Global quantum networks will benefit from the reliable fabrication and control of high-performance solid-state telecom photon-spin interfaces. T radiation damage centres in silicon provide a promising photon-spin interface due to their narrow O -band optical transition near 1326 nm and long-lived electron and nuclear spin lifetimes. To date, these defect centres have only been studied as ensembles in bulk silicon. Here, we fabricate high concentration T centre ensembles in the 220 nm device layer of silicon-on-insulator wafers by ion implantation and subsequent annealing. We then develop a method that uses spin-dependent optical transitions to benchmark the characteristic optical spectral diffusion within these T centre ensembles. Using this new technique, we show that with minimal optimization to the fabrication process high densities of implanted T centres localized ≲100 nm from an interface display ∼1 GHz characteristic levels of total spectral diffusion.
Global quantum networks will benefit from the reliable fabrication and control of high-performance solid-state telecom photon-spin interfaces. T radiation damage centres in silicon provide a promising photon-spin interface due to their narrow O -band optical transition near 1326 nm and long-lived electron and nuclear spin lifetimes. To date, these defect centres have only been studied as ensembles in bulk silicon. Here, we fabricate high concentration T centre ensembles in the 220 nm device layer of silicon-on-insulator wafers by ion implantation and subsequent annealing. We then develop a method that uses spin-dependent optical transitions to benchmark the characteristic optical spectral diffusion within these T centre ensembles. Using this new technique, we show that with minimal optimization to the fabrication process high densities of implanted T centres localized ≲100 nm from an interface display ∼1 GHz characteristic levels of total spectral diffusion.
Global quantum networks will benefit from the reliable creation and control of high-performance solid-state telecom photon-spin interfaces. T radiation damage centres in silicon provide a promising photon-spin interface due to their narrow O-band optical transition near 1326 nm and long-lived electron and nuclear spin lifetimes. To date, these defect centres have only been studied as ensembles in bulk silicon. Here, we demonstrate the reliable creation of high concentration T centre ensembles in the 220 nm device layer of silicon-on-insulator (SOI) wafers by ion implantation and subsequent annealing. We then develop a method that uses spin-dependent optical transitions to benchmark the characteristic optical spectral diffusion within these T centre ensembles. Using this new technique, we show that with minimal optimization to the fabrication process high densities of implanted T centres localized $\lesssim$100 nm from an interface display ~1 GHz characteristic levels of total spectral diffusion.
The performance of modular, networked quantum technologies will be strongly dependent upon the quality of their quantum light-matter interconnects. Solid-state colour centres, and in particular T centres in silicon, offer competitive technological and commercial advantages as the basis for quantum networking technologies and distributed quantum computing. These newly rediscovered silicon defects offer direct telecommunications-band photonic emission, long-lived electron and nuclear spin qubits, and proven native integration into industry-standard, CMOS-compatible, silicon-on-insulator (SOI) photonic chips at scale. Here we demonstrate further levels of integration by characterizing T centre spin ensembles in single-mode waveguides in SOI. In addition to measuring long spin T 1 times, we report on the integrated centres’ optical properties. We find that the narrow homogeneous linewidth of these waveguide-integrated emitters is already sufficiently low to predict the future success of remote spin-entangling protocols with only modest cavity Purcell enhancements. We show that further improvements may still be possible by measuring nearly lifetime-limited homogeneous linewidths in isotopically pure bulk crystals. In each case the measured linewidths are more than an order of magnitude lower than previously reported and further support the view that high-performance, large-scale distributed quantum technologies based upon T centres in silicon may be attainable in the near term.
Quantum networks represent one of the most promising technologies for the future development of quantum information science (QIS), with broad applications that range from secure communication and distributed quantum computing to enhanced sensing. Solid-state platforms are ideal candidates for the implementation of such quantum networks, since they offer easy accessibility to device integration and spin-photon interfaces capable of processing and storing qubits, as well as connecting remote network nodes by sending photons through optical fibers. In this thesis, we focus on single T centers, which are a novel type of color centers in silicon. This quantum defect stands out as a promising candidate for quantum networking applications due to its telecom optical transition, superior spin performance, and its compatibility with the technologically mature silicon platform. Here, we present our initial studies on single T centers, including the design and fabrication of nanophotonic devices in a silicon-on-insulator (SOI) sample with integrated T centers, and the cavity-enhanced fluorescence emission of single T centers, which have achieved the highest Purcell factor (Pt = 43) to date. Moreover, our experimental and numerical results allow us to determine a lower bound to the T center quantum efficiency of η = 23.4%, which is a key optical parameter for T centers that is largely overlooked in the community. Additionally, we present preliminary bulk spectroscopy work on ensemble T centers. The same setup will be exploited towards the exploration of novel quantum defects in silicon, including the boron-carbon (B-C) complex defect and the Ti+ defect, which are expected to have similar or better optical properties than the T center.
Colour centres in silicon have great potential as single photon sources for quantum technologies. Some of them - like the T centre - also possess optically-active spins that enable spin-photon interfaces for generating entangled photons and multi-spin registers. This paper explores the generation of several types of colour centres in silicon for mass-manufacturable silicon-on-insulator quantum devices. We investigate how different processes in the device development affect the presence of the quantum emitters, including thermal annealing and fabrication steps for optical nanostructures. The study reveals coupled formation dynamics between different colour centres, identifies optimal parameters for annealing processes, and reports on the sensitivity to annealing duration and nanofabrication procedures for photonic integrated circuits. Furthermore, we discern stable optical signals from colour centres in silicon which have not been identified before.
Abstract Spin-photon interfaces based on group-IV colour centres in diamond offer a promising platform for quantum networks. A key challenge in the field is realising precise single-defect positioning and activation, which is crucial for scalable device fabrication. Here we address this problem by demonstrating a two-step fabrication method for tin vacancy (SnV−) centres that uses site-controlled ion implantation followed by local femtosecond laser annealing with in-situ spectral monitoring. The ion implantation is performed with sub-50 nm resolution and a dosage that is controlled from hundreds of ions down to single ions per site, limited by Poissonian statistics. Using this approach, we successfully demonstrate site-selective creation and modification of single SnV− centres. Our in-situ spectral monitoring opens a window onto materials tuning at the single defect level, and provides new insight into defect structures and dynamics during the annealing process. While demonstrated for SnV− centres, this versatile approach can be readily generalised to other implanted colour centres in diamond and wide-bandgap materials.
Among the many solid-state emitters being explored for scalable quantum technologies, the silicon T centre is a leading candidate offering long-lived spin qubits, a telecommunications-band spin-photon interface, and integration with on-chip photonic circuits. However, nanophotonic integration broadens both the inhomogeneous spectral distribution and individual emitter linewidths. Here, we integrate single T centres into silicon nanophotonic cavities with p-i-n diodes for local electronic control. These devices enable Stark tuning up to 30 GHz, sufficient to bring 55(2)% of on-chip T centres into mutual resonance, and demonstrate tunable lifetime reduction across the cavity resonance. A model of the joint excitation probability shows an orders-of-magnitude increase in entanglement rate by tuning distinct emitters into mutual resonance. Luminescence modulation at high reverse biases reveals a transition to a dark charge state. Finally, bias-induced modulation of the optical transition splitting uncovers a potential mechanism for electrically driven excited-state spin mixing via spin-orbit coupling. Localized and individual spectral tuning increases the yield of performant silicon spin-photon interfaces and the number of devices per chip available for large-scale entanglement and quantum information technologies.