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arXiv:2601.17919

Colour Centre Formation in Silicon-On-Insulator for On-Chip Photonic Integration

Arnulf J. Snedker-Nielsen, David R. Gongora, Magnus L. Madsen, Christian H. Christiansen, Eike L. Piehorsch, Mathias Ø. Augustesen, Elvedin Memisevic, Sangeeth Kallatt, Rodrigo A. Thomas, Mark Kamper Svendsen, Peter Krogstrup Jeppesen, Marianne E. Bathen, Lasse Vines, Peter Granum, Stefano Paesani

quant-phcond-mat.mtrl-sciSubmitted Jan 25, 2026• Announced Jan 27, 2026
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Abstract

Colour centres in silicon have great potential as single photon sources for quantum technologies. Some of them - like the T centre - also possess optically-active spins that enable spin-photon interfaces for generating entangled photons and multi-spin registers. This paper explores the generation of several types of colour centres in silicon for mass-manufacturable silicon-on-insulator quantum devices. We investigate how different processes in the device development affect the presence of the quantum emitters, including thermal annealing and fabrication steps for optical nanostructures. The study reveals coupled formation dynamics between different colour centres, identifies optimal parameters for annealing processes, and reports on the sensitivity to annealing duration and nanofabrication procedures for photonic integrated circuits. Furthermore, we discern stable optical signals from colour centres in silicon which have not been identified before.

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Colour centres in silicon have great potential as single photon sources for quantum technologies. Some of them - like the T centre - also possess optically-active spins that enable spin-photon interfaces for generating entangled photons and multi-spin registers. This paper explores the generation of several types of colour centres in silicon for mass-manufacturable silicon-on-insulator quantum devices. We investigate how different processes in the device development affect the presence of the quantum emitters, including thermal annealing and fabrication steps for optical nanostructures. The study reveals coupled formation dynamics between different colour centres, identifies optimal parameters for annealing processes, and reports on the sensitivity to annealing duration and nanofabrication procedures for photonic integrated circuits. Furthermore, we discern stable optical signals from colour centres in silicon which have not been identified before.
The scaling barriers currently faced by both quantum networking and quantum computing technologies ultimately amount to the same core challenge of distributing high-quality entanglement at scale. In this Perspective, a novel quantum information processing architecture based on optically active spins in silicon is proposed that offers a combined single technological platform for scalable fault-tolerant quantum computing and networking. The architecture is optimized for overall entanglement distribution and leverages colour centre spins in silicon (T centres) for their manufacturability, photonic interface, and high fidelity information processing properties. Silicon nanophotonic optical circuits allow for photonic links between T centres, which are networked via telecom-band optical photons in a highly-connected graph. This high connectivity unlocks the use of low-overhead quantum error correction codes, significantly accelerating the timeline for modular, scalable fault-tolerant quantum repeaters and quantum processors.
The performance of modular, networked quantum technologies will be strongly dependent upon the quality of their quantum light-matter interconnects. Solid-state colour centres, and in particular T centres in silicon, offer competitive technological and commercial advantages as the basis for quantum networking technologies and distributed quantum computing. These newly rediscovered silicon defects offer direct telecommunications-band photonic emission, long-lived electron and nuclear spin qubits, and proven native integration into industry-standard, CMOS-compatible, silicon-on-insulator (SOI) photonic chips at scale. Here we demonstrate further levels of integration by characterizing T centre spin ensembles in single-mode waveguides in SOI. In addition to measuring long spin T 1 times, we report on the integrated centres’ optical properties. We find that the narrow homogeneous linewidth of these waveguide-integrated emitters is already sufficiently low to predict the future success of remote spin-entangling protocols with only modest cavity Purcell enhancements. We show that further improvements may still be possible by measuring nearly lifetime-limited homogeneous linewidths in isotopically pure bulk crystals. In each case the measured linewidths are more than an order of magnitude lower than previously reported and further support the view that high-performance, large-scale distributed quantum technologies based upon T centres in silicon may be attainable in the near term.
Spin-photon interfaces based on silicon quantum emitters offer a scalable platform for quantum computing and networking. However, achieving coherent photon emission remains a primary challenge due to stringent material quality requirements. To overcome this, we utilise high-purity molecular-beam epitaxy (MBE) to epitaxially incorporate single T centres in silicon-on-insulator (SOI) wafers. We demonstrate single T-centre emission coupled to a nanophotonic waveguide and observe significant suppression of homogeneous broadening, yielding optical linewidths as narrow as 30 MHz using natural silicon for crystal growth. These results establish epitaxial T centres as a robust foundation for coherent spin-photon interfaces in silicon quantum photonics.
Global quantum networks will benefit from the reliable creation and control of high-performance solid-state telecom photon-spin interfaces. T radiation damage centres in silicon provide a promising photon-spin interface due to their narrow O-band optical transition near 1326 nm and long-lived electron and nuclear spin lifetimes. To date, these defect centres have only been studied as ensembles in bulk silicon. Here, we demonstrate the reliable creation of high concentration T centre ensembles in the 220 nm device layer of silicon-on-insulator (SOI) wafers by ion implantation and subsequent annealing. We then develop a method that uses spin-dependent optical transitions to benchmark the characteristic optical spectral diffusion within these T centre ensembles. Using this new technique, we show that with minimal optimization to the fabrication process high densities of implanted T centres localized $\lesssim$100 nm from an interface display ~1 GHz characteristic levels of total spectral diffusion.
Single photons enable the distribution of quantum information over large distances and thus play a major role in quantum technologies such as communication and computing. Solid-state emitters are practical and efficient sources of single photons that can be manufactured in large numbers. When combined with a spin, the resulting spin-photon interfaces can store quantum states for extended periods and serve as the basis for quantum networks and repeaters. Among the many host materials explored over the past few decades, silicon stands out for its advanced nanofabrication, the maturity of its integrated photonics and microelectronics, and its high isotopic purity, which leads to exceptionally long spin coherence. These properties position silicon single-photon emitters and spin-photon interfaces among the most promising hardware platforms for implementing quantum networks and distributed quantum information processors. This review summarizes the current state of the art and open challenges towards coherent single-photon sources and scalable spin-photon interfaces based on color centers and erbium dopants in nanophotonic silicon structures.
Color centers in wide bandgap semiconductors are prominent candidates for solid-state quantum technologies due to their attractive properties including optical interfacing, long coherence times, and spin–photon and spin–spin entanglement, as well as the potential for scalability. Silicon carbide color centers integrated into photonic devices span a wide range of applications in quantum information processing in a material platform with quantum-grade wafer availability and advanced processing capabilities. Recent progress in emitter generation and characterization, nanofabrication, device design, and quantum optical studies has amplified the scientific interest in this platform. We provide a conceptual and quantitative analysis of the role of silicon carbide integrated photonics in three key application areas: quantum networking, simulation, and computing.