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Asia Communications and Photonics Conference

Experimental Observation of Quantum Talbot Effects

Xiangdong Zhang, X-B Song, H-B Wang, Jun Xiong, K. G. Wang, K-H Luo, La Wu

Published Jan 1, 2012• 2 citations
Publisher

Abstract

We report the first experimental observation of quantum Talbot effects with single photons and entangled photon pairs. They exhibit unique properties, which are different from the case of previous proof-of-principle quantum lithography experiments.
DOI
10.1364/acp.2012.as2g.3

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We report the first experimental observation of quantum Talbot effects with single photons and entangled photon pairs. Both the first- and second-order quantum Talbot self-images are observed experimentally. They exhibit unique properties, which are different from those produced by coherent and incoherent classical light sources. In particular, our experiments show that the revival distance of two-photon Talbot imaging is twice the usual classical Talbot length and there is no net improvement in the resolution, due to the near-field effect of Fresnel diffraction, which is different from the case of previous proof-of-principle quantum lithography experiments in the far field.
One of the most surprising consequences of quantum mechanics is the entanglement of two or more distance particles. The 'ghost' image experiment demonstrated the astonishing nonlocal behavior of an entangled photon pair. Even though we still have questions in regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play important roles in practical applications. Quantum lithography is one of the hot topics. We have demonstrated a quantum lithography experiment recently. The experimental results have beaten the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
Abstract One of the most surprising consequences of quantum mechanics is the entanglement of two or more distant particles. The “ghost” image experiment demonstrated the astonishing nonlocal behavior of an entangled photon pair. Even though we still have question in regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play important roles in practical applications. Quantum lithography is one of the hot topics. We have demonstrated a prove‐of‐principle quantum lithography experiment recently. The experimental results have beaten the classical diffraction limit by a factor of two. This is a quