Voltage-tunable Josephson Junctions on Germanium Quantum Wells with in-situ Aluminum Contacts
J. Thompson, Jason T. Dong, Bernardo Langa, Chomani Gaspe, Riss Card, Brycelynn Bailey, Shiva Davari, Bethany E. Matthews, Matthew J. Olszta, Silas Hoffman, Thomas Hazard, Kyle Serniak, Hugh Churchill, Kasra Sardashti, Christopher J. K. Richardson
Voltage-tunable Josephson junctions (VT-JJs) are an emerging element in superconducting quantum electronics with potential to expand the functionality of conventional designs. While VT-JJs are largely compatible with wafer-scale semiconductor processing, their integration into quantum circuits remains a challenge due to unmitigated semiconductor microwave loss. Here, a deep mesa etch process, wherein the epitaxial material is removed except the VT-JJ device, will facilitate the integration of VT-JJs with low-microwave-loss circuit elements by allowing these circuit elements to be placed directly on a low-loss substrate. A Germanium quantum well is grown by Molecular Beam Epitaxy (MBE) on a float zone silicon substrate with in-situ deposited aluminum contacts. This combination allows the formation of an oxide-free superconductor-semiconductor interface. The deep mesa etch process is optimized to produce a sidewall taper sufficient for continuous metal deposition from the substrate to the top of the mesa for electrostatic gate electrodes and interconnects. The fabricated Josephson junctions demonstrate gate-tunable supercurrents with a maximum critical current over 100 nA and critical-current normal-resistance product of $8.63~μV$. These results demonstrate a pathway toward improved integration of voltage-tunable superconducting circuit elements with quantum electronic building blocks such as couplers and qubits.
Voltage-tunable Josephson junctions (VT-JJs) are an emerging element in superconducting quantum electronics with potential to expand the functionality of conventional designs. While VT-JJs are largely compatible with wafer-scale semiconductor processing, their integration into quantum circuits remains a challenge due to unmitigated semiconductor microwave loss. Here, a deep mesa etch process, wherein the epitaxial material is removed except the VT-JJ device, will facilitate the integration of VT-JJs with low-microwave-loss circuit elements by allowing these circuit elements to be placed directly on a low-loss substrate. A Germanium quantum well is grown by Molecular Beam Epitaxy (MBE) on a float zone silicon substrate with in-situ deposited aluminum contacts. This combination allows the formation of an oxide-free superconductor-semiconductor interface. The deep mesa etch process is optimized to produce a sidewall taper sufficient for continuous metal deposition from the substrate to the top of the mesa for electrostatic gate electrodes and interconnects. The fabricated Josephson junctions demonstrate gate-tunable supercurrents with a maximum critical current over 100 nA and critical-current normal-resistance product of 8.63μV. These results demonstrate a pathway toward improved integration of voltage-tunable superconducting circuit elements with quantum electronic building blocks such as couplers and qubits.
Voltage-tunable Josephson junctions (VT-JJs) are an emerging element in superconducting quantum electronics with potential to expand the functionality of conventional designs. While VT-JJs are largely compatible with wafer-scale semiconductor processing, their integration into quantum circuits remains a challenge due to unmitigated semiconductor microwave loss. Here, a deep mesa etch process, wherein the epitaxial material is removed except the VT-JJ device, will facilitate the integration of VT-JJs with low-microwave-loss circuit elements by allowing these circuit elements to be placed directly on a low-loss substrate. A germanium quantum well is grown by molecular beam epitaxy (MBE) on a float zone silicon substrate with in situ deposited aluminum contacts. This combination allows the formation of an oxide-free superconductor-semiconductor interface. The deep mesa etch process is optimized to produce a sidewall taper sufficient for continuous metal deposition from the substrate to the top of the mesa for electrostatic gate electrodes and interconnects. The fabricated Josephson junctions demonstrate gate-tunable supercurrents with a maximum critical current over 100 nA and critical-current normal-resistance product of 8.63 μV. These results demonstrate a pathway toward improved integration of voltage-tunable superconducting circuit elements with quantum electronic building blocks such as couplers and qubits.
