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Microelectronic Engineering

Sub-100 nm structures by neutral atom lithography

Th. Schulze, B. Brezger, Piet O. Schmidt, Robert George Mertens, A.S. Bell, Tilman Pfau, J. Mlynek

Published May 1, 1999• 25 citations
Publisher
DOI
10.1016/s0167-9317(99)00026-x

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Summary form only given. Recently it has been demonstrated that neutral atomic beams can be focused by use of a laser as an atom-optical lens. Standing wave atom-optical (SW) lenses have been of particular interest because of the potential for both high-resolution and high-throughput lithography. In this paper, using sub-Doppler optical cooling schemes in conjunction with mechanical collimation, and a SW with /spl sigma/=56 /spl mu/m, we have been able to achieve <20 nm resolution with contrast of at least 10:1, focusing a thermal atomic sodium beam using 589-nm light corresponding to the D/sub 2/ transition.
We show that light can be used as a lens to focus a collimated neutral atomic beam to submicron dimensions during deposition onto a substrate. We have used an optical standing wave at 589 nm as an array of cylindrical lenses to focus a perpendicular sodium beam into a grating on a substrate, with a periodicity of 294.3\ifmmode\pm\else\textpm\fi{}0.3 nm. This result is the first direct evidence of submicron focusing of atoms by light, and represents a fundamentally new scheme for submicron lithography.
Atom lithography uses neutral atoms, e. g. cesium, to produce small structures with nanometer resolution on wafers by transforming a light intensity pattern into a density pattern of an atomic beam. In order to achieve a 2D complex structure, two elementary holographic gratings are written in an iron-doped lithium- niobate crystal, using light with the wavelength 852 nm. Illuminating the crystal with the reference wave simultaneously reconstructs two signal waves, and these three beams interfere and create a light pattern with two different grating periods. This light pattern is imprinted onto a beam of cesium atoms. A characterization of the ’’holographic mirror” as well as the results of the atom lithography experiment are presented, and some further extensions and perspectives of this new method are discussed.