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IEICE Technical Report; IEICE Tech. Rep.

Fabrication and characteristics evaluation of superconducting single photon detector on Si substrate

Tomohiro Higashi, Shigehito Miki, Taro Yamashita, Hirotaka Terai, Takashi Yamamoto, Nobuyuki Imoto, Zhen Wang

Published Jan 17, 2013• 0 citations
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Superconductor Science and Technology•May 11, 2021•12 citations
Superconducting nanowire single photon detectors (SNSPDs) based on Si substrates have demonstrated excellent performance, such as high efficiency, low dark count rate, short reset time and low timing jitter. But due to the lattice mismatch between NbN and Si substrate, the performance of film is limited. To this end, Nb5N6layer is fabricated as the buffer layer between the NbN film and Si substrate, and that will reduce the mismatch and optimize superconducting properties of NbN films. The 6nm-thick film with a 65 nm-thick buffer layer shows the zero resistance critical temperature (Tc0) of 13.27 K, which is 5 K higher than that without buffer. Based on the NbN film on the buffered substrate, we fabricated SNSPD devices demonstrate critical current (IC) of 65 μA which is 5 ~ 6 times higher to the detectors without buffer. Besides, the experiment results prove that the buffer layer reduces the kinetic inductance, which fasten the recovery of nanowire.
We present our research on fabrication and structural and transport characterization of ultrathin superconducting NbN layers deposited on both single-crystal Al2O3 and Si wafers, and SiO2 and Si3N4 buffer layers grown directly on Si wafers.The thicknesses of our films varied from 6 nm to 50 nm and they were grown using reactive RF magnetron sputtering on substrates maintained at the temperature 850 • C. We have performed extensive morphology characterization of our films using the X-ray diffraction method and atomic force microscopy, and related the results to the type of the substrate used for the film deposition.Our transport measurements showed that even the thinnest, 6 nm thick NbN films had the superconducting critical temperature of 10-12 K, which was increased to 14 K for thicker films.
Abstract Superconducting nanowire single-photon detectors (SNSPDs) wherein ultrathin films are fabricated on Si substrates are greatly affected by lattice mismatch between the thin film and the substrate. A buffer layer can be used to reduce such lattice mismatch or optimize the strain in the film, thereby improving device performance. We prepared and optimized Nb 5 N 6 as a buffer layer and found that it considerably improved the properties of NbN films on Si substrates. The zero-resistance critical temperature ( T C0 ) of a 3 nm thick NbN film with a 20 nm thick buffer layer was 10.3 K. SNSPDs with Nb 5 N 6 -buffered NbN films were fabricated and compared with normal devices; the fabricated devices had high hysteresis current and low timing jitter. Furthermore, we investigated the thermal diffusion process of the device based on the hysteresis current and hotspot relaxation time and found that Nb 5 N 6 buffer layers enhance the thermal coupling between the superconducting film and substrates. The relaxation time of buffered SNSPD was 14.2 ps, which was shorter than that of nonbuffered SNSPD by 17.8 ps. These effects explain the performance improvement observed in the case of the buffered devices.