Superconducting qubit based on superconducting circuits consist of a superconducting capacitor and a Josephson junction with the transmon geometry is extensively used in advanced quantum processors, pursuing scalable quantum computing. The tuning of the qubit frequency of the transmon relies on magnetic flux-dependent interference between the supercurrents of two superconductor-insulator-superconductor (S-I-S) Josephson junctions in a superconducting loop. Josephson junction based on superconductor-semiconductor-superconductor (S-Sm-S) materials opens up a possibility to the gate-tunable transmon, referred to as the "gatemon", in which the qubit frequency can be tuned by electrostatic mean. Recent realizations of gatemons on III-V material platforms show impressive development on the alternative to the transmon, yet still leave a big question on the scalability. The silicon-germanium (SiGe) heterostructure is one of the potential platforms to host hybrid devices due to its high hole mobility and the low Schottky barrier at the Ge-metal interface. Additionally, the compatibility with the silicon-based semiconductor industry is a capable advantage for the scaling-up qubit platform.In this thesis, we develop gatemons based on the Al-Ge-Al Josephson junction in the SiGe heterostructure. Firstly, the robust fabrication recipe, found on a top-down approach, for Josephson Field Effect Transistors (JoFETs) is established. We perform measurements exhaustively on the JoFETs to study their properties as a function of the gate voltage, temperature, and magnetic field. The devices show gate-tunability of the critical current and the normal state resistance . The devices are estimated to have a high-transparency superconductor-semiconductor interface, as demonstrated by the high product on the SiGe heterostructure. In the finite-voltage regime, the features corresponded to multiple Andreev reflections (MARs) are observed. Then, we fabricate and characterize niobium nitride (NbN) superconducting resonators on SiGe heterostructure. We measure the resonators in the transmission mode and extract the resonant frequency , internal quality factor, and coupling quality factor from the transmission coefficient. Following that, we develop the fabrication process to integrate Al-Ge-Al junctions shunted with capacitors, or, in other words, gatemon, into the resonator scheme and perform the fabrication according to the design. We demonstrate the anticrossing feature in one of the fabricated gatemons. The resonant frequency of the gatemon is mapped using the two-tone spectroscopy technique and is found to be gate-tunable. The qubit has large spectral linewidth, implying a low coherence time. Additionally, we conduct the current-phase relationship (CPR) measurement on the junctions in the Superconducting QUantum Interference Device (SQUID) geometry. We can demonstrate that the junctions pose non-sinusoidal CPR. Further, the integer and half-integer Shapiro steps are observed in the current-voltage characteristic curves of irradiated junctions. This indicates that our junctions have the element, which can open up another possibility toward protected qubits.
Superconducting qubit based on superconducting circuits consist of a superconducting capacitor and a Josephson junction with the transmon geometry is extensively used in advanced quantum processors, pursuing scalable quantum computing. The tuning of the qubit frequency of the transmon relies on magnetic flux dependent interference between the supercurrents of two superconductor-insulator superconductor(S-I-S) Josephson junctions in a superconducting loop. Josephson junction based on superconductor-semiconductor-superconductor (S-Sm-S) materialsopens up a possibility to the gate-tunable transmon, referred to as the "gatemon", in which the qubit frequency can be tuned by electrostatic mean. Recent realizations of gatemons on III-V material platforms show impressive development on the alternative to the transmon, yet still leave a big question on the scalability. The silicon-germanium (SiGe) heterostructure is one of the potential platforms to host hybrid devices due to its high hole mobility and the low Schottky barrier at the Ge-metal interface. Additionally, the compatibility with the silicon-based semiconductor industry is a capable advantage for the scaling-up qubit platform.In this thesis, we develop gatemons based on the Al-Ge-Al Josephson junction in the SiGe heterostructure. Firstly, the robust fabrication recipe, found on a top down approach, for Josephson Field Effect Transistors (JoFETs) is established. We perform measurements exhaustively on the JoFETs to study their properties as a function of the gate voltage, temperature, and magnetic field. The devices show gate-tunability of the critical current (IC) and the normal state resistance (RN). The devices are estimated to have a high-transparency superconductor/semiconductor interface, as demonstrated by the high ICRN product on the SiGe heterostructure. In the finite-voltage regime, the features corresponded to multiple Andreev reflections (MARs) are observed. Then, we fabricate and characterize niobium nitride (NbN) superconducting resonators on SiGe heterostructure. We measure the resonators in the transmission mode and extract the resonant frequency (fr), internal quality factor (Qi), and coupling quality factor (Qc) from the transmission coefficient (S21). Following that, we develop the fabrication process to integrate Al-Ge-Al junctions shunted with capacitors, or, in other words,gatemon, into the resonator scheme and perform the fabrication according to the design. We demonstrate the anticrossing feature in one of the fabricated gatemons. The resonant frequency of the gatemon is mapped using the two-tone spectroscopy technique and is found to be gate-tunable. The qubit has large spectral linewidth, implying a low coherence time. Additionally, we conduct the current-phase relationship (CPR) measurement on the junctions in the Superconducting QUantum Interference Device (SQUID) geometry. We can demonstrate that the junctions pose non-sinusoidal CPR. Further, the integer and half-integer Shapiro steps are observed in the current-voltage characteristic curves of irradiated junctions. This indicates that our junctions have the cos 2φ element, which can open up another possibility toward protected qubits.
