Softwaretechnik-Trends
Wideband AlN-based SIS devices for frequencies around 700 GHz
C. F. J. Lodewijk, T. Zijlstra, Denis Loudkov, T. M. Klapwijk, Fausto Patricio Mena, Andrey M. Baryshev
Abstract
We report results on SIS tunnel junctions based on AlN tunnel barriers grown with plasma nitridation from a remote inductively coupled plasma source. Results for the noise temperature are shown and compared to AlOx results in a ALMA Band 9 mixer. The parameters for AlOx devices are RnA=25 Ωμm with a normal state resistance of 25 Ω and an optimized tuning circuit. For the AlN devices we have RnA = 2.9 Ωμm (Jc=71kA/cm), A=0.36 μm, Vgap=2.77 mV, and Rsg/Rn = 14. The data for AlN devices with a not yet optimized tuning circuit show comparable noise temperatures and a flat noise response.