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The Journal of Physical Chemistry Letters

Using Machine Learning to Understand the Causes of Quantum Decoherence in Solution-Phase Bond-Breaking Reactions

Kenneth J. Mei, William R. Borrelli, Andy Vong, Benjamin J. Schwartz

Published Jan 19, 2024• 4 citations
Publisher

Abstract

High Resolution Image Download MS PowerPoint Slide Decoherence is a fundamental phenomenon that occurs when an entangled quantum state interacts with its environment, leading to collapse of the wave function. The inevitability of decoherence provides one of the most intrinsic limits of quantum computing. However, there has been little study of the precise chemical motions from the environment that cause decoherence. Here, we use quantum molecular dynamics simulations to explore the photodissociation of Na 2 + in liquid Ar, in which solvent fluctuations induce decoherence and thus determine the products of chemical bond breaking. We use machine learning to characterize the solute–solvent environment as a high-dimensional feature space that allows us to predict when and onto which photofragment the bonding electron will localize. We find that reaching a requisite photofragment separation and experiencing out-of-phase solvent collisions underlie decoherence during chemical bond breaking. Our work highlights the utility of machine learning for interpreting complex solution-phase chemical processes as well as identifies the molecular underpinnings of decoherence.

DOI
10.1021/acs.jpclett.3c03474

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High Resolution Image Download MS PowerPoint Slide Decoherence is a fundamental phenomenon that occurs when an entangled quantum state interacts with its environment, leading to collapse of the wave function. The inevitability of decoherence provides one of the most intrinsic limits of quantum computing. However, there has been little study of the precise chemical motions from the environment that cause decoherence. Here, we use quantum molecular dynamics simulations to explore the photodissociation of Na 2 + in liquid Ar, in which solvent fluctuations induce decoherence and thus determine the products of chemical bond breaking. We use machine learning to characterize the solute–solvent environment as a high-dimensional feature space that allows us to predict when and onto which photofragment the bonding electron will localize. We find that reaching a requisite photofragment separation and experiencing out-of-phase solvent collisions underlie decoherence during chemical bond breaking. Our work highlights the utility of machine learning for interpreting complex solution-phase chemical processes as well as identifies the molecular underpinnings of decoherence.
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This paper presents an algorithmic simulation framework for modeling quantum decoherence dynamics. Decoherence, a fundamental process in quantum mechanics, arises from interactions with the surrounding environment, causing a loss of quantum information. This research focuses on creating a dynamic simulation model that captures the complex interplay of environmental noise and quantum fluctuations, enabling the prediction of decoherence rates and identification of critical factors influencing this behavior. The simulation employs a system of differential equations to model the collapse of quantum states, providing a robust and potentially predictive tool for understanding and quantifying decoherence phenomena. The core mechanism involves simulating the collapse of quantum states over time, incorporating environmental noise and quantum fluctuations to represent the probabilistic nature of decoherence.
Advances in quantum computing algorithms and hardware are unlocking novel solutions to numerous classically intractable problems in the physical and computational sciences. In the context of chemical screening of precursors for etch processes in integrated circuit fabrication, it is shown in this work that two critical simulation tasks—(1) generating high-accuracy ab initio chemistry data, and (2) training molecular dynamics potentials—can both be reliably performed using present-day hybrid quantum–classical approaches, namely, variational quantum eigensolvers (VQEs) and variational quantum learning models (VQLMs). First, an adaptive-VQE approach is employed to demonstrate the accuracy of quantum algorithms for bond dissociation curves and to provide a heuristic demonstration of computational scaling behavior relative to brute-force classical methods. Next, a VQLM is trained to develop a quantum machine learning–based interatomic potential to probe the chemical influence of F atoms on the dissociation of the Si–Si bond, a well-studied and highly important reaction motif in etch chemistry. It is then shown that the VQLM—following appropriate hyperparameter optimization—achieves comparable performance with the underlying ab initio training data. Through this work, we illustrate how quantum computing approaches may provide valuable tools for research and development in the semiconductor fabrication industry as the technology matures.