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Bulletin of the American Physical Society

Behavior of a Josephson Flux Qubit on a Sapphire Substrate

Anthony J. Przybysz, E. Crowe, H. Dharma Kwon, Benjamin K. Cooper, Rupert Lewis, B. S. Palmer, J. R. Anderson, Christopher J. Lobb, F. C. Wellstood

Published Mar 17, 2009• 0 citations
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In this work, we study a series of tunable flux qubits inductively coupled to a coplanar waveguide resonator fabricated on a sapphire substrate. Each qubit includes an asymmetric superconducting quantum interference device, which is controlled by the application of an external magnetic field and acts as a tunable Josephson junction. The tunability of the qubits is typically $\ifmmode\pm\else\textpm\fi{}3.5\phantom{\rule{0.2em}{0ex}}\mathrm{GHz}$ around their central gap frequency. The measured relaxation times are limited by dielectric losses in the substrate and can attain ${T}_{1}\ensuremath{\sim}8\phantom{\rule{0.2em}{0ex}}\text{\ensuremath{\mu}}\mathrm{s}$. The echo dephasing times are limited by flux noise even at optimal points and reach ${T}_{2E}\ensuremath{\sim}4\phantom{\rule{0.2em}{0ex}}\text{\ensuremath{\mu}}\mathrm{s}$, almost an order of magnitude longer than state of the art.
Sapphire Machining Integrated with Superconducting Qubits In article number 2411780, Connor D. Shelly and co-workers from OQC and the University of Southampton present the integration of machining of sapphire substrates with superconducting qubits and quantum processors. It is shown that this sapphire machining process is compatible with the production of high-coherence qubits whilst maintaining tight Josephson junction parameter spread. This work provides a route to further scaling of quantum processors on sapphire.
Abstract Tantalum and aluminum on sapphire are widely used platforms for qubits of long coherent time. As quantum chips scale up, the number of Josephson junctions on Sapphire increases. Thus, both the uniformity and stability of the junctions are crucial to quantum devices, such as scalable superconducting quantum computer circuit, and quantum-limited amplifiers. By optimizing the fabrication process, especially, the conductive layer during the electron beam lithography process, Al/AlOx/Al junctions of sizes ranging from 0.0169 to 0.04 µm2 on sapphire substrates were prepared. The relative standard deviation of room temperature resistances (RN) of these junctions is better than 1.7% on 15 mm×15 mm chips, and better than 2.66% on 2 inch wafers, which is the highest uniformity on sapphire substrates has been reported. The junctions are robust and stable in resistances as temperature changes. The resistances increase by the ratio of 9.73% relative to RN as the temperature ramp down to 4K, and restore their initial values in the reverse process as the temperature ramps back to RT. After being stored in a nitrogen cabinet for 100 days, the resistance of the junctions changed by1.16% in average. The demonstration of uniform and stable Josephson junctions in large area paves the way for the fabrication of superconducting chip of hundreds of qubits on sapphire substrates.