Optics Express
Photon antibunching from a single lithographically defined InGaAs/GaAs quantum dot
Varun Boehm Verma, Martin J. Stevens, Kevin L. Silverman, Neville L. Dias, A. Garg, J. J. Coleman, Richard P. Mirin
Abstract
We demonstrate photon antibunching from a single lithographically defined quantum dot fabricated by electron beam lithography, wet chemical etching, and overgrowth of the barrier layers by metalorganic chemical vapor deposition. Measurement of the second-order autocorrelation function indicates g(2)(0)=0.395±0.030, below the 0.5 limit necessary for classification as a single photon source.