Cobalt disilicide provides a promising nearly epitaxial superconducting material on silicon, which is compatible with high-density integrated circuit technology. We have characterized CoSi2 superconducting microwave cavities around 5.5 GHz for resonance frequency fluctuations at temperatures of 10–200 mK. Comparing with materials used in kinetic inductance detectors, we found relatively weak fluctuations (δfr/f0)2 following the spectral density A/fγ, with A ≃ 6 × 10−16 and γ slightly below 1 at an average number of photons of 30; the noise decreased with measurement power as 1/P1/2. The connection of the frequency fluctuations to two-level states and kinetic inductance fluctuations due to resistance noise is discussed.
Superconducting boron-doped silicon is a promising material for integrated silicon quantum devices. In particular, its low electronic density and moderate disorder make it a suitable candidate for the fabrication of large inductances with low losses at microwave frequencies. We study experimentally the electrodynamics of superconducting silicon thin layers using coplanar waveguide resonators, focusing on the kinetic inductance, the internal losses, and the variation of these quantities with the resonator readout power. We report the observation in a doped semiconductor of microwave resonances with internal quality factors of a few thousand. As expected in the BCS framework, superconducting silicon presents a large sheet kinetic inductance in the 50--500-pH range, comparable to that of strongly disordered superconductors. The temperature dependence of the kinetic inductance is well described by the Mattis-Bardeen theory. However, we find an unexpectedly strong nonlinearity in the complex surface impedance that cannot be satisfactorily explained either by depairing or by quasiparticle heating.
Tantalum (Ta) has recently received considerable attention in manufacturing robust superconducting quantum circuits. Ta offers low microwave loss, high kinetic inductance compared to aluminium (Al) and niobium (Nb), and good compatibility with complementary metal-oxide-semiconductor (CMOS) technology, which is essential for quantum computing applications. Here, we demonstrate the fabrication engineering of thickness-dependent high quality factor (high-Q_i) Ta superconducting microwave coplanar waveguide resonators. All films are deposited on high-resistivity silicon substrates at room temperature without additional substrate heating. Before Ta deposition, a niobium (Nb) seed layer is used to ensure a body-centred cubic lattice (α-Ta) formation. We further engineer the kinetic inductance (L_K) resonators by varying Ta film thicknesses. High L_K is a key advantage for applications because it facilitates the realisation of high-impedance, compact quantum circuits with enhanced coupling to qubits. The maximum internal quality factor Q_i of ~ 3.6 * 10^6 is achieved at the high power regime for 100 nm Ta, while the highest kinetic inductance is obtained to be 0.6 pH/sq for the thinnest film, which is 40 nm. This combination of high Q_i and high L_K highlights the potential of Ta microwave circuits for high-fidelity operations of compact quantum circuits.
Abstract Tantalum (Ta) has recently received considerable attention in manufacturing robust superconducting quantum circuits. Ta offers low microwave loss, high kinetic inductance compared to aluminium (Al) and niobium (Nb), and good compatibility with complementary metal-oxide-semiconductor (CMOS) technology, which is essential for quantum computing applications. Here we demonstrate the fabrication engineering of thickness-dependent high-quality-factor (high-
Qi ) Ta superconducting microwave coplanar waveguide resonators. All films are deposited on high-resistivity silicon substrates at room temperature without additional substrate heating. Before Ta deposition, a niobium (Nb) seed layer is used to promote a body-centred cubic lattice (
α -Ta) formation. We further engineer the kinetic inductance (
LK ) of the resonators by varying Ta film thicknesses. High
LK is a key advantage for applications because it facilitates the realisation of high-impedance, compact quantum circuits with enhanced coupling to qubits. The maximum internal quality factor
Qi of
∼ 3.6 × 10 6 in the high power regime and
Qi of
∼ 4.5 × 10 5 in the single-photon regime is achieved for 100 nm Ta which represents an improvement over previous room-temperature deposited Ta resonators on silicon substrates in the single photon regime, while the highest kinetic inductance of 0.6 pH/sq is obtained for the thinnest film, which is 40 nm. This combination of high
Qi and high
LK highlights the potential of Ta microwave circuits for high-fidelity operation of compact quantum circuits.
Aluminum-based platforms have allowed to reach major milestones for superconducting quantum circuits. For the next generation of devices, materials that are able to maintain low microwave losses while providing new functionalities, such as large kinetic inductance or compatibility with CMOS platform, are needed. Here, we report on a combined direct current and microwave investigation of titanium nitride films of different thicknesses grown using CMOS compatible methods. For microwave resonators made of 3 nm thick TiN, we measured large kinetic inductance LK ∼240 pH/sq, high mode impedance of ∼4.2 kΩ while maintaining microwave quality factor ∼105 in the single photon limit. We present an in-depth study of the microwave loss mechanisms in these devices that indicates the importance of quasiparticles and provide insight for further improvement.
The promise of tantalum for realizing superconducting quantum devices has generated interest in its compound films, particularly nitrides. Among these, cubic-phase tantalum carbonitride (TaCxN1−x) offers reduced susceptibility to oxidation and a high critical temperature, yet its microwave properties remain largely unexplored. Here, we investigate plasma-enhanced atomic layer deposition of cubic-phase TaCxN1−x thin films for superconducting microwave circuits. Structural and transport measurements reveal nanocrystalline morphology with sub-10 nm grains and superconductivity in the dirty limit. Coplanar waveguide resonators exhibit moderately high kinetic inductance (16.8 pH/sq for 30 nm films) with potential for enhancement through dimensional scaling. The films also support high internal quality factors exceeding 105 at 50 mK in the single-photon regime, comparable to granular aluminum. Loss analysis identifies the two-level systems as the dominant limiting mechanism, with potential for further reduction through interface engineering. These results establish atomic layer deposited TaCxN1−x as a promising material for scalable, low-loss, high-inductance superconducting circuits.