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Symposium on Photonics and Optoelectronics

Studies on the Effect of Laser Cooling in Atom Lithography for Nanometrology

Weigang Gong, Yan Ma, Tongbao Li

Published May 1, 2012• 0 citations
Publisher

Abstract

To meet the requirement of nanoscale dimensional metrology, lengthy standards with features below 100 nanometers are indispensable instruments. Our group has successfully fabricated length standards through atom lithography. For further improvement of the quality of these standards, laser cooling of Chromium atom beam was studied through a transverse Doppler cooling scheme. Moreover, utilizing the software developing kit (SDK) of CCD camera, we developed an image collecting software, which had functions of real-time display for gray-scale image and image measure. In our experimental setup, with the software, we could detect the laser induced fluorescence spots from marginal beams to monitor and analyze the effect of laser cooling.

DOI
10.1109/sopo.2012.6270455

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To meet the requirement of nanoscale dimensional metrology, lengthy standards with features below 100 nanometers are indispensable instruments. Our group has successfully fabricated length standards through atom lithography. For further improvement of the quality of these standards, laser cooling of Chromium atom beam was studied through a transverse Doppler cooling scheme. Moreover, utilizing the software developing kit (SDK) of CCD camera, we developed an image collecting software, which had functions of real-time display for gray-scale image and image measure. In our experimental setup, with the software, we could detect the laser induced fluorescence spots from marginal beams to monitor and analyze the effect of laser cooling.
A quantum mechanical Monte Carlo simulation is carried out for one-dimensional laser cooling of Chromium atoms. Chromium atom beam collimation via transverse laser cooling is essential for the fabrication of periodic nanometer scale structures by laser-focused atomic deposition. Such structures can be used as precision pitch standards for nanometer scale measurement and engineering. We explore the roles played by several factors, such as laser intensity and detuning, in the cooling process. Calculation results show different dependencies for cooling rate and ultimate temperature to be reached with given sets of parameters. Also, for atoms with different initial velocities in the transverse direction, the conditions under which optimal collimation effect is achieved can differ. Consequently, the current experimental setup, which utilizes LIF spots from marginal beams to monitor the laser collimation, can produce cooling effects which are not optimal for the end product.
The technology of laser-focused atomic deposition can be used to develop the nanostructure transfer standard of length.The atomic laser cooling is a key technique in atom lithography.A theoretical investigation of chromium atomic beam in optical traps is reported in this paper.The Doppler and sub-Doppler laser cooling forces are discussed and some characteristics of these forces are shown based on the semi-classical theory.The simulation results indicate that the atomic beam can be collimated by these laser cooling forces,especially by sub-Doppler laser cooling force and can reach the Doppler limit 120 μk,relative horizontal-speed 13.87 cm/s.
Atom lithography has now become an important means for manufacturing Nano-scale gratings, which are indispensable instruments for Nano-scale dimensional metrology. However, the presence of laser frequency drift makes the results unsatisfactory. Using the atoms’ laser induced fluorescence (LIF) to stabilize the laser frequency provides an effective method of overcoming the drift. This paper gives an analysis with regard to our own experimentation conditions in some aspects, such as fluorescence of Cr beam, difference signal, the correlation between laser frequency and the central of fluorescence. Based on the analysis, the laser induced fluorescence frequency stabilizing equipment is built in our selfdesigned system of chromium atom lithography. The laser is detuned near the wavelength of the 7S3→7P40 transition of 52Cr, so that the atom beam could be illuminated. The power of the laser we used is 15mW. The position of the fluorescent spot depends on detune of the laser. This spot is imaged onto a split- photodiode. Whenever the laser frequency exhibits some deviations from the desired value, the difference signal between the right and the left area of the detector is non-zero. The measured signal is used to servo-lock the laser. It is acquired by the servo-lock port of the Ti:sapphire laser. As a result, the laser frequency is stabilized in the wavelength corresponding to 7S3→7P40 transition of 52Cr. The stability is superior
In this paper,a size detecting system based on Laser induced fluorescence(LIF)is designed to measure the Cr atomic beam divergence of laser collimation by using one-dimensional transverse Doppler cooling scheme.Under the parameters of cooling laser power of 45mW,interaction distance of 24mm and detuning of-0.5Γ,we observe the angular distribution of Cr atoms(50%quantile) on the beam axis is from 1.07±0.10mrad to 0.46±0.10mrad by laser collimation.we also present detailed measurements of collimation angles over different laser powers and compare and analysis our results with numerical calculation based on the semiclassical model.
We developed an atom-optical system that utilized a laser diode (LD) for both laser atom cooling and trapping. The LD is easy to maintain and operate, and is therefore suitable for engineering applications. The neutral atom beam of chromium was collimated by Doppler cooling and focused by a standing wave lens, and then directly deposited onto a silicon substrate. A nanograting structure with periodicity identical to the wavelength of the standing wave, 212.78 nm, was successfully achieved. The atom beam generation, collimating, focusing and deposition processes were experimentally and theoretically investigated.