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arXiv:2608.09904

Surface passivation for narrowing optical linewidth of silicon T centers in nanophotonic devices

Fariba Islam, Chang-Min Lee, Kyu-Young Kim, Sorah Fischer, Purbita Purkayastha, Amirehsan Alizadehherfati, Edo Waks

quant-phphysics.opticsSubmitted Aug 10, 2026• Announced Aug 11, 2026• Revised Aug 31, 2026 (v2)
v1 · Aug 10, 2026v2 · Aug 31, 2026
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Abstract

Silicon T centers are promising spin-photon interfaces in solid-state platforms for telecom-compatible, scalable quantum information technologies. A major challenge for T centers in nanophotonics is spectral diffusion, where fluctuations in the local electric-field environment from surface and bulk charge states broaden the optical transition and reduce photon indistinguishability. Strategies that directly suppress spectral diffusion are therefore critical for improving T-center-based quantum photonic devices. Here, we use atomic-layer-deposited Al2O3 to passivate the silicon surface and demonstrate a systematic narrowing of T center optical linewidths. Across our measurements, Al2O3 passivation reduces the T center emission linewidth by up to 57%. Complementary above-bandgap illumination and spectral hole burning measurements show that the remaining linewidth contains a significant spectral-diffusion component caused by adjacent charge traps, while placing an upper bound of approximately 75 MHz on the homogeneous linewidth. This work provides a CMOS-compatible path toward generating indistinguishable photons from silicon T centers for scalable quantum photonic applications.

