Epitaxial superconductor/semiconductor/metal nitride heterostructure for single-photon detection
Shangjr Gwo, Chang-Wei Cheng, Yan-Jyun Liao +4 more
Abstract Superconducting nanowire single-photon detectors (SNSPDs) have become increasingly important for both classical and quantum applications requiring single-photon sensing. Most current SNSPDs based on superconducting niobium nitride (NbN) ultrathin films are fabricated utilizing polycrystalline or amorphous superconductor films, and film inhomogeneity and defectivity can cause significant issues. Here, we present an all-epitaxial approach for fabricating SNSPDs with integrated metal reflectors, semiconductor (dielectric) resonators, and superconductor nanowire detectors. A working example is realized by molecular-beam epitaxy growth of a tri-layered heterostructure, consisting of a titanium nitride (TiN) reflector with ~ 92% reflectivity at the telecommunication wavelength (1550 nm), an aluminum nitride (AlN) resonator with a broad optical transparency window, and a NbN nanowire on c -plane sapphire wafer. The all-epitaxial approach provides a manufacturable platform with superior material properties, as well as uniformity across the wafer, which manifest themselves in tunable material parameters of the superconducting nanowire, including normal-state resistance, superconducting critical temperature, superconducting critical current, and kinetic inductance. The optimized material properties can be utilized to achieve excellent SNSPD performance, including wafer-scale uniformity in device characteristics and broadband (~300 nm) system detection efficiency (>90%) centered at 1550 nm, suitable for large-scale detector arrays and wavelength-division multiplexing (WDM) applications.
Communications Materials•Oct 29, 2026•0 citations