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Scientific Reports

Photon extraction enhancement of praseodymium ions in gallium nitride nanopillars

Shin Sato, Shuo Li, Andrew D. Greentree, Manato Deki, Tomoaki Nishimura, Hirotaka Watanabe, Shugo Nitta, Yoshio Honda, Hiroshi Amano, Brant C. Gibson, Takeshi Ohshima

Published Dec 8, 2022• 10 citations
Publisher

Abstract

Abstract Lanthanoid-doped Gallium Nitride (GaN) integrated into nanophotonic technologies is a promising candidate for room-temperature quantum photon sources for quantum technology applications. We manufactured praseodymium (Pr)-doped GaN nanopillars of varying size, and showed significantly enhanced room-temperature photon extraction efficiency compared to unstructured Pr-doped GaN. Implanted Pr ions in GaN show two main emission peaks at 650.3 nm and 651.8 nm which are attributed to 3P0-3F2 transition in the 4f-shell. The maximum observed enhancement ratio was 23.5 for 200 nm diameter circular pillars, which can be divided into the emitted photon extraction enhancement by a factor of 4.5 and the photon collection enhancement by a factor of 5.2. The enhancement mechanism is explained by the eigenmode resonance inside the nanopillar. Our study provides a pathway for Lanthanoid-doped GaN nano/micro-scale photon emitters and quantum technology applications.

DOI
10.1038/s41598-022-25522-6

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Abstract Lanthanoid-doped Gallium Nitride (GaN) integrated into nanophotonic technologies is a promising candidate for room-temperature quantum photon sources for quantum technology applications. We manufactured praseodymium (Pr)-doped GaN nanopillars of varying size, and showed significantly enhanced room-temperature photon extraction efficiency compared to unstructured Pr-doped GaN. Implanted Pr ions in GaN show two main emission peaks at 650.3 nm and 651.8 nm which are attributed to 3P0-3F2 transition in the 4f-shell. The maximum observed enhancement ratio was 23.5 for 200 nm diameter circular pillars, which can be divided into the emitted photon extraction enhancement by a factor of 4.5 and the photon collection enhancement by a factor of 5.2. The enhancement mechanism is explained by the eigenmode resonance inside the nanopillar. Our study provides a pathway for Lanthanoid-doped GaN nano/micro-scale photon emitters and quantum technology applications.
Lanthanoid (Ln)-doped Gallium Nitride (GaN) have attracted attentions because of their high intensity luminescence and sharp room-temperature (RT) optical linewidth. These superior luminescent properties are quite attractive for the application of single photon source (SPS) which is a key technology for quantum computing, quantum sensing, and quantum key distribution. However, one of the challenges to realize Ln-doped GaN SPS is the long luminescent transition lifetime, resulting in the low photon counts insufficient to optically detect isolated single Ln ions. Confinement of luminescent centers into nanometersized regions is an effective method to enhance their photon emission and we here we show that confinement into GaN nanopillars enhances photon emission from implanted praseodymium (Pr) ions at RT.
Reliable single-photon sources (SPSs) that provide on-demand single photons are indispensable in the rapidly growing field of quantum technologies. To be maximally useful, they must operate at room temperature, be compatible with mature fabrication processes, and integrate seamlessly with other photonic systems. These requirements have driven research into gallium nitride (GaN)-based photon emitters and devices. Lanthanoid (Ln)-doped GaN exhibits temperature-insensitive, spectrally sharp, and stable visible/near infrared emission. Additionally, Ln-doped GaN leverages a well-developed GaN platform, enabling integration into more complex devices. However, the spontaneous emission rate of Ln ions in the 4f-4f transition is lower than that of other SPS candidates, such as quantum dots. In this study, we present two types of nanostructures that enhance the photon emission of implanted Ln ions in GaN: nanopillar structures and photonic crystal nanocavities. We discuss the mechanisms by which these nanostructures enhance photon emission and explore the future prospects of Ln-doped GaN SPS.
Abstract We demonstrate the optical coupling of implanted neodymium (Nd) ions in a photonic crystal (PhC)-L3 cavity on GaN at RT. The structure of the PhC-L3 cavity is designed by the electromagnetic field simulation to enhance the 4 F 3/2–4 I 9/2 and 4 F 3/2–4 I 11/2 transitions (916 and 1107 nm) in Nd3+. The highest enhancement ratio of 20-fold is achieved under our measurement conditions by the enhancement of spontaneous emission rate due to the Purcell effect in addition to the improvement of light collection efficiency. These results pave the way for the development of Ln-doped GaN based quantum light–matter interface and nanophotonics.
Rare-Earth Quantum Device Project aims to develop quantum devices based on gallium nitride (GaN), which has high quality and advanced microfabrication and device technologies, and rare-earth ions (RE3+), which have excellent characteristics as qubits and single photon sources. RE:GaN quantum devices have the potential to realize "electrically controlled single photon sources (SPSs) in the optical communication wavelength band at room temperature," "on-chip quantum entangled light sources," and "real-time diagnostics inside GaN devices by quantum sensing," which have not been achieved to date. Currently, our project studies ion implantation and post thermal annealing for high efficiency optical activation of implanted RE ions in GaN, local atomic structure of implanted RE ions, development of quantum sensing using RE ions in GaN, and enhancement of spontaneous emission of implanted RE ions in GaN by coupling to photonic crystal.
Abstract The nanoscale fabrication of μm-spaced single-photon emitter arrays is crucial for the development of integrated photonic chips. We report on the fabrication and systematic characterization of germanium-vacancy (GeV) color centers arrays in diamond obtained upon ion implantation at the nanoscale. Ge2+ ion implantations at 35 keV and 70 keV energies were carried out using a focused ion beam (FIB) equipped with a liquid metal alloy ion source. The arrays of emitters are subsequently aligned to ø300 nm nanopillar waveguiding structures, fabricated using a combination of electron-beam lithography and plasma etching. The photon collection efficiency and photoluminescence (PL) signal-to-background ratio increased by a factor 8 with respect to the unstructured sample. The photophysical properties of the GeV emitters fabricated by this approach were unaltered with respect to those found in unprocessed diamond. The efficiency of the overall manufacturing process to fabricate individual GeV centers was assessed. Up to 33% of the fabricated nanopillars, depending on ion implantation parameters, were found to contain single emitters.