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arXiv:2112.07976 · Superconductor Science and Technology

Laser-lithographically written micron-wide superconducting nanowire single-photon detectors

Maximilian Protte, Varun Verma, Jan Philipp Höpker, Richard P. Mirin, Sae Woo Nam, Tim J. Bartley

Published Feb 9, 2022• 24 citations
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Abstract

Abstract We demonstrate the fabrication of micron-wide tungsten silicide superconducting nanowire single-photon detectors on a silicon substrate using laser lithography. We show saturated internal detection efficiencies with wire widths ranging from 0.59 µm to 1.43 µm under illumination at 1550 nm. We demonstrate both straight wires, as well as meandered structures. Single-photon sensitivity is shown in devices up to 4 mm in length. Laser-lithographically written devices allow for fast and easy structuring of large areas while maintaining a saturated internal efficiency for wire widths around 1 µm.

DOI
10.1088/1361-6668/ac5338

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Abstract We demonstrate the fabrication of micron-wide tungsten silicide superconducting nanowire single-photon detectors on a silicon substrate using laser lithography. We show saturated internal detection efficiencies with wire widths ranging from 0.59 µm to 1.43 µm under illumination at 1550 nm. We demonstrate both straight wires, as well as meandered structures. Single-photon sensitivity is shown in devices up to 4 mm in length. Laser-lithographically written devices allow for fast and easy structuring of large areas while maintaining a saturated internal efficiency for wire widths around 1 µm.
To measure light down to the single photon level, superconducting nanowire single photon detectors (SNSPDs) have become the go-to devices, due to their near unity detection efficiency [1] , high-speed and low noise. An important figure of merit is the internal detection efficiency (IDE). To achieve a saturated IDE in the infrared, wire widths of the order 100 nm are typically required. Nevertheless, recent experiments have shown that functional detectors can be fabricated with wire widths up to 3 µm [2] – [4] . A higher silicon content of the films combined with a smaller film thickness enables wider wires. Increasing the wire width allows for bigger fabrication tolerances which enables the fabrication with optical lithography.
We report on the fabrication and characterization of single-photon-sensitive WSi superconducting detectors with wire widths from 1 μm to 3 μm. The devices achieve the saturated internal detection efficiency at a wavelength of 1.55 μm and exhibit maximum count rates in excess of 105 s−1. We also investigate the material properties of the silicon-rich WSi films used for these devices. We find that many devices with active lengths of several hundred micrometers exhibit critical currents in excess of 50% of the depairing current. A meandered detector with a 2.0 μm wire width is demonstrated over a surface area of 362 × 362 μm2, showcasing the material and device quality achieved.
Superconducting nanowire single photon detectors (SNSPDs) are the highest-performing technology for time-resolved single-photon counting from the UV to the near-infrared. The recent discovery of single-photon sensitivity in micrometer-scale superconducting wires is a promising pathway to explore for large active area devices with application to dark matter searches and fundamental physics experiments. We present 8-pixel 1 mm2 superconducting microwire single photon detectors (SMSPDs) with 1 μm-wide wires fabricated from WSi and MoSi films of various stoichiometries using electron-beam and optical lithography. Devices made from all materials and fabrication techniques show saturated internal detection efficiency at 1064 nm in at least one pixel, and the best performing device made from silicon-rich WSi shows single-photon sensitivity in all eight pixels and saturated internal detection efficiency in 6/8 pixels. This detector is the largest reported active-area SMSPD or SNSPD with near-IR sensitivity, and it extends the SMSPD to an array format. By further optimizing the photolithography techniques presented in this work, a viable pathway exists to realize larger devices with cm2-scale active area and beyond.
