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Advanced Photon Counting Techniques

NbN-on-Si superconducting nanowire single photon detectors: effect of a sputtered AlN buffer layer

Raouia Rhazi, H. Machhadani, Catherine Bougerol, S. Lequien, Guillaume Rodriguez, Richard Souil, Jean-Luc Thomassin, Nicolas Mollard, Eva Monroy, S. Olivier, Jean‐Michel Gérard

Published Apr 8, 2021• 0 citations
Publisher

Abstract

Superconducting nanowire single photon detectors stand today as the best technology, due to their near-unity detection efficiency, low dark count rates, and low timing jitter. In this work, we demonstrate the improvement of the superconducting properties of NbN thin films on 8” silicon-on-insulator wafers by using an ultra-thin (10-15 nm) sputtered AlN buffer layer. The higher crystalline quality of NbN, leads to an increase of the superconducting critical temperature up to 10 K for 9-nm-thick NbN films. The material was validated for single photon detection using a fiber-coupled vertical SNSPD with half-cavity architecture. This results opens the way for the development of CMOS compatible waveguide-integrated detectors. The implementation of such guided devices is a keystone for the development of a fully integrated quantum photonics platform able to generate, manipulate and detect a large number of photonic qubits for secure communications and quantum computing applications.

DOI
10.1117/12.2587853

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Superconducting nanowire single photon detectors stand today as the best technology, due to their near-unity detection efficiency, low dark count rates, and low timing jitter. In this work, we demonstrate the improvement of the superconducting properties of NbN thin films on 8” silicon-on-insulator wafers by using an ultra-thin (10-15 nm) sputtered AlN buffer layer. The higher crystalline quality of NbN, leads to an increase of the superconducting critical temperature up to 10 K for 9-nm-thick NbN films. The material was validated for single photon detection using a fiber-coupled vertical SNSPD with half-cavity architecture. This results opens the way for the development of CMOS compatible waveguide-integrated detectors. The implementation of such guided devices is a keystone for the development of a fully integrated quantum photonics platform able to generate, manipulate and detect a large number of photonic qubits for secure communications and quantum computing applications.
We investigated the suitability of AlN as a buffer layer for NbN superconducting nanowire single-photon detectors (SNSPDs) on GaAs. The NbN films with a thickness of 3.3-20 nm deposited onto GaAs substrates with an AlN buffer layer demonstrate a higher critical temperature, critical current density, and lower residual resistivity in comparison to films deposited onto bare substrates. Unfortunately, the thermal coupling of the NbN film to the substrate weakens. SNSPDs made of 4.9-nm-thick NbN films on buffered substrates (in comparison to detectors made from NbN films on bare GaAs) demonstrate three orders of magnitude lower dark count rates and about ten times higher detection efficiency at 900 nm being measured at 90% of the critical current. The system timing jitter of SNSPDs on buffered substrates is 72 ps, which is 36 ps lower than those on bare substrate. However, a weaker thermal coupling of NbN nanowire to the buffered substrate leads to a latching effect at bias currents > 0.97 IC.
Abstract In this paper, we study the crystalline properties and superconducting critical temperature of ultra-thin (5–9 nm) NbN films deposited on 8-inch silicon wafers by reactive sputtering. We show that the deposition of NbN on a thin (10–20 nm) AlN buffer layer, also synthesized by reactive sputtering, improves the critical temperature by several Kelvin, up to 10 K for 9 nm NbN on 20 nm AlN. We correlate this improvement to the higher-crystalline quality of NbN on AlN. While NbN deposited directly on silicon is polycrystalline with randomly oriented grains, NbN on AlN(0001) is textured along (111), due to the close lattice match. The superconducting properties of the NbN/AlN stack are validated by the demonstration of fibre-coupled normal-incidence superconducting nanowire single photon detectors. The whole fabrication process is CMOS compatible, with a thermal budget compatible with the integration of other passive and active components on silicon. These results pave the way for the integration of a large number of surface or waveguide-integrated detectors on large-scale silicon wafers. Furthermore, as AlN is transparent over a broad wavelength range from the visible to the near-infrared, the optimized superconducting NbN/AlN stack can be used for a wide variety of applications, from imaging to quantum communications and quantum computing.
Superconducting nanowire single photon detectors (SNSPDs) based on Si substrates have demonstrated excellent performance, such as high efficiency, low dark count rate, short reset time and low timing jitter. But due to the lattice mismatch between NbN and Si substrate, the performance of film is limited. To this end, Nb5N6layer is fabricated as the buffer layer between the NbN film and Si substrate, and that will reduce the mismatch and optimize superconducting properties of NbN films. The 6nm-thick film with a 65 nm-thick buffer layer shows the zero resistance critical temperature (Tc0) of 13.27 K, which is 5 K higher than that without buffer. Based on the NbN film on the buffered substrate, we fabricated SNSPD devices demonstrate critical current (IC) of 65 μA which is 5 ~ 6 times higher to the detectors without buffer. Besides, the experiment results prove that the buffer layer reduces the kinetic inductance, which fasten the recovery of nanowire.
There is an increasing demand for superconducting nanowire single photon detectors (SNSPDs) which combine high efficiency, low dark counts and fast response time. They play a crucial role in developing strategic application areas such as photon-based quantum computing and quantum key distribution. We demonstrate the fabrication of high crystalline quality NbN-based waveguide-integrated SNSPDs using a completely CMOS-compatible process on 200 mm SOI wafers. We achieve a detection efficiency over 80 % at 100 Hz dark count rate, a short decay time below 4 ns and a maximum count rate of 200 MHz.
Superconducting nanowire single photon detectors (SNSPDs) made with thin NbN films can reach high performances. While sputtering has been the deposition method of choice, here, we show that ammonia-molecular beam epitaxy (NH3-MBE) can produce pertinent epitaxial cubic NbN thin films on silicon substrates using an AlN buffer. Despite granular morphology and a high density of grain boundaries as well as the presence of rotational twins, Tc = 12.7 K for a 5.6 nm thick film and saturation of internal detection efficiency up to 850 nm are achieved. Morphology and stoichiometry as well as strain have a strong impact on the detector properties, highlighting the importance of a precise control of the growth parameters. These results pave the way for high fabrication yield of SNSPDs on large-scale silicon wafers using epitaxial NbN thin films grown by MBE.
On-chip single photon detection is crucial for implementing on-chip quantum communication, quantum simulation, and calculation. Superconducting nanowire single-photon detectors (SNSPDs) have become one of the essential techniques to achieve high-efficiency, on-chip, single-photon detection at scale due to their high detection efficiency, low dark count rate, and low jitter. Silicon carbide (SiC) has emerged as a promising integrated photonics platform due to its nonlinear optical processing capabilities, compatibility with CMOS technology, and outstanding quantum properties as a device for single photon sources. However, achieving high-efficiency superconducting nanowire single-photon detection on SiC substrates has yet to be demonstrated. In this study, we deposited polycrystalline NbN thin films onto 4H-SiC substrates. We also ensured that the deposited NbN thin film had a flat surface with a roughness less than 1 nm on the C-side 4H-SiC substrate through optimized chemical mechanical polishing. The NbN-SNSPD achieved a saturated quantum efficiency covering the color center emission bandwidth wavelength range (from 861 to 1550 nm) of the 4H-SiC material. These results offer a promising solution for high-efficiency single-photon detection on fully integrated quantum optical chips on 4H-SiC substrates.