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arXiv:2503.14798

2D transmons with lifetimes and coherence times exceeding 1 millisecond

Bland, Matthew P., Faranak Bahrami, Jeronimo G. C. Martinez, Paal H. Prestegaard, Basil M. Smitham, Joshi, Atharv, Elizabeth Hedrick, Alexander C. Pakpour‐Tabrizi, Shashwat Kumar, Jindal, Apoorv, Ray Chang, Yang, Ambrose, Guangming Cheng, Nan Yao, R. J. Cava, Nathalie P. de Leon, Andrew Houck

Published Mar 19, 2025• 2 citations
arXivHTMLPDF

Abstract

Materials improvements are a powerful approach to reducing loss and decoherence in superconducting qubits because such improvements can be readily translated to large scale processors. Recent work improved transmon coherence by utilizing tantalum (Ta) as a base layer and sapphire as a substrate. The losses in these devices are dominated by two-level systems (TLSs) with comparable contributions from both the surface and bulk dielectrics, indicating that both must be tackled to achieve major improvements in the state of the art. Here we show that replacing the substrate with high-resistivity silicon (Si) dramatically decreases the bulk substrate loss, enabling 2D transmons with time-averaged quality factors (Q) exceeding 1.5 x 10^7, reaching a maximum Q of 2.5 x 10^7, corresponding to a lifetime (T_1) of up to 1.68 ms. This low loss allows us to observe decoherence effects related to the Josephson junction, and we use improved, low-contamination junction deposition to achieve Hahn echo coherence times (T_2E) exceeding T_1. We achieve these material improvements without any modifications to the qubit architecture, allowing us to readily incorporate standard quantum control gates. We demonstrate single qubit gates with 99.994% fidelity. The Ta-on-Si platform comprises a simple material stack that can potentially be fabricated at wafer scale, and therefore can be readily translated to large-scale quantum processors.

