. The whole fabrication process is CMOS compatible, with a thermal budget compatible with the integration of other passive and active components on silicon. These results pave the way for the integration of a large number of surface or waveguide-integrated detectors on large-scale silicon wafers. Furthermore, as AlN is transparent over a broad wavelength range from the visible to the near-infrared, the optimized superconducting NbN/AlN stack can be used for a wide variety of applications, from imaging to quantum communications and quantum computing.

Superconductor Science and Technology•Feb 5, 2021•15 citations

AlN-Buffered Superconducting NbN Nanowire Single-Photon Detector on GaAs

Ekkehart Schmidt, K. Ilin, M. Siegel

We investigated the suitability of AlN as a buffer layer for NbN superconducting nanowire single-photon detectors (SNSPDs) on GaAs. The NbN films with a thickness of 3.3-20 nm deposited onto GaAs substrates with an AlN buffer layer demonstrate a higher critical temperature, critical current density, and lower residual resistivity in comparison to films deposited onto bare substrates. Unfortunately, the thermal coupling of the NbN film to the substrate weakens. SNSPDs made of 4.9-nm-thick NbN films on buffered substrates (in comparison to detectors made from NbN films on bare GaAs) demonstrate three orders of magnitude lower dark count rates and about ten times higher detection efficiency at 900 nm being measured at 90% of the critical current. The system timing jitter of SNSPDs on buffered substrates is 72 ps, which is 36 ps lower than those on bare substrate. However, a weaker thermal coupling of NbN nanowire to the buffered substrate leads to a latching effect at bias currents > 0.97 IC.

arXiv:1609.09694•IEEE Transactions on Applied Superconductivity•Dec 19, 2016•24 citations

Epitaxial superconductor/semiconductor/metal nitride heterostructure for single-photon detection

Shangjr Gwo, Chang-Wei Cheng, Yan-Jyun Liao +4 more

Abstract Superconducting nanowire single-photon detectors (SNSPDs) have become increasingly important for both classical and quantum applications requiring single-photon sensing. Most current SNSPDs based on superconducting niobium nitride (NbN) ultrathin films are fabricated utilizing polycrystalline or amorphous superconductor films, and film inhomogeneity and defectivity can cause significant issues. Here, we present an all-epitaxial approach for fabricating SNSPDs with integrated metal reflectors, semiconductor (dielectric) resonators, and superconductor nanowire detectors. A working example is realized by molecular-beam epitaxy growth of a tri-layered heterostructure, consisting of a titanium nitride (TiN) reflector with ~ 92% reflectivity at the telecommunication wavelength (1550 nm), an aluminum nitride (AlN) resonator with a broad optical transparency window, and a NbN nanowire on c -plane sapphire wafer. The all-epitaxial approach provides a manufacturable platform with superior material properties, as well as uniformity across the wafer, which manifest themselves in tunable material parameters of the superconducting nanowire, including normal-state resistance, superconducting critical temperature, superconducting critical current, and kinetic inductance. The optimized material properties can be utilized to achieve excellent SNSPD performance, including wafer-scale uniformity in device characteristics and broadband (~300 nm) system detection efficiency (>90%) centered at 1550 nm, suitable for large-scale detector arrays and wavelength-division multiplexing (WDM) applications.

Communications Materials•Oct 29, 2026•0 citations

Ultrathin NbN Films for Superconducting Single-Photon Detectors

Wojciech Słysz, M. Guziewicz, Michal Adam Borysiewicz +11 more

We present our research on fabrication and structural and transport characterization of ultrathin superconducting NbN layers deposited on both single-crystal Al2O3 and Si wafers, and SiO2 and Si3N4 buffer layers grown directly on Si wafers.The thicknesses of our films varied from 6 nm to 50 nm and they were grown using reactive RF magnetron sputtering on substrates maintained at the temperature 850 • C. We have performed extensive morphology characterization of our films using the X-ray diffraction method and atomic force microscopy, and related the results to the type of the substrate used for the film deposition.Our transport measurements showed that even the thinnest, 6 nm thick NbN films had the superconducting critical temperature of 10-12 K, which was increased to 14 K for thicker films.