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Silicon T centers are promising spin-photon interfaces in solid-state platforms for telecom-compatible, scalable quantum information technologies. A major challenge for T centers in nanophotonics is spectral diffusion, where fluctuations in the local electric-field environment from surface and bulk charge states broaden the optical transition and reduce photon indistinguishability. Strategies that directly suppress spectral diffusion are therefore critical for improving T-center-based quantum photonic devices. Here, we use atomic-layer-deposited Al2O3 to passivate the silicon surface and demonstrate a systematic narrowing of T center optical linewidths. Across our measurements, Al2O3 passivation reduces the T center emission linewidth by up to 57%. Complementary above-bandgap illumination and spectral hole burning measurements show that the remaining linewidth contains a significant spectral-diffusion component caused by adjacent charge traps, while placing an upper bound of approximately 75 MHz on the homogeneous linewidth. This work provides a CMOS-compatible path toward generating indistinguishable photons from silicon T centers for scalable quantum photonic applications.
The silicon T-center is a telecom-band spin-photon interface in a manufacturable photonics platform. In nanophotonic devices, however, its optical linewidth is broadened by a fluctuating charge environment, limiting photon indistinguishability for quantum networking. Here, we address this challenge through characterization and suppression of the local charge-noise of single T-centers in lateral p-i-n waveguides, demonstrating an unheralded method of T-center optical linewidth narrowing. Above-band illumination resets the charge environment, neutralizing the local field and suppressing spectral diffusion. Across 46 emitters this reset narrows the median linewidth 3.5-fold to 0.57(11) GHz, and an optimized emitter reaches 128(22) MHz, the narrowest unheralded linewidth reported for an integrated T-center. The narrowed transition supports coherent optical Rabi oscillations with a coherence time of 20(2) ns. Finally, we perform Stark-shift tuning using the p-i-n junction, and read out the local electric field and the charge-noise width at 15 mK. An analytical model of proximal surfaces, bulk, and junction field effects provides good agreement with our findings. Our multi-pronged characterization of the nanophotonic-integrated T-center charge environment enables future device optimization toward scalable quantum interconnects.
Color centers in silicon are emerging as spin-photon interfaces operating at telecommunication wavelengths. The nanophotonic device integration of silicon color centers via ion implantation leads to significant optical-linewidth broadening, which makes indistinguishable photon generation challenging. Here, we study the optical spectral diffusion of T centers in a silicon photonic crystal cavity. We investigate the linewidth-broadening timescales and origins by measuring the temporal correlations of the resonance frequency under different conditions. Spectral hole-burning measurements reveal no spectral broadening at short timescales from 102 ns to 725 ns. We probe broadening at longer timescales using a check pulse to herald the T-center frequency and a probe pulse to measure the frequency after a wait time. The optical resonance frequency is stable up to 3 ms in the dark. Laser pulses below the silicon band gap applied during the wait time lead to linewidth broadening. Our observations establish laser-induced processes as the dominant spectral-diffusion mechanism for T centers in devices and inform materials and feedback strategies for indistinguishable photon generation.
The unrivaled maturity of its nanofabrication makes silicon a promising hardware platform for quantum information processing. To this end, efficient single-photon sources and spin-photon interfaces have been implemented by integrating color centers or erbium dopants into nanophotonic resonators. However, the optical emission frequencies in this approach are subject to temporal fluctuations on both long and short timescales, which hinders the development of quantum applications. Here, we investigate this limitation and demonstrate that it can be alleviated by integrating the emitters into Fabry-Perot instead of nanophotonic resonators. Their larger optical mode volume enables both increasing the distance to crystal surfaces and operating at a lower dopant concentration, which reduces implantation-induced crystal damage and interactions between emitters. As a result, we observe a fivefold reduction of the spectral diffusion linewidth down to 4.0(2) MHz. Calculations and experimental investigations of isotopically purified 28-Si crystals suggest that the remaining spectral instability is caused by laser-induced electric-field fluctuations. In direct comparison with a nanophotonic device, the instability is significantly reduced at the same intracavity power, enabling a tenfold increase of the optical coherence time up to 20(1) microseconds. These findings represent a key step towards spectrally stable spin-photon interfaces in silicon and their potential applications in quantum networking and distributed quantum information processing.
Silicon is an attractive host for scalable quantum photonics, but the absence of bright telecom-band emitters with optically addressable spin states has limited its use for spin-photon interfaces. Here we demonstrate the Al1-center, an aluminum--carbon defect in silicon, as a bright waveguide-integrated single-photon emitter with a ground-state spin. Using isotopically purified silicon-on-insulator nanophotonic devices, we isolate individual Al1-centers and observe high-purity single-photon emission with g(2)(0)=0.04g^{(2)}(0)=0.04g(2)(0)=0.04 without background subtraction. Time-resolved photoluminescence spectroscopy reveals a fast excited-state lifetime of 135 ns, nearly an order of magnitude shorter than the benchmark provided by the well-studied T-center. Resonant photoluminescence excitation measurements further resolve the zero-phonon transition and reveal a narrow homogeneous linewidth reaching 47 MHz, threefold narrower than the T-center under comparable temperature. Through magneto-optical spectroscopy, we resolve the spin-dependent transitions of the bound-exciton manifold and achieve spin-selective optical pumping, fulfilling the prerequisite for quantum state initialization and readout. These results establish the Al1-center as a bright telecom-band spin-photon interface in silicon photonics and introduce a promising platform for integrated quantum networks.
Single T centers in silicon have emerged as promising optically active spins for quantum networking applications. One of the major obstacles to advancing the system is their broad optical linewidth due to spectral diffusion, which is two orders of magnitude larger than their cavity-enhanced radiative linewidth. We tackle this issue by utilizing above-band optical excitation delivered via a laser scanning microscope to device-coupled single T centers, achieving up to 70% optical linewidth reduction. We attribute the linewidth narrowing effect to the filling of nearby charge traps by photo-generated free carriers. We analyze charge stabilization dynamics by exploiting pulsed above-band excitation and develop a rate equation model to describe the dynamics and to explain the observed linewidth narrowing and center shift. This work provides an effective pathway to control and reduce the optical linewidth for single T centers, clearing one of the major roadblocks to advance the single T center spin platform for quantum information and networking applications.
Spin-photon interfaces based on silicon quantum emitters offer a scalable platform for quantum computing and networking. However, achieving coherent photon emission remains a primary challenge due to stringent material quality requirements. To overcome this, we utilise high-purity molecular-beam epitaxy (MBE) to epitaxially incorporate single T centres in silicon-on-insulator (SOI) wafers. We demonstrate single T-centre emission coupled to a nanophotonic waveguide and observe significant suppression of homogeneous broadening, yielding optical linewidths as narrow as 30 MHz using natural silicon for crystal growth. These results establish epitaxial T centres as a robust foundation for coherent spin-photon interfaces in silicon quantum photonics.