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Journal of Applied Physics

Photoluminescence excitation measurements on erbium implanted GaN

John T. Torvik, Robert J. Feuerstein, C. H. Qiu, J. I. Pánkové, Fereydoon Namavar

Published Aug 15, 1997• 16 citations
Publisher

Abstract

The temperature dependence of the optical excitation cross section of Er implanted n-type GaN was studied using photoluminescence excitation spectroscopy. Due to the large 3.4 eV band gap of GaN, it was possible to probe two Er absorption lines using a tunable Ti:sapphire laser in the 770–1010 nm range. Photoluminescence excitation spectra exhibiting several Stark splittings revealed a complex dependence upon temperature. The largest excitation cross section in the third excited state was 1.65×10−20 cm2 at an excitation wavelength of 809.4 nm when measured at 77 K. This value is roughly three times larger than the cross section in the second excited state at 4.8×10−21 cm2 when pumping at 983.0 nm. The Er-related photoluminescence was reduced between 1.5 and 4.8 times when going from 77 K to room temperature, except when pumping around 998 nm. At this excitation wavelength the room temperature photoluminescence was stronger by a factor of 1.26 compared to that at 77 K.

DOI
10.1063/1.365985

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Physical review. B, Condensed matter•Jul 5, 2001•52 citations
The temperature dependence of the optical excitation cross section of Er implanted n-type GaN was studied using photoluminescence excitation spectroscopy. Due to the large 3.4 eV band gap of GaN, it was possible to probe two Er absorption lines using a tunable Ti:sapphire laser in the 770–1010 nm range. Photoluminescence excitation spectra exhibiting several Stark splittings revealed a complex dependence upon temperature. The largest excitation cross section in the third excited state was 1.65×10−20 cm2 at an excitation wavelength of 809.4 nm when measured at 77 K. This value is roughly three times larger than the cross section in the second excited state at 4.8×10−21 cm2 when pumping at 983.0 nm. The Er-related photoluminescence was reduced between 1.5 and 4.8 times when going from 77 K to room temperature, except when pumping around 998 nm. At this excitation wavelength the room temperature photoluminescence was stronger by a factor of 1.26 compared to that at 77 K.
Dependences of the erbium photoluminescence intensity in Si:Er/Si structures have been studied in cases of homogeneous (over the sample surface) and inhomogeneous optical excitation. It is shown that the excitation mode strongly affects the type of the dependences obtained. A method for determining the excitation cross section of the Er ion under both continuous and pulsed optical pumping is discussed. The value obtained for the effective excitation cross section of erbium ions in silicon, σ = 5 × 10 −14 cm 2 at a temperature of 8 K, is an order of magnitude larger than the values known from published material.
The photoluminescence spectra of Yb-implanted InP samples were studied under pulsed and cw excitations using an Ar+-ion laser (above band-gap excitation) at different temperatures and excitation intensities. The photoluminescence spectrum of the 4f transitions 2F5/2–2F7/2 consists of a sharp peak at 1001 nm and broader peaks in the spectral range between 1002.5 and 1010 nm. Time-resolved spectra were recorded at different temperatures. Using a tunable Ti:sapphire laser (above and below band-gap excitation) the photoluminescence excitation spectra were investigated for different emission lines. Study of the rise and decay time under intrinsic excitation (band to band) show that the rise time is a function of excitation intensity, which reflects an indirect excitation process for Yb3+. The experimental data are explained using a kinetics model of energy transfer from the host lattice to the localized core excited states of rare-earth isoelectronic structured traps. The numerically simulated luminescence rise and decay times show a good general quantitative agreement with experimental data, over a wide range of generation rates. The photoluminescence spectra and decay time were also studied as a function of temperature. A quenching mechanism of ytterbium luminescence involving Yb and Fe ions is proposed. Finally, the electric-field quenching of InP:Yb photoluminescence is investigated.
Abstract Characterization of the atomic level processes that determine optical transitions in emerging materials is critical to the development of new platforms for classical and quantum networking. Such understanding often emerges from studies of the temperature dependence of the transitions. We report measurements of the temperature dependent Er 3+ photoluminescence in single crystal Er 2 O 3 thin films epitaxially grown on Si(111) focused on transitions that involve the closely spaced Stark-split levels. Radiative intensities are compared to a model that includes relevant Stark-split states, single phonon-assisted excitations, and the well-established level population redistribution due to thermalization. This approach, applied to the individual Stark-split states and employing Er 2 O 3 specific single-phonon-assisted excitations, gives good agreement with experiment. This model allows us to demonstrate the difference in the electron-phonon coupling of the 4 S 3/2 and 2 H 11/2 states of Er 3+ in E 2 O 3 and suggests that the temperature dependence of Er 3+ emission intensity may vary significantly with small shifts in the wavelength (~0.1 nm) of the excitation source.
An erbium-doped silicon transistor prepared by ion implantation and co-doped with oxygen is investigated by photocurrent generation in the telecommunication range. The photocurrent is explored at room temperature as a function of the wavelength by using a supercontinuum laser source working in the μW range. The 1-μm² transistor is tuned to involve in the transport only those electrons lying in the Er-O states. The spectrally resolved photocurrent is characterized by the typical absorption line of erbium and the linear dependence of the signal over the impinging power demonstrates that the Er-doped transistor is operating far from saturation. The relatively small number of estimated photoexcited atoms (≈ 4 × 10 4 ) makes Er-dpoed silicon potentially suitable for designing resonance-based frequency selective single photon detectors at 1550 nm.
Based on a detailed consideration of excitation mechanisms of erbium in crystalline and amorphous matrix we present an analysis of the physical meaning of the Auger excitation cross section of Er3+{\mathrm{Er}}^{3+}Er3+ ions in semiconductor. It is demonstrated that large values of Auger excitation cross sections under optical pumping in semiconductor matrices are due to large values of band-to-band absorption coefficient exceeding by several orders of magnitude the absorption coefficient of erbium in dielectric SiO2{\mathrm{SiO}}_{2}SiO2​ and Al2O3{\mathrm{Al}}_{2}{\mathrm{O}}_{3}Al2​O3​ matrix. The Auger excitation cross section of Er3+{\mathrm{Er}}^{3+}Er3+ in semiconductor matrices is roughly given by the ratio of the matrix absorption coefficient to concentration of Er3+{\mathrm{Er}}^{3+}Er3+ ions. While the analysis of the excitation cross section is carried out for Er-doped crystalline and amorphous silicon, the results are expected to be applicable to the other rare-earth doped semiconductors. Based on low-temperature experimental results for crystalline silicon we get the Auger excitation coefficient of ${c}_{A}^{\mathrm{cryst}}\ensuremath{\approx}7\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}10} {\mathrm{cm}}^{3}{\mathrm{s}}^{\ensuremath{-}1}$ and the effective excitation cross section ${\ensuremath{\sigma}}_{\mathrm{eff}}^{\mathrm{cryst}}=(2\ensuremath{-}8)\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}12} {\mathrm{cm}}^{2}.$ For amorphous silicon at 100 K we obtain ${\ensuremath{\sigma}}_{\mathrm{eff}}^{\mathrm{amorph}}\ensuremath{\approx}1.4\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}14} {\mathrm{cm}}^{2}.$