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電子情報通信学会技術研究報告. SCE, 超伝導エレクトロニクス

プログラマブル・ジョセフソン電圧標準用NbN/TiN/NbN接合アレーの作製と評価

真弓 石崎, 弘毅 山森, 彰 東海林

Published Jan 16, 2004• 0 citations
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プログラマブル・ジョセフソン電圧標準用NbN/TiN/NbN接合アレーの作製と評価(デバイス・一般)

真弓 石崎, 弘毅 山森, 彰 東海林

電子情報通信学会技術研究報告. SCE, 超伝導エレクトロニクス•Jan 16, 2004•0 citations

NbN/TiN x /NbN/TiN x /NbN二重接合スタックを用いた10VプログラマブルJosephson電圧標準回路

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Fabrication and Characterization of Epitaxial TiN-Based Josephson Junctions for Superconducting Circuit Applications

Kazumasa Makise, R. Sun, Hirotaka Terai +1 more

We investigated full-epitaxial TiN/AlN/TiN Josephson junctions on MgO substrates for superconducting qubit applications. The critical temperature (TC) of TiN film is relatively low at around 5 K, but its lattice constant is about 0.424 nm, which is close to the lattice constant of MgO of 0.421 nm. TiN and AIN films were prepared by DC magnetron sputtering in a load-lock sputtering system with an ultra-high vacuum chamber. The deposition temperature was varied from ambient temperature to 1073 K. In XRD analysis, (200) peaks were observed in both the TiN single layer film and the TiN/AIN/TiN trilayer film. No other XRD peaks were observed in the single layer or trilayer films. The lattice constant of TiN was determined to be 0.4242 nm from XRD analysis, close to the value of 0.4212 nm for MgO. The 150 nm-thick single-layer TiN film on the MgO substrate showed a TCof 5.3 K and a resistivity of 3.5 μΩcm at 10 K. Based on these epitaxial TiN films, we fabricated TiN/AIN/TiN Josephson junctions and measured their current-voltage characteristics. At 1.9 K, the electrical parameters of junctions with JC= 50 A/cm2showed that the gap voltage and the ratio of Rsg/RNwere about 2.5 mV and 2.1, respectively.

IEEE Transactions on Applied Superconductivity•Oct 22, 2014•19 citations

NbN膜,Nb膜を電極に用いた単一磁束量子メモリセルの集積 (ジョセフソンコンピュ-タ技術特集)

彰 東海林, 紳 幸坂, Fujitoshi Shinoki

電子技術総合研究所彙報•Apr 1, 1984•0 citations

Coupling of a single tin-vacancy center to a photonic crystal cavity in diamond

Kazuhiro Kuruma, Benjamin Pingault, Cleaven Chia +5 more

We demonstrate optical coupling between a single tin-vacancy (SnV) center in diamond and a free-standing photonic crystal nanobeam cavity. The cavities are fabricated using quasi-isotropic etching and feature experimentally measured quality factors as high as ∼11 000. We investigate the dependence of a single SnV center's emission by controlling the cavity wavelength using a laser-induced gas desorption technique. Under resonance conditions, we observe an intensity enhancement of the SnV emission by a factor of 12 and a 16-fold reduction of the SnV lifetime. Based on the large enhancement of the SnV emission rate inside the cavity, we estimate the Purcell factor for the SnV zero-phonon line to be 37 and the coupling efficiency of the SnV center to the cavity, the β factor, to be 95%. Our work paves the way for the realization of quantum photonic devices and systems based on efficient photonic interfaces using the SnV color center in diamond.

arXiv:2105.01715•Applied Physics Letters•Jun 7, 2021•78 citations

単結晶 NbN を用いたサブミリ波帯SIS電磁波受信機の開発

彰 川上, 佳憲 鵜澤, 正典 武田

電子情報通信学会技術研究報告. SCE, 超伝導エレクトロニクス•Apr 23, 2003•0 citations
We investigated full-epitaxial TiN/AlN/TiN Josephson junctions on MgO substrates for superconducting qubit applications. The critical temperature (TC) of TiN film is relatively low at around 5 K, but its lattice constant is about 0.424 nm, which is close to the lattice constant of MgO of 0.421 nm. TiN and AIN films were prepared by DC magnetron sputtering in a load-lock sputtering system with an ultra-high vacuum chamber. The deposition temperature was varied from ambient temperature to 1073 K. In XRD analysis, (200) peaks were observed in both the TiN single layer film and the TiN/AIN/TiN trilayer film. No other XRD peaks were observed in the single layer or trilayer films. The lattice constant of TiN was determined to be 0.4242 nm from XRD analysis, close to the value of 0.4212 nm for MgO. The 150 nm-thick single-layer TiN film on the MgO substrate showed a TCof 5.3 K and a resistivity of 3.5 μΩcm at 10 K. Based on these epitaxial TiN films, we fabricated TiN/AIN/TiN Josephson junctions and measured their current-voltage characteristics. At 1.9 K, the electrical parameters of junctions with JC= 50 A/cm2showed that the gap voltage and the ratio of Rsg/RNwere about 2.5 mV and 2.1, respectively.
We demonstrate optical coupling between a single tin-vacancy (SnV) center in diamond and a free-standing photonic crystal nanobeam cavity. The cavities are fabricated using quasi-isotropic etching and feature experimentally measured quality factors as high as ∼11 000. We investigate the dependence of a single SnV center's emission by controlling the cavity wavelength using a laser-induced gas desorption technique. Under resonance conditions, we observe an intensity enhancement of the SnV emission by a factor of 12 and a 16-fold reduction of the SnV lifetime. Based on the large enhancement of the SnV emission rate inside the cavity, we estimate the Purcell factor for the SnV zero-phonon line to be 37 and the coupling efficiency of the SnV center to the cavity, the β factor, to be 95%. Our work paves the way for the realization of quantum photonic devices and systems based on efficient photonic interfaces using the SnV color center in diamond.