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Fabrication of patterned pyramidal micromirros and current carrying wires for atom chips

G. Lewis, Z. Moktadir, Carsten Gollasch, Michael Trupke, F. Ramírez-Martínez, J. Ashmore, E. A. Hinds, Michael D. Kraft

Published Jan 1, 2007• 0 citations
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This paper describes the design and fabrication of an atom chip for atom tunneling experiments. A fabrication process was developed that uses a combination of UV-optical and Electron-Beam lithography to pattern micrometer and nanometer scale copper wires on a single chip. The minimum wire width fabricated in this work is 200 nm. The wires can carry current densities of more than 7.5times107A/cm2. The electrical current tests establish the feasibility of realizing chip-based atom tunneling experiments.