arXiv:1805.09491 · Journal of Applied Physics
Method for determination of technical noise contributions to ion motional heating
Jonathon A. Sedlacek, Jules Stuart, William Loh, Robert McConnell, Colin Bruzewicz, Jeremy Sage, John Chiaverini
Abstract
Microfabricated Paul ion traps show tremendous promise for large-scale quantum information processing. However, motional heating of ions can have a detrimental effect on the fidelity of quantum logic operations in miniaturized, scalable designs. In many experiments, motional heating rates are ascribed solely to anomalous heating, which arises at least in part from electric field noise from the trap surface not attributable to any known mechanisms. Contributions to measured ion heating rates due to technical voltage noise present on the static (DC) and radio frequency (RF) electrodes—i.e., due to voltage sources, amplifiers, and other electrical components—can often be overlooked. We present a reliable method for determining the extent to which motional heating is dominated by technical voltage noise on the DC or RF electrodes. Also, we demonstrate that stray DC electric fields can shift the ion position such that technical noise on the RF electrode can significantly contribute to the motional heating rate. After minimizing the pseudopotential gradient experienced by the ion induced by stray DC electric fields, the motional heating due to RF technical noise can be significantly reduced.