Simulation of laser-focused atomic deposition for nanostructure fabrication

Jabez J. McClelland, R. J. Celotta

陈献忠

Jabez J. McClelland

R. J. Celotta, Jabez J. McClelland, Robert E Scholten +1 more

Robert E Scholten, Jabez J. McClelland, E. C. Palm +2 more

The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to form a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical means, is focused onto the substrate by dipole forces from the standing wave pattern so as to deposit a series of lines spaced by half the laser wavelength. We describe the fabrication of a Cr nanograting formed using this new technique. The experimental arrangement for deposition and the optical collimation of the atom beam are described. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) images of the resulting nanostructures are presented.

Shan Ma

The technology of laser-focused atomic deposition can be used to develop the nanostrucrure transfer standard of length.When the frequency of laser standing wave is higher than the resonant frequency of atoms,the atoms will be focused on the wave node of the standing wave.The collimated Cr atoms are focused by a standing-wave laser field as they are deposited on a silicon substrate.Atomic force microscopy measurements shows a spacing of 215nm.