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Chinese Physics Letters

Atom Lithography with a Chromium Atomic Beam

张文涛, 李同保

Published Jan 1, 2006• 0 citations
OpenAlex

Abstract

直接写原子平版印刷术是反响的光在习惯于模式的一种新技术当原子在底层上扔时，一根原子横梁和 nanostructures 被形成。我们设计实验安装由通过与 425.55 nm 的波长承受波浪到硅底层上的 off-resonsant 激光扔 Cr-52 的一根原子横梁制作铬 nanolines。产生 nanolines 展览有 1 nm 的高度的 215 +/- 2nm 的一个时期。

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直接写原子平版印刷术是反响的光在习惯于模式的一种新技术当原子在底层上扔时，一根原子横梁和 nanostructures 被形成。我们设计实验安装由通过与 425.55 nm 的波长承受波浪到硅底层上的 off-resonsant 激光扔 Cr-52 的一根原子横梁制作铬 nanolines。产生 nanolines 展览有 1 nm 的高度的 215 +/- 2nm 的一个时期。
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patterned flux is then deposited onto a substrate, resulting in a nanostructured thin film. The smallest structures that have been made thus far using this technique are around 30 nm wide. This thesis investigates the technique, expanding its possibilities. The work-horse for the development of atom lithography has been Cr, as this transition metal atom has a closed transition in a wavelength range that is accessible to dye lasers. We extend the technique to Fe, the first ferromagnetic element to be used for atom lithography. The setup that was used to do this experiment is described, along with its critical design parameters. We present nanostructures that are typically 50 nm wide, and up to 4 nm high. The spacing between the nanolines is 186.05 nm. The nanostructure profile is compared to that of a simulated deposition process, and found to match. To the authors’ knowledge, this is the first demonstration of direct write atom lithography without laser cooling. A preliminary incursion into the magnetic properties of the nanostructures deposited is presented. In addition to giving an overview of the general ferromagnetic properties that might be expected, a deeper investigation of the magnetic anisotropy of the nanostructures deposited in this experiment is given. Novel resonant light masks are used in an experiment performed at the University of Konstanz (Germany). These light masks, using exactly instead of nearly resonant light, reveal some intriguing quantum mechanical effects. The most important of these features is the possibility to place structures closer together – at quarter wavelength spacings rather than half-wavelength intervals. Finally, the influence of surface diffusion on the structures obtained in an atom lithography experiment is investigated using kinetic Monte Carlo simulations. Several diffusion limiting effects are investigated; the influence of small amounts of residual reactive background gas is found to describe the experimental observations.
In this paper we report on experiments generating complex one-dimensional nanoscale patterns with the laser-focused atomic deposition technique. A beam of collimated chromium atoms intersect with an exact on-resonant laser standing wave at 7 S 3 → 7 transition of 52 Cr. With the usage of proper laser intensity and reflectivity of the retroreflecting mirror, which are used to form the standing wave, nanolines with complex spatial frequencies (both λ /2 and λ /4) can be fabricated in one-step deposition. The proportion of the two structures could be 1:1.