The fine control of a neutral atomic beam by radiation pressure has opened a new field called atom lithography. In particular, a direct writing method, which focuses an atomic beam with a standing-wave light field into narrow lines, has been demonstrated. A velocity-controlled and isotope-selected atomic beam is essential for improving the performance of this lithography method. An atomic deflection technique using radiation pressure is indispensable for producing such an atomic beam. Here we report on an atomic beam guide using a one-dimensional magneto-optical trap (1D-MOT). First we decelerate atoms whose velocities lie in the range between 250 and 320 m/s. A diode laser (780 nm) is used as the light source for deceleration and its injection current is modulated at 2 MHz. Then the decelerated beam is deflected by a tilted 1D-MOT, which consists of four copper rods and four rectangular mirrors.
We demonstrate experimentally the continuous and pulsed loading of a slow and cold atomic beam into a magnetic guide. The slow beam is produced using a vapor loaded laser trap, which ensures two-dimensional magneto-optical trapping, as well as cooling by a moving molasses along the third direction. It provides a continuous flux larger than
109 atoms/s with an adjustable mean velocity ranging from 0.3 to 3 m/s, and with longitudinal and transverse temperatures smaller than
100μK. Up to
3108 atoms/s are injected into the magnetic guide and subsequently guided over a distance of 40 cm.
We present an intense source of 87 Rb atoms that has been set up to produce a continuous, slow and cold beam in a magnetic guide. It consists of a two-dimensional magneto-optical trap whose cooling laser power is provided by a master-oscillator tapered-amplifier system. This trap produces an atomic beam with a flux of over 10 10 atoms/s and a mean velocity of 40 m/s. The beam is recaptured by a second trap whose purpose consists in reducing the beam's velocity, in further cooling the atoms and injecting them into the magnetic guide. The article focusses on the first stage of the process described above.