We design and fabricate a compact superconducting qubit circuit made of nano-thick NbN film on a high-resistivity silicon substrate, carrying seven transmon qubits. By comparing with the conventional superconducting qubit circuits made of superconducting films with hundred-nanometer thickness, our superconducting qubit circuit has much smaller size in the readout circuit, whose resonator length is only about 1/20 of that in a conventional superconducting circuit. Transmons are measured and characterized in the frequency and time domains with different flux bias. The transition frequency f01 can be adjusted in the range of several GHz. The qubit circuits made of such nano-thick material with high kinetic inductance are promising in the integration of quantum circuits.
We design and fabricate a compact superconducting qubit circuit made of nano-thick NbN film on a high-resistivity silicon substrate, carrying seven transmon qubits. By comparing with the conventional superconducting qubit circuits made of superconducting films with hundred-nanometer thickness, our superconducting qubit circuit has much smaller size in the readout circuit, whose resonator length is only about 1/20 of that in a conventional superconducting circuit. Transmons are measured and characterized in the frequency and time domains with different flux bias. The transition frequency f01 can be adjusted in the range of several GHz. The qubit circuits made of such nano-thick material with high kinetic inductance are promising in the integration of quantum circuits.
We developed a process for fabricating nitride superconductor-based superconducting qubits monolithically integrated with a single flux quantum (SFQ)-based readout and control circuits. Since we used a Josephson junction (JJ) made of an NbN/AlN/NbN tri-layer, including a critical current density (Jc) of 50 A/cm2as the suitable material for superconducting qubits and SFQ readout/control circuits operating at 20 mK, the JJs for both the qubits and the SFQ circuits could simultaneously be fabricated. The device structure was also composed of three superconductive layers, comprising two superconductive layers as wiring layers and other layers as the top ground plane. Then, we used a Pd film as the resistive layer, which is required as the shunt resistors and the bias resistors for the SFQ control circuits, followed by an investigation of the properties of NbN/AlN/NbN epitaxial junctions and evaluation of the sheet inductance of the base NbN and wiring NbTiN layer. Our results showed the successful fabrication of a JJ with a sufficiently low leakage current and aJcof around 50 A/cm2, which was close to the target value. Furthermore, the evaluated sheet inductance exceeded 1 pH, which was several times larger than the values obtained for Nb-integrated circuits.
The development of large-scale quantum processors benefits from superconducting qubits that can operate at elevated temperatures and be fabricated with scalable, foundry-compatible processes. Atomic layer deposition (ALD) is increasingly being adopted as an industrial standard for thin-film growth, particularly in applications requiring precise control over layer thickness and composition. Here, we report superconducting qubits based on NbN/AlN/NbN trilayers deposited entirely by ALD. By varying the number of ALD cycles used to form the AlN barrier, we achieve Josephson tunneling through barriers of different thicknesses, with critical current density spanning seven orders of magnitude, demonstrating the uniformity and versatility of the process. Owing to the high critical temperature of NbN, transmon qubits based on these all-nitride trilayers exhibit microsecond-scale relaxation times, even at temperatures above 300 mK. These results establish ALD as a viable low-temperature deposition technique for superconducting quantum circuits and position all-nitride ALD qubits as a promising platform for operation at elevated temperatures.
We report our development on design, fabrication and characterization of various superconducting resonators for quantum device applications. The resonators are developed mainly for superconducting qubit implementation in circuit QED structure, but future application will include photon detectors such as microwave kinetic inductance detectors. First we designed and fabricated half-wavelength coplanar waveguide resonators with niobium thin film on a high resistive silicon wafer, with the fundamental frequencies in the range of 1 to 8 GHz. The loaded quality factors are controlled by the coupling capacitors, and the lower bound of the intrinsic quality factor was measured down to 7 mK in the dilution refrigerator. We have also designed quarter-wavelength resonators and lumped LC resonators coupled to a transmission line, and characterized multiple resonators in a single transmission line. For the 3D transmon qubit application, we designed and fabricated a rectangular box resonator with superconducting aluminum. The intrinsic quality factor of the box resonator exceeds three million at 7 mK. We will also present basic results on the integration of a transmon qubit in the superconducting resonator.
In recent years, rapid single flux quantum (RSFQ) circuits, which are promising for the development of high-speed digital electronics, have attracted widespread interest. Niobium nitride (NbN) films have also attracted significant attention for high-frequency applications in superconducting electronics because of their superior material parameters, including their high critical temperature Tc and large gap voltage Vg. To enable the development of all-NbN SFQ circuits, we have developed a fabrication process based on NbN junctions and inductors made of NbN strip lines. It is important to evaluate the inductance because it can affect the performance of an RSFQ circuit and is essential for the RSFQ design. We measured the inductance properties of both epitaxial and polycrystalline NbN strip lines using a superconducting quantum interference device modulation technique at 4.2 K and obtained the width dependence on the inductance of the NbN films. The penetration depth was then calculated from these measurements. The NbN inductance values were calculated numerically with respect to the penetration depth and were then compared with the measured values from the experiments. It was demonstrated that the differences between these values were within 5%. The results reported here will be useful for the design and fabrication of all-NbN RSFQ circuits.
Abstract In this paper, we report on a systematic study of the inductance and magnetic field penetration depth (λ) of polycrystalline NbN superconducting thin films. By employing a four-metal-layer fabrication process specifically designed for all-NbN single-flux-quantum circuits, we constructed a superconducting quantum interference device loop composed of two parallel NbN SNS junctions, NbN microstrips, and NbN ground planes for precise inductance measurement. At 4.2 K, as the linewidth increases from 1 μm to 30 μm, the inductance per unit length (L u) of NbN microstrips significantly decreases, for example, the L u of 250 nm thick NbN microstrips drops from 0.907 pH/μm to 0.047 pH/μm. Compared to Nb, the L u of polycrystalline NbN microstrips is approximately two to three times that of Nb, offering an advantage for manufacturing smaller superconducting inductors. Furthermore, we conducted simulation analysis using InductEx software to extract the λ of NbN films of varying thicknesses. The results indicate that as the film thickness increased from 45 nm to 600 nm, λ initially decreased sharply and then stabilized, with values ranging from 430 nm to 323 nm. Notably, once the film thickness exceeded 200 nm, λ remained essentially constant, even at a temperature of 10 K, where it showed good stability, albeit with a slight increase (about 50 nm) compared to 4.2 K. This dependence of λ on thickness is reasonably explained by considering the effects of NbN film thickness on the superconducting critical temperature and residual resistivity. These research findings not only deepen our understanding of the characteristics of superconducting films but also lay a solid foundation for the future design and manufacture of more compact superconducting circuits at the higher temperature of 10 K.
Tantalum-based transmon qubits are a promising platform for building large-scale quantum processors. So far, these qubits have been made from tantalum films grown exclusively in the alpha phase (α-Ta). The beta phase of tantalum (\{beta}-Ta) readily nucleates at room temperature, making it attractive for scalable qubit fabrication. However, \{beta}-Ta is widely believed to be detrimental to qubit performance because it has a lower superconducting critical temperature than α-Ta. We challenge this prevailing belief by fabricating low-loss transmon qubits from \{beta}-Ta films on sapphire. Across 11 qubits, the mean time-averaged quality factor is (5.6 +/- 2.3) x 10^6, with the best qubit recording a time-averaged quality factor of (10.1 +/- 1.3) x 10^6. Resonator studies demonstrate that the dominant microwave loss channel is surface two-level systems, with the surface loss contribution for \{beta}-Ta being about twice that of α-Ta. \{beta}-Ta films exhibit significant kinetic inductance, consistent with an estimated magnetic penetration depth of (1.78 +/- 0.02) μm. This work establishes \{beta}-Ta on sapphire as a material platform for realizing low-loss transmon qubits and other superconducting devices such as compact resonators, kinetic inductance detectors, and quasiparticle traps.