Multilayer ion trap technology for scalable quantum computing and quantum simulation

A. Bautista-Salvador, Giorgio Zarantonello, H. Hahn, A Preciado-Grijalva, Jonathan Morgner, M. Wahnschaffe, C. Ospelkaus

Published Jan 1, 2019• 22 citations

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Abstract

We present a novel ion trap fabrication method enabling the realization of multilayer ion traps scalable to an in principle arbitrary number of metal-dielectric levels. We benchmark our method by fabricating a multilayer ion trap with integrated three-dimensional microwave circuitry. We demonstrate ion trapping and microwave control of the hyperfine states of a laser cooled 9Be+ ion held at a distance of 35 above the trap surface. This method can be used to implement large-scale ion trap arrays for scalable quantum information processing and quantum simulation.

DOI: 10.15488/10409

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