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IEEE Transactions on Applied Superconductivity

Fabrication Process for Monolithic Integration of a Nitride Superconductor-Based Superconducting Qubit with a Single Flux Quantum Control Circuit

Shigeyuki Miyajima, Taro Yamashita, Masamitsu Tanaka, Naoki Takeuchi, K. Inomata, Hirotaka Terai

Published Feb 1, 2023• 11 citations
Publisher

Abstract

We developed a process for fabricating nitride superconductor-based superconducting qubits monolithically integrated with a single flux quantum (SFQ)-based readout and control circuits. Since we used a Josephson junction (JJ) made of an NbN/AlN/NbN tri-layer, including a critical current density (Jc) of 50 A/cm2as the suitable material for superconducting qubits and SFQ readout/control circuits operating at 20 mK, the JJs for both the qubits and the SFQ circuits could simultaneously be fabricated. The device structure was also composed of three superconductive layers, comprising two superconductive layers as wiring layers and other layers as the top ground plane. Then, we used a Pd film as the resistive layer, which is required as the shunt resistors and the bias resistors for the SFQ control circuits, followed by an investigation of the properties of NbN/AlN/NbN epitaxial junctions and evaluation of the sheet inductance of the base NbN and wiring NbTiN layer. Our results showed the successful fabrication of a JJ with a sufficiently low leakage current and aJcof around 50 A/cm2, which was close to the target value. Furthermore, the evaluated sheet inductance exceeded 1 pH, which was several times larger than the values obtained for Nb-integrated circuits.

