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Physical Review A

Measurement of atomic diffraction phases induced by material gratings (5 pages)

John D. Perreault

Published Jan 1, 2006• 0 citations
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In atom optics a material structure is commonly regarded as an amplitude mask for atom waves. However, atomic diffraction patterns formed using material gratings indicate that material structures also operate as phase masks. In this study a well collimated beam of sodium atoms is used to illuminate a silicon nitride grating with a period of 100 nm. During passage through the grating slots atoms acquire a phase shift due to the van der Waals interaction with the grating walls. As a result the relative intensities of the matter-wave diffraction peaks deviate from those expected for a purely absorbing grating. Thus a complex transmission function is required to explain the observed diffraction envelopes. An optics perspective to the theory of atomic diffraction from material gratings is put forth in the hopes of providing a more intuitive picture concerning the influence of the vdW potential. The van der Waals coefficient $C_{3} = 2.7\pm 0.8{meV nm}^{3}$ is determined by fitting a modified Fresnel optical theory to the experimental data. This value of $C_{3}$ is consistent with a van der Waals interaction between atomic sodium and a silicon nitride surface.

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Atom diffraction from magnetic gratings in the thin phase-grating approximation

Timothy J. Davis

The European Physical Journal D•Jun 1, 2001•2 citations
Atom-surface interactions can significantly modify the intensity and phase of atom de Broglie waves diffracted by a silicon nitride grating. This affects the operation of a material grating as a coherent beam splitter. The phase shifts induced by diffraction are measured by comparing the relative phases of several interfering paths in a Mach-Zehnder Na atom interferometer formed by three material gratings. The values of the diffraction phases are consistent with a simple model which includes a van der Waals atom-surface interaction between the Na atoms and the silicon nitride grating bars.
In atom optics a material structure is commonly regarded as an amplitude mask for atom waves. However, atomic diffraction patterns formed using material gratings indicate that material structures also operate as phase masks. In this study a well collimated beam of sodium atoms is used to illuminate a silicon nitride grating with a period of 100 nm. During passage through the grating slots atoms acquire a phase shift due to the van der Waals interaction with the grating walls. As a result the relative intensities of the matter-wave diffraction peaks deviate from those expected for a purely absorbing grating. Thus a complex transmission function is required to explain the observed diffraction envelopes. An optics perspective to the theory of atomic diffraction from material gratings is put forth in the hopes of providing a more intuitive picture concerning the influence of the vdW potential. The van der Waals coefficient C3=2.7±0.8meVnm3C_{3} = 2.7\pm 0.8{meV nm}^{3}C3​=2.7±0.8meVnm3 is determined by fitting a modified Fresnel optical theory to the experimental data. This value of C3C_{3}C3​ is consistent with a van der Waals interaction between atomic sodium and a silicon nitride surface.