Acta Physica Polonica A•Jul 1, 2011•14 citations
Superconducting nanowire single photon detectors (SNSPDs) made with thin NbN films can reach high performances. While sputtering has been the deposition method of choice, here, we show that ammonia-molecular beam epitaxy (NH3-MBE) can produce pertinent epitaxial cubic NbN thin films on silicon substrates using an AlN buffer. Despite granular morphology and a high density of grain boundaries as well as the presence of rotational twins, Tc = 12.7 K for a 5.6 nm thick film and saturation of internal detection efficiency up to 850 nm are achieved. Morphology and stoichiometry as well as strain have a strong impact on the detector properties, highlighting the importance of a precise control of the growth parameters. These results pave the way for high fabrication yield of SNSPDs on large-scale silicon wafers using epitaxial NbN thin films grown by MBE.
Superconducting nanowires used in single-photon detectors have been realized on amorphous or poly-crystalline films. Here, we report the first use of single-crystalline NbN thin films for superconducting nanowire single-photon detectors (SNSPDs). Grown by molecular beam epitaxy (MBE) at high temperature on nearly lattice-matched AlN-on-sapphire substrates, the NbN films exhibit a high degree of uniformity and homogeneity. Even with relatively thick films, the fabricated nanowire detectors show saturated internal efficiency at near-IR wavelengths, demonstrating the potential of MBE-grown NbN for realizing large arrays of on-chip SNSPDs and their integration with AlN-based χ(2) quantum photonic circuits.
Superconducting nanowire single photon detectors stand today as the best technology, due to their near-unity detection efficiency, low dark count rates, and low timing jitter. In this work, we demonstrate the improvement of the superconducting properties of NbN thin films on 8” silicon-on-insulator wafers by using an ultra-thin (10-15 nm) sputtered AlN buffer layer. The higher crystalline quality of NbN, leads to an increase of the superconducting critical temperature up to 10 K for 9-nm-thick NbN films. The material was validated for single photon detection using a fiber-coupled vertical SNSPD with half-cavity architecture. This results opens the way for the development of CMOS compatible waveguide-integrated detectors. The implementation of such guided devices is a keystone for the development of a fully integrated quantum photonics platform able to generate, manipulate and detect a large number of photonic qubits for secure communications and quantum computing applications.
Abstract In this paper, we study the crystalline properties and superconducting critical temperature of ultra-thin (5–9 nm) NbN films deposited on 8-inch silicon wafers by reactive sputtering. We show that the deposition of NbN on a thin (10–20 nm) AlN buffer layer, also synthesized by reactive sputtering, improves the critical temperature by several Kelvin, up to 10 K for 9 nm NbN on 20 nm AlN. We correlate this improvement to the higher-crystalline quality of NbN on AlN. While NbN deposited directly on silicon is polycrystalline with randomly oriented grains, NbN on AlN(0001) is textured along (111), due to the close lattice match. The superconducting properties of the NbN/AlN stack are validated by the demonstration of fibre-coupled normal-incidence superconducting nanowire single photon detectors. The whole fabrication process is CMOS compatible, with a thermal budget compatible with the integration of other passive and active components on silicon. These results pave the way for the integration of a large number of surface or waveguide-integrated detectors on large-scale silicon wafers. Furthermore, as AlN is transparent over a broad wavelength range from the visible to the near-infrared, the optimized superconducting NbN/AlN stack can be used for a wide variety of applications, from imaging to quantum communications and quantum computing.
We investigated the suitability of AlN as a buffer layer for NbN superconducting nanowire single-photon detectors (SNSPDs) on GaAs. The NbN films with a thickness of 3.3-20 nm deposited onto GaAs substrates with an AlN buffer layer demonstrate a higher critical temperature, critical current density, and lower residual resistivity in comparison to films deposited onto bare substrates. Unfortunately, the thermal coupling of the NbN film to the substrate weakens. SNSPDs made of 4.9-nm-thick NbN films on buffered substrates (in comparison to detectors made from NbN films on bare GaAs) demonstrate three orders of magnitude lower dark count rates and about ten times higher detection efficiency at 900 nm being measured at 90% of the critical current. The system timing jitter of SNSPDs on buffered substrates is 72 ps, which is 36 ps lower than those on bare substrate. However, a weaker thermal coupling of NbN nanowire to the buffered substrate leads to a latching effect at bias currents > 0.97 IC.
Abstract Superconducting nanowire single-photon detectors (SNSPDs) have become increasingly important for both classical and quantum applications requiring single-photon sensing. Most current SNSPDs based on superconducting niobium nitride (NbN) ultrathin films are fabricated utilizing polycrystalline or amorphous superconductor films, and film inhomogeneity and defectivity can cause significant issues. Here, we present an all-epitaxial approach for fabricating SNSPDs with integrated metal reflectors, semiconductor (dielectric) resonators, and superconductor nanowire detectors. A working example is realized by molecular-beam epitaxy growth of a tri-layered heterostructure, consisting of a titanium nitride (TiN) reflector with ~ 92% reflectivity at the telecommunication wavelength (1550 nm), an aluminum nitride (AlN) resonator with a broad optical transparency window, and a NbN nanowire on c -plane sapphire wafer. The all-epitaxial approach provides a manufacturable platform with superior material properties, as well as uniformity across the wafer, which manifest themselves in tunable material parameters of the superconducting nanowire, including normal-state resistance, superconducting critical temperature, superconducting critical current, and kinetic inductance. The optimized material properties can be utilized to achieve excellent SNSPD performance, including wafer-scale uniformity in device characteristics and broadband (~300 nm) system detection efficiency (>90%) centered at 1550 nm, suitable for large-scale detector arrays and wavelength-division multiplexing (WDM) applications.
We present our research on fabrication and structural and transport characterization of ultrathin superconducting NbN layers deposited on both single-crystal Al2O3 and Si wafers, and SiO2 and Si3N4 buffer layers grown directly on Si wafers.The thicknesses of our films varied from 6 nm to 50 nm and they were grown using reactive RF magnetron sputtering on substrates maintained at the temperature 850 • C. We have performed extensive morphology characterization of our films using the X-ray diffraction method and atomic force microscopy, and related the results to the type of the substrate used for the film deposition.Our transport measurements showed that even the thinnest, 6 nm thick NbN films had the superconducting critical temperature of 10-12 K, which was increased to 14 K for thicker films.