DOI
10.1109/tasc.2023.3241270

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We developed a process for fabricating nitride superconductor-based superconducting qubits monolithically integrated with a single flux quantum (SFQ)-based readout and control circuits. Since we used a Josephson junction (JJ) made of an NbN/AlN/NbN tri-layer, including a critical current density (Jc) of 50 A/cm2as the suitable material for superconducting qubits and SFQ readout/control circuits operating at 20 mK, the JJs for both the qubits and the SFQ circuits could simultaneously be fabricated. The device structure was also composed of three superconductive layers, comprising two superconductive layers as wiring layers and other layers as the top ground plane. Then, we used a Pd film as the resistive layer, which is required as the shunt resistors and the bias resistors for the SFQ control circuits, followed by an investigation of the properties of NbN/AlN/NbN epitaxial junctions and evaluation of the sheet inductance of the base NbN and wiring NbTiN layer. Our results showed the successful fabrication of a JJ with a sufficiently low leakage current and aJcof around 50 A/cm2, which was close to the target value. Furthermore, the evaluated sheet inductance exceeded 1 pH, which was several times larger than the values obtained for Nb-integrated circuits.
We have developed an all-NbN integrated circuit technology for future integration of single flux quantum (SFQ) circuit with superconducting single-photon detector array. The all-NbN integrated circuits consist of epitaxial NbN/AlN/NbN tunnel junctions fabricated on single-crystal MgO substrates, Mo shunt resistors and 500-nm-thick NbN ground plane on the top. Critical current density and sheet resistance of the Mo resistor were set at 2.5 kA/cm2and 1.2 Ω, respectively. Current uniformity of the NbN/AlN/NbN tunnel junctions was measured to be σ = 3% for 3 μm × 3 μm junction size. The NbN-based SFQ logic cells were designed for and tested at 4.2 K. We actually measured circuit inductances of the fabricated SFQ cells. Circuit simulation revealed that the measured circuit inductances in the fabricated SFQ cells should allow operating margins of more than +/-20%.
We implemented, optimized, and fully tested a superconducting Josephson junction fabrication process over multiple runs tailored for integrated digital circuits that are used for control and readout of superconducting qubits operating at millikelvin temperatures. This process was optimized for highly energy efficient rapid single flux quantum (ERSFQ) circuits with critical currents reduced by a factor of ∼10 as compared to those operated at 4.2 K. Specifically, it implemented Josephson junctions with 10 μA unit critical current fabricated with 10 μA/μm2 critical current density. In order to circumvent the substantial size increase in the SFQ circuit inductors, we employed an NbN high kinetic inductance layer with 8.5 pH/sq sheet inductance. Similarly, to maintain the small size of junction resistive shunts, we used a non-superconducting PdAu alloy with 4.0 Ω/sq sheet resistance. For integration with quantum circuits in a multi-chip module, 5 and 10 μm height bump processes were also optimized. To keep the fabrication process in check, we developed and thoroughly tested a comprehensive process control monitor chip set.
Half-flux-quantum (HFQ) logic is a superconductor logic family comprising conventional Josephson junctions (0-JJs) and π Josephson junctions (π-JJs). The energy scale of HFQ logic can be flexibly reduced by phase shifts owing to π-JJs; thus, HFQ circuits are a promising building block for qubit interface circuits. In this study, we demonstrate an NbN-based HFQ circuit element compatible with NbN-based superconducting qubits for all-NbN monolithic integration of qubits and HFQ circuits. The use of NbN is beneficial for both qubits and HFQ circuits owing to its high-quality junctions and high kinetic inductance. First, we developed a prototype of an NbN-based 0-JJ/π-JJ hybrid fabrication process for designing HFQ circuits. We evaluated 0-JJs and π-JJs fabricated through the hybrid process, which demonstrated that the 0-JJs had a small deviation with regard to critical current density and the π-JJs had a sufficiently high critical current density to work as π phase shifters. Furthermore, we fabricated an HFQ superconducting quantum interference device, which is one of the most fundamental elements in HFQ circuits, and observed clear HFQ-period modulation in the magnetic flux dependence of the maximum current at 4.2 K.
We report low-power single-flux-quantum (SFQ) circuits fabricated with a lowered critical current density process and low-voltage design. We selected 250 A/cm2^{2}2to obtain 2–10 μA Josephson junctions (JJs) easily using conventional facilities. Our numerical simulation shows that the expected operating frequency is 10 GHz and that we can reduce the bias voltage to 0.1–0.5 mV; power consumption can be reduced to around 1 nW per JJ. We newly developed a fabrication process featuring four planarized Nb layers and a Pd resistor layer. We obtained the correct operation of several basic SFQ circuit elements designed with the lowered critical currents to 1/2 of the conventional circuits at 4.2 K. We also evaluated the Josephson junction critical currents, specific capacitance, resistance, and inductance at 3 K and 300 mK. We observed an increase of 7% in the critical currents at 300 mK, while the other parameters were unchanged. We demonstrated a 0.5-mV Josephson transmission line where we lowered the critical currents to 1/10. We expect such low-power SFQ circuits to operate at 20 mK, providing classical, general-purpose digital processing near quantum bits.
We describe the fabrication processes and electrical characteristics of two types of NbN junctions. One is a self-shunted NbN/NbNx/AlN/NbN Josephson junction, which is expected to improve the density of integrated circuits; the other is an underdamped NbN/AlNx/NbN tunnel junction with radical-nitride AlNx barriers, which has highly controllable junction characteristics. In the former, the junction characteristics were changed from underdamped to overdamped by varying the thickness of the NbNx layer. Overdamped junctions with a 6-nm-thick NbNx film exhibited a characteristic voltage of Vc =0.8mV and a critical current density of Jc =22A/cm2 at 4.2K. In the junctions with radical-nitride AlNx barriers, Jc could be controlled in the range 0.01-3kA/cm2 by varying the process conditions, and good uniformity of the junction characteristics was obtained.
Abstract Superconducting qubits are a promising quantum computing platform, but significant challenges remain, such as achieving sufficiently long and stable coherence times and precise control of circuit parameters. Further improvements in material processing are essential to overcome these challenges. This paper introduces our research on superconducting quantum circuit technology based on nitride superconductors, where the core technologies are epitaxial growth of titanium nitride (TiN) on silicon (Si) substrates and epitaxial Josephson junctions using niobium nitride (NbN), aluminum nitride (AlN), and magnesium oxide (MgO). We have established a fabrication process of NbN/AlN/NbN epitaxial junctions on Si (100) substrates using a TiN film as a buffer layer and are working on applying this process to superconducting qubits. We describe recent results on the effect of junction annealing and discuss the advantages and potential of epitaxial Josephson junctions for realizing large-scale superconducting quantum circuits.