Superconducting nanowire single-photon detectors (SNSPDs) are among the most sensitive single-photon detectors available and have the potential to transform fields ranging from infrared astrophysics to molecular spectroscopy. However, extending their performance into the mid-infrared spectral region - crucial for applications such as exoplanet transit spectroscopy and vibrational fingerprinting of molecules - has remained a major challenge, primarily due to material limitations and scalability constraints. Here, we report on the development of SNSPDs based on tungsten germanide, a novel material system that combines high mid-infrared sensitivity with compatibility for large-scale fabrication. Our detectors exhibit saturated internal detection efficiency at wavelengths up to 29 μm, while using 2.7x thicker films (8 nm vs 3 nm) and up to 4.5x wider nanowires (360 nm vs 80 nm) compared to mid-infrared-optimized SNSPDs fabricated from tungsten silicide. This advance will enable scalable, high-performance single-photon detection in a spectral region that was previously inaccessible, opening new frontiers in remote sensing, thermal imaging, environmental monitoring, molecular physics, and astronomy.
Single-pixel fiber-coupled superconducting nanowire single-photon detectors (SNSPDs) operating at 1550 nm and utilizing amorphous superconducting tungsten silicide (WSi) films have proven ability to detect photons with: high system-detection efficiency (SDE) of up to 93%, low-jitter on the order of ∼150 ps, dark count rates of ∼1 kcps, and fast reset times on the order of tens of nanoseconds. Additionally, WSi SNSPD devices with 12-pixels have recently demonstrated downlink data rates of 79 Mbps between a terminal in orbit around the moon and a terminal on earth, as part of the Lunar Laser Communication Demonstration (LLCD) at the Lunar Lasercomm OCTL Terminal (LLOT). To further extend the performance of SNSPD devices for optical and quantum communication for terrestrial and space-based applications, the next generation of devices will need to incorporate hundreds to thousands of SNSPD pixels and to be free-space coupled. The wire widths necessary for optimal performance of WSi (∼120–220 nm) devices have to date been achieved using electron-beam lithography (EBL) to pattern photoresists for etch-back fabrication methods. The high cost and time to fabricate kilo-pixel arrays of SNSPDs using EBL will become prohibitive in producing such devices. Here, we report fabrication of a WSi SNSPD test structure with 64 pixels using optical lithography instead of EBL. Specifically, we used Canon EX3 and EX6 deep-UV (DUV) steppers with KrF excimer lasers$(\lambda=248\ \mbox{nm} ) intheMicroDevicesLaboratoryattheJetPropulsionLaboratorytofabricatethearray.Dieswith8×8pixelswith166−nm−widewireswereproduced,withpixelshavinga100in the Micro Devices Laboratory at the Jet Propulsion Laboratory to fabricate the array. Dies with 8 × 8 pixels with 166-nm-wide wires were produced, with pixels having a 100intheMicroDevicesLaboratoryattheJetPropulsionLaboratorytofabricatethearray.Dieswith8×8pixelswith166−nm−widewireswereproduced,withpixelshavinga100\mu\mbox{m} $pitch in the vertical and horizontal directions. Two improvements were observed: 1) the time to pattern the 8 × 8 SNSPD pixels on 3.5 mm × 3.5 mm dies filling a 4-in Si wafer required ∼24 hours using EBL while optical lithography wrote the same dies in approximately 15 minutes; and 2) the cost to write one 4-in wafer using EBL was comparable to the cost for one optical mask for use in the stepper to write many 4-in wafers. While fabrication times and costs will vary from facility to facility, the improvements in speed and cost for optical lithography versus EBL are apparent, and this technological advance should scale and enable fast and rapid production of kilo-pixel arrays in the future.
We have developed a single-photon detector based on superconducting amorphous tungsten–silicon alloy (a-WxSi1−x) nanowire. Our device made from a uniform a-WxSi1−x nanowire covers a practical detection area (16 μm×16 μm) and shows high sensitivity featuring a plateau of the internal quantum efficiencies, i.e., efficiencies of generating an electrical pulse per absorbed photon, over a broad wavelength and bias range. This material system for superconducting nanowire detector technology could overcome the limitations of the prevalent nanowire devices based on NbN and lead to more practical, ideal single-photon detectors having high efficiency, low noise, and high count rates.