DOI
10.48550/arxiv.2503.14798

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Materials improvements are a powerful approach to reducing loss and decoherence in superconducting qubits because such improvements can be readily translated to large scale processors. Recent work improved transmon coherence by utilizing tantalum (Ta) as a base layer and sapphire as a substrate. The losses in these devices are dominated by two-level systems (TLSs) with comparable contributions from both the surface and bulk dielectrics, indicating that both must be tackled to achieve major improvements in the state of the art. Here we show that replacing the substrate with high-resistivity silicon (Si) dramatically decreases the bulk substrate loss, enabling 2D transmons with time-averaged quality factors (Q) exceeding 1.5 x 10^7, reaching a maximum Q of 2.5 x 10^7, corresponding to a lifetime (T_1) of up to 1.68 ms. This low loss allows us to observe decoherence effects related to the Josephson junction, and we use improved, low-contamination junction deposition to achieve Hahn echo coherence times (T_2E) exceeding T_1. We achieve these material improvements without any modifications to the qubit architecture, allowing us to readily incorporate standard quantum control gates. We demonstrate single qubit gates with 99.994% fidelity. The Ta-on-Si platform comprises a simple material stack that can potentially be fabricated at wafer scale, and therefore can be readily translated to large-scale quantum processors.
Superconducting qubits are a leading system for realizing large-scale quantum processors, but overall gate fidelities suffer from coherence times limited by microwave dielectric loss.Recently discovered tantalum-based qubits exhibit record lifetimes exceeding 0.3 ms.Here, we perform systematic, detailed measurements of superconducting tantalum resonators in order to disentangle sources of loss that limit state-of-the-art tantalum devices.By studying the dependence of loss on temperature, microwave photon number, and device geometry, we quantify materials-related losses and observe that the losses are dominated by several types of saturable two-level systems (TLSs), with evidence that both surface and bulk related TLSs contribute to loss.Moreover, we show that surface TLSs can be altered with chemical processing.With four different surface conditions, we quantitatively extract the linear absorption associated with different surface TLS sources.Finally, we quantify the impact of the chemical processing at singlephoton powers, the relevant conditions for qubit device performance.In this regime, we measure resonators with internal quality factors ranging from 5 to 15 × 10 6 , comparable to the best qubits reported.In these devices, the surface and bulk TLS contributions to loss are comparable, showing that systematic improvements in materials on both fronts are necessary to improve qubit coherence further.
The superconducting transmon qubit is a leading platform for quantum computing and quantum science. Building large, useful quantum systems based on transmon qubits will require significant improvements in qubit relaxation and coherence times, which are orders of magnitude shorter than limits imposed by bulk properties of the constituent materials. This indicates that relaxation likely originates from uncontrolled surfaces, interfaces, and contaminants. Previous efforts to improve qubit lifetimes have focused primarily on designs that minimize contributions from surfaces. However, significant improvements in the lifetime of two-dimensional transmon qubits have remained elusive for several years. Here, we fabricate two-dimensional transmon qubits that have both lifetimes and coherence times with dynamical decoupling exceeding 0.3 milliseconds by replacing niobium with tantalum in the device. We have observed increased lifetimes for seventeen devices, indicating that these material improvements are robust, paving the way for higher gate fidelities in multi-qubit processors.
Tantalum-based transmon qubits are a promising platform for building large-scale quantum processors. So far, these qubits have been made from tantalum films grown exclusively in the alpha phase (α-Ta). The beta phase of tantalum (\{beta}-Ta) readily nucleates at room temperature, making it attractive for scalable qubit fabrication. However, \{beta}-Ta is widely believed to be detrimental to qubit performance because it has a lower superconducting critical temperature than α-Ta. We challenge this prevailing belief by fabricating low-loss transmon qubits from \{beta}-Ta films on sapphire. Across 11 qubits, the mean time-averaged quality factor is (5.6 +/- 2.3) x 10^6, with the best qubit recording a time-averaged quality factor of (10.1 +/- 1.3) x 10^6. Resonator studies demonstrate that the dominant microwave loss channel is surface two-level systems, with the surface loss contribution for \{beta}-Ta being about twice that of α-Ta. \{beta}-Ta films exhibit significant kinetic inductance, consistent with an estimated magnetic penetration depth of (1.78 +/- 0.02) μm. This work establishes \{beta}-Ta on sapphire as a material platform for realizing low-loss transmon qubits and other superconducting devices such as compact resonators, kinetic inductance detectors, and quasiparticle traps.
Dielectric loss is one of the major decoherence sources of superconducting qubits. Contemporary high-coherence superconducting qubits are formed by material systems mostly consisting of superconducting films on substrate with low dielectric loss, where the loss mainly originates from the surfaces and interfaces. Among the multiple candidates for material systems, a combination of titanium nitride (TiN\mathrm{Ti}\mathrm{N}TiN) film and sapphire substrate has good potential because of its chemical stability against oxidization and its high quality at interfaces. In this work, we report a TiN\mathrm{Ti}\mathrm{N}TiN film deposited onto sapphire substrate achieving low dielectric loss at the material interface. Through the systematic characterizations of a series of transmon qubits fabricated with identical batches of TiN\mathrm{Ti}\mathrm{N}TiN base layers but different geometries of qubit shunting capacitors with various participation ratios of the material interface, we quantitatively extract the loss-tangent value at the substrate-metal interface, which is smaller than $8.9\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}4}$ in a 1-nm disordered layer, and a limiting quality factor of about 7.3 million. By optimizing the interface participation ratio of the two-dimensional (2D) transmon qubit, we reproducibly achieve a quality factor of 5.7 million on average. The best 2D qubits show lifetimes of up to $300\phantom{\rule{0.2em}{0ex}}\ensuremath{\mu}\mathrm{s}$ and quality factors achieving 8.1 million. We demonstrate that TiN\mathrm{Ti}\mathrm{N}TiN film on sapphire substrate is an ideal material system for high-coherence superconducting qubits. Our analyses further suggest that the interface dielectric loss around the Josephson-junction part of the circuit could be the dominant limitation of lifetimes for state-of-the-art transmon qubits.
The recent realization of millisecond-scale coherence with tantalum-on-silicon transmon qubits showed that depositing the Al/AlOx/Al Josephson junction in a high purity, ultrahigh vacuum environment was critical for achieving lifetime-limited coherence, motivating careful examination of the aluminum surface two-level system (TLS) bath. Here, we measure the microwave absorption arising from surface TLSs in superconducting aluminum resonators, following methodology developed for tantalum resonators. We vary film and surface properties and correlate microwave measurements with materials characterization. We find that the lifetimes of superconducting aluminum resonators are primarily limited by surface losses associated with TLSs in the 2.7 nm-thick native AlOx. Treatment with 49% HF removes surface AlOx completely; however, rapid oxide regrowth limits improvements in surface loss and long term device stability. Using these measurements we estimate that TLSs in aluminum interfaces contribute around 27% of the relaxation rate of state-of-the-art tantalum-on-silicon qubits that incorporate aluminum-based Josephson junctions.