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Journal of Physics Conference Series

High quality ultrathin NbN layers on sapphire for superconducting single photon detectors

R. Espiau de Lamaëstre, P. Odier, Edith Bellet-Amalric, Paul Cavalier, Stéphanie Pouget, J.C. Villégier

Published Feb 1, 2008• 15 citations
Publisher

Abstract

Ultra-thin epitaxial NbN layers are a key component of Superconducting Single Photon infrared Detectors. Efforts devoted to the layer growth aim at improving their critical temperature and critical current density, while keeping their thickness close to 5 nm and Tc above 10 K, which insure a large bandwidth, large SNR detection at 4K. Choice of substrate is critical: for both applications, MgO wafers and R-plane sapphire are usually considered as best substrates to grown onto. However, growing NbN on M-plane orientation of sapphire wafer, 3 inch in diameter, can help improving the film quality and fabrication yield. NbN thin films were grown by reactive DC magnetron sputtering at about 600°C and passivated by an AlN layer 1.5nm thick deposited in-situ at room temperature. Growth on M-plane is shown to be better than on other sapphire orientations, including R-plane: NbN layer critical temperature reaches 13.3 K, uniform on the wafer, for a film thickness of 4.4nm measured by X-ray reflectivity. Transport properties of NbN grown on those various substrates have been correlated to their crystallographic microstructure, examined by both symmetric and asymmetric X ray diffraction. Observation of diffraction peaks has given insight on the disorientation of the NbN film.

DOI
10.1088/1742-6596/97/1/012046

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Ultra-thin epitaxial NbN layers are a key component of Superconducting Single Photon infrared Detectors. Efforts devoted to the layer growth aim at improving their critical temperature and critical current density, while keeping their thickness close to 5 nm and Tc above 10 K, which insure a large bandwidth, large SNR detection at 4K. Choice of substrate is critical: for both applications, MgO wafers and R-plane sapphire are usually considered as best substrates to grown onto. However, growing NbN on M-plane orientation of sapphire wafer, 3 inch in diameter, can help improving the film quality and fabrication yield. NbN thin films were grown by reactive DC magnetron sputtering at about 600°C and passivated by an AlN layer 1.5nm thick deposited in-situ at room temperature. Growth on M-plane is shown to be better than on other sapphire orientations, including R-plane: NbN layer critical temperature reaches 13.3 K, uniform on the wafer, for a film thickness of 4.4nm measured by X-ray reflectivity. Transport properties of NbN grown on those various substrates have been correlated to their crystallographic microstructure, examined by both symmetric and asymmetric X ray diffraction. Observation of diffraction peaks has given insight on the disorientation of the NbN film.
We present our research on fabrication and structural and transport characterization of ultrathin superconducting NbN layers deposited on both single-crystal Al2O3 and Si wafers, and SiO2 and Si3N4 buffer layers grown directly on Si wafers.The thicknesses of our films varied from 6 nm to 50 nm and they were grown using reactive RF magnetron sputtering on substrates maintained at the temperature 850 • C. We have performed extensive morphology characterization of our films using the X-ray diffraction method and atomic force microscopy, and related the results to the type of the substrate used for the film deposition.Our transport measurements showed that even the thinnest, 6 nm thick NbN films had the superconducting critical temperature of 10-12 K, which was increased to 14 K for thicker films.
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High sensitivity ultrafast nanowire superconducting single photon detectors (SSPD) in the near infrared wavelength range have been fabricated with ultrathin (3.5nm) NbN films grown on R-plane sapphire substrates by dc reactive magnetron sputtering in Ar+N2mixture. These results show for the first time that high performance NbN SSPDs can be realized on different substrates and at lower deposition temperature than previously reported, and opens the way to integration with advanced solid state optical structures. SSPDs have been fabricated by a two mask process using electron beam lithography and reactive ion etching on 3.5nm thick NbN films deposited under optimal conditions on MgO.
Abstract In this paper, we study the crystalline properties and superconducting critical temperature of ultra-thin (5–9 nm) NbN films deposited on 8-inch silicon wafers by reactive sputtering. We show that the deposition of NbN on a thin (10–20 nm) AlN buffer layer, also synthesized by reactive sputtering, improves the critical temperature by several Kelvin, up to 10 K for 9 nm NbN on 20 nm AlN. We correlate this improvement to the higher-crystalline quality of NbN on AlN. While NbN deposited directly on silicon is polycrystalline with randomly oriented grains, NbN on AlN(0001) is textured along (111), due to the close lattice match. The superconducting properties of the NbN/AlN stack are validated by the demonstration of fibre-coupled normal-incidence superconducting nanowire single photon detectors. The whole fabrication process is CMOS compatible, with a thermal budget compatible with the integration of other passive and active components on silicon. These results pave the way for the integration of a large number of surface or waveguide-integrated detectors on large-scale silicon wafers. Furthermore, as AlN is transparent over a broad wavelength range from the visible to the near-infrared, the optimized superconducting NbN/AlN stack can be used for a wide variety of applications, from imaging to quantum communications and quantum computing.
A very promising way to increase the detection efficiency of nanowire superconducting single-photon detectors (SSPDs) consists in integrating them with advanced optical structures such as distributed Bragg reflectors (DBRs) and optical waveguides. This requires transferring the challenging SSPD technology from the usual substrates, i.e. sapphire and MgO, to an optical substrate like GaAs, on which DBRs and waveguides can be easily obtained. Therefore, we optimized the deposition process of few-nm thick superconducting NbN films on GaAs and AlAs/GaAs-based DBRs at low temperatures (substrate temperature T S = 400 °C), in order to prevent As evaporation. NbN films ranging from 150 to 3 nm in thickness were then deposited on single-crystal MgO, GaAs, MgO-buffered GaAs and DBRs by current-controlled DC magnetron sputtering (planar, circular, balanced configuration) of Nb in an Ar+N 2 plasma. 5.5 nm thick NbN films on GaAs exhibit T C = 10.7 K, Δ T C = 1.1 K and RRR = 0.7. The growth of such high quality thin NbN films on GaAs and DBRs has never been reported before.
We report on superconducting single-photon detectors (SSPDs) based on NbN nanowires and their application to single-photon measurements at telecom wavelengths. The detectors are realized by patterning ultra thin (3 - 5 nm-thick) NbN films into meanders of 100 nm-wide wires. The films are deposited by DC magnetron sputtering at relatively low temperatures (≈500 °C) on MgO and GaAs substrates (as compared to the approach of high-temperature deposition on sapphire). In 5 nm-thick films, TCsas high as 10 K and 11 K have been obtained on GaAs and MgO, respectively (Fig. 1). SSPDs have been fabricated by a two-mask process using electron beam lithography and reactive ion etching on 3.5nm thick NbN films deposited under optimal conditions on MgO. The detectors are 5 × 5 μm2in size, and composed of a 100 μm long, 100 nm wide nanowire folded in a meander pattern with filling factor of 40%. Typical room temperature resistivity ρ is of 190 μΩ·cm, and I-V curves at 4.2 K show a critical current density JCof about 6 MA·cm-2, which are state of the art values. Quantum efficiency (QE) was measured illuminating the detectors mounted in a liquid He bath through an optical fiber. Quantum efficiencies >10% are measured at 4.2 K, comparable to best results on sapphire substrates. In particular, SSPDs show a large increase in sensitivity, temporal resolution and maximum counting frequencies as compared to InGaAs avalanche photodiodes.