Japanese Journal of Applied Physics
Phonon-Induced Transverse Relaxation in LaF3:Pr3+ Measured by Photon Echoes
T. Kohmoto, Hiroki Nakatsuka, Masahiro Matsuoka
Abstract
Temperature dependences of backward photon echo intensity have been measured from 5°K to 13°K on the 3P0–3H4 (4778 Å) and 1D2–3H4 (5925 Å) transitions of LaF3:Pr3+. Over six orders of magnitude (on the 3P0–3H4 transition) and three orders of magnitude (on the 1D2–3H4 transition) of the photon echo intensity, the experimental results are explained by the one-phonon process (the direct process) taking into account the energy differences between the echo levels and their adjacent levels. Preliminary measurements have also been made on the 4G7/2–4I9/2 (5221 Å) and 4G5/2–4I9/2 (5775 Å) transitions of LaF3:Nd3+.