Conventional superconducting quantum electronics rely on well-established Josephson junctions made of Al/AlOx where the weak link AlOx is amorphous and is believed to host two-level systems that limit coherence. Crystalline Josephson junctions exhibit atomically ordered interface quality but remain constrained by complex fabrication and intrinsic asymmetry of epitaxial growth. Here, we demonstrate a fully epitaxial approach based on superconductivity in gallium-doped germanium, enabling the realization of Josephson junctions entirely grown in situ by molecular beam epitaxy. These devices feature atomically sharp interfaces and crystalline weak links, resulting in strong Josephson coupling in the ultra-short regime. We observe an unconventional enhancement of the switching current under applied magnetic field, which we attribute to quasiparticle-assisted thermalization processes from the Al contacts. This platform combines structural coherence, fabrication simplicity, and scalability, offering a promising route toward low-disorder, CMOS-compatible superconducting qubits in a merged element transmon architecture.
Ge/SiGe heterostructures represent a promising platform for hosting various quantum devices such as hole spin qubits and Andreev spin qubits. However, the compatibility of such heterostructures with high-quality-factor microwave superconducting cavities remains a challenge due to defects in the material stack. In this work, we present an approach to enhance the coherence of cavity modes on a reverse-graded Ge/SiGe heterostructure, which consists of etching the full ∼1.6μm-thick Ge/SiGe stack down to its starting high-resistivity Si substrate, in order to pattern superconducting cavities directly on it. We engineer the mesa step to be tapered, so that it can be easily climbed by the superconducting cavities to reach the quantum devices potentially hosted in the Ge quantum well. Using this approach, we observe internal quality factors of Qi≈10000−20000 for high-impedance frequency-tunable Josephson junction array resonators, limited by the junctions' fabrication, and Qi≈100000 for 50Ω coplanar waveguide Nb lift-off resonators. These Qi are preserved despite the overlap with the mesa structure in the climbing region, and are comparable to the ones obtained for identical resonators fabricated on a high-resistivity Si wafer reference. Thereby, this work paves a practical path toward superconductor-semiconductor hybrid devices, immediately applicable to emerging technologies on planar Ge.
We propose superconducting-semiconducting (super-semi) qubit and coupler designs based on high-quality compact through-silicon vias (TSVs) to overcome challenges introduced by materials and processing required to fabricate high-quality super-semi Josephson junctions. In our designs, an interposer ``probe'' wafer containing TSVs is used to contact a sample wafer with, e.g., a superconductor-proximitized epitaxially grown germanium quantum well. By utilizing the capacitance of the probe-wafer TSVs, the majority of the electric field in the qubits is pulled away from lossy regions in the semiconducting wafer, such as the graded buffer layers sometimes required for epitaxial growth. Through simulations, we find that the probe wafer can reduce the electric field participation of the qubit in the sample wafer by an order of magnitude for thin substrates and remains small even when the epitaxial-layer thickness approaches $100\phantom{\rule{0.2em}{0ex}}\ensuremath{\mu}\mathrm{m}$. We also show how the qubit-coherence improvements achieved via this scheme are extensible to multiqubit systems that have tunable qubit-qubit couplings without magnetic fields. This approach additionally shrinks the on-chip footprint of voltage-tunable superconducting qubits while homogenizing critical wiring structures independent of semiconducting materials, which could aid in accelerating the understanding of super-semi heterostructures in a variety of systems.