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arXiv:1810.04070 · Superconductor Science and Technology

Improvement of the critical temperature of NbTiN films on III-nitride substrates

H. Machhadani, Julien Zichi, Catherine Bougerol, S. Lequien, Jean-Luc Thomassin, Nicolas Mollard, Anna Mukhtarova, Val Zwiller, Jean‐Michel Gérard, Eva Monroy

Published Dec 19, 2018• 16 citations
arXivHTMLPDF

Abstract

Abstract In this paper, we study the impact of using III-nitride semiconductors (GaN, AlN) as substrates for ultrathin (11 nm) superconducting films of NbTiN deposited by reactive magnetron sputtering. The resulting NbTiN layers are (111)-oriented, fully relaxed, and they keep an epitaxial relation with the substrate. The higher critical superconducting temperature ( T c = 11.8 K) was obtained on AlN-on-sapphire, which was the substrate with smaller lattice mismatch with NbTiN. We attribute this improvement to a reduction of the NbTiN roughness, which appears associated with the relaxation of the lattice misfit with the substrate. On AlN-on-sapphire, superconducting nanowire single photon detectors were fabricated and tested, obtaining external quantum efficiencies that are in excellent agreement with theoretical calculations.

DOI
10.1088/1361-6668/aaf99d

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Abstract In this paper, we study the impact of using III-nitride semiconductors (GaN, AlN) as substrates for ultrathin (11 nm) superconducting films of NbTiN deposited by reactive magnetron sputtering. The resulting NbTiN layers are (111)-oriented, fully relaxed, and they keep an epitaxial relation with the substrate. The higher critical superconducting temperature ( T c = 11.8 K) was obtained on AlN-on-sapphire, which was the substrate with smaller lattice mismatch with NbTiN. We attribute this improvement to a reduction of the NbTiN roughness, which appears associated with the relaxation of the lattice misfit with the substrate. On AlN-on-sapphire, superconducting nanowire single photon detectors were fabricated and tested, obtaining external quantum efficiencies that are in excellent agreement with theoretical calculations.
Abstract In this paper, we study the crystalline properties and superconducting critical temperature of ultra-thin (5–9 nm) NbN films deposited on 8-inch silicon wafers by reactive sputtering. We show that the deposition of NbN on a thin (10–20 nm) AlN buffer layer, also synthesized by reactive sputtering, improves the critical temperature by several Kelvin, up to 10 K for 9 nm NbN on 20 nm AlN. We correlate this improvement to the higher-crystalline quality of NbN on AlN. While NbN deposited directly on silicon is polycrystalline with randomly oriented grains, NbN on AlN(0001) is textured along (111), due to the close lattice match. The superconducting properties of the NbN/AlN stack are validated by the demonstration of fibre-coupled normal-incidence superconducting nanowire single photon detectors. The whole fabrication process is CMOS compatible, with a thermal budget compatible with the integration of other passive and active components on silicon. These results pave the way for the integration of a large number of surface or waveguide-integrated detectors on large-scale silicon wafers. Furthermore, as AlN is transparent over a broad wavelength range from the visible to the near-infrared, the optimized superconducting NbN/AlN stack can be used for a wide variety of applications, from imaging to quantum communications and quantum computing.
At the present time, ultrahigh performance superconducting nanowire single-photon detectors are the key elements in a variety of devices from biological research to quantum communications and computing. Accurate tuning of superconducting material properties is a powerful resource for fabricating single-photon detectors with desired properties. Here, we report on the major theoretical relations between ultrathin niobium nitride (NbN) film properties and superconducting nanowire single-photon detector characteristics, as well as the dependence of ultrathin NbN film properties on reactive magnetron sputtering recipes. Based on this study, we formulate the exact requirements for ultrathin NbN films for ultrahigh performance superconducting nanowire single-photon detectors. Then, we experimentally studied the properties of ultrathin NbN films (morphology, crystalline structure, critical temperature, and sheet resistance) on silicon, sapphire, silicon dioxide, and silicon nitride substrates sputtered with various recipes. We demonstrate ultrathin NbN films (obtained with more than 100 films deposition) with a wide range of critical temperature from 2.5 to 12.1 K and sheet resistance from 285 to 2000 Ω/sq and report a sheet resistance evolution of more than 40% within two years. Finally, we found out that one should use ultrathin NbN films with a specific critical temperature near 9.5 K and a sheet resistance of about 350 Ω/sq for ultrahigh performance state-of-the-art superconducting nanowire single-photon detectors at 1550 nm wavelength.
Lithium niobate-on-insulator (LNOI) is an emerging photonic platform with high potential for scalable quantum information processing due to its strong second-order nonlinearity. However, little progress has been made in developing on-chip single-photon detectors on LNOI. Niobium tita nium nitride (NbTiN) superconducting nanowire single-photon detectors (SNSPDs) are a promising candidate for this application. In this work, we use DC reactive magnetron sputtering to grow high quality NbTiN thin films using an ultra-high vacuum deposition system with a base pressure lower than 2×10‾¹⁰ mbar. Enabled by the low concentration of background impurities in this system, we investigate the impact of substrate temperature during NbTiN growth. We achieve four nm thick superconducting films with a critical temperature (Tc) of 12.3 K grown at a substrate temperature of 825 K. We find that the NbTiN films grow in the (111) orientation and evolve from a porous pillar structure when grown at low temperatures to densely packed fibrous grains at higher temper atures. Furthermore, we demonstrate that the increased substrate temperature reduces the oxygen concentration in our films and improves the overall stoichiometry. In addition, we integrate these films with the LNOI platform and investigate the obtained interface quality. Lastly, we fabricate SNSPDs from the NbTiN film on LNOI and characterize the detector performance.
Lithium niobate-on-insulator (LNOI) is an emerging photonic platform with high potential for scalable quantum information processing due to its strong second-order nonlinearity. However, little progress has been made in developing on-chip single-photon detectors on LNOI. Niobium titanium nitride (NbTiN) superconducting nanowire single-photon detectors (SNSPDs) are a promising candidate for this application. In this work, we use DC reactive magnetron sputtering to grow high-quality NbTiN thin films using an ultrahigh vacuum deposition system with a base pressure lower than 2 × 10 − 10 mbar. Enabled by the low concentration of background impurities in this system, we investigate the impact of substrate temperature during NbTiN growth. We achieve four nm thick superconducting films with a critical temperature ( T c ) of 12.3 K grown at a substrate temperature of 825 K. We find that the NbTiN films grow in the (111) orientation and evolve from a porous pillar structure when grown at low temperatures to densely packed fibrous grains at higher temperatures. Furthermore, we demonstrate that the increased substrate temperature reduces the oxygen concentration in our films and improves the overall stoichiometry. In addition, we integrate these films with the LNOI platform and investigate the obtained interface quality. Lastly, we fabricate SNSPDs from the NbTiN film on LNOI and characterize the detector performance.
Ultra-thin epitaxial NbN layers are a key component of Superconducting Single Photon infrared Detectors. Efforts devoted to the layer growth aim at improving their critical temperature and critical current density, while keeping their thickness close to 5 nm and Tc above 10 K, which insure a large bandwidth, large SNR detection at 4K. Choice of substrate is critical: for both applications, MgO wafers and R-plane sapphire are usually considered as best substrates to grown onto. However, growing NbN on M-plane orientation of sapphire wafer, 3 inch in diameter, can help improving the film quality and fabrication yield. NbN thin films were grown by reactive DC magnetron sputtering at about 600°C and passivated by an AlN layer 1.5nm thick deposited in-situ at room temperature. Growth on M-plane is shown to be better than on other sapphire orientations, including R-plane: NbN layer critical temperature reaches 13.3 K, uniform on the wafer, for a film thickness of 4.4nm measured by X-ray reflectivity. Transport properties of NbN grown on those various substrates have been correlated to their crystallographic microstructure, examined by both symmetric and asymmetric X ray diffraction. Observation of diffraction peaks has given insight on the disorientation of the NbN film.
Abstract In this paper, we investigate the superconducting critical temperature, morphology and structural properties of NbN ultra-thin films (5–7 nm) deposited by reactive sputtering on top of silicon nitride (SiN) over 200 mm silicon wafers. We demonstrate the effectiveness of a 10 nm thick spacer layer of AlN in raising the superconducting critical temperature from 5.0 K to 7.2 K and from 7.3 K to 9.3 K for 5 nm and 7 nm NbN thickness respectively. By combining investigations with x-ray diffraction and transmission electron microscopy, we highlight significant modifications of the crystalline properties of the NbN film on top of the AlN spacer layer. When directly deposited on SiN, the grains of the NbN polycrystalline layer are randomly oriented. In contrast, when deposited on top of the AlN (0001) spacer layer, the NbN layer is textured along the (111) direction, leading to increased critical temperatures. As AlN is a CMOS-compatible material, these findings are particularly relevant in view of the future integration of high-performance superconducting nanowire single photon detectors on large-scale quantum photonic chips.