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Springer eBooks

Three-slit interference experiments with electrons

Stefano Frabboni, G. C. Gazzadi, G. Pozzi

Published Mar 17, 2009• 0 citations
Publisher
DOI
10.1007/978-3-540-85156-1_332

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Current nanotechnology techniques make possible the preparation of slits in the submicrometer range so that electron interference and diffraction experiments can be done even with a conventional electron microscope. If the instrument is also equipped with a field emission source, it is possible to follow almost in real time the transition from the image of the slits to their Fraunhofer pattern through the intermediate Fresnel diffraction images. We discuss our results for the two-slit experiment and illustrate them for the three-slit case.
Advanced electron microscopy technologies have made it possible to perform precise double-slit interference experiments. We used a 1.2-MV field emission electron microscope providing coherent electron waves and a direct detection camera system enabling single-electron detections at a sub-second exposure time. We developed a method to perform the interference experiment by using an asymmetric double-slit fabricated by a focused ion beam instrument and by operating the microscope under a "pre-Fraunhofer" condition, different from the Fraunhofer condition of conventional double-slit experiments. Here, pre-Fraunhofer condition means that each single-slit observation was performed under the Fraunhofer condition, while the double-slit observations were performed under the Fresnel condition. The interference experiments with each single slit and with the asymmetric double slit were carried out under two different electron dose conditions: high-dose for calculation of electron probability distribution and low-dose for each single electron distribution. Finally, we exemplified the distribution of single electrons by color-coding according to the above three types of experiments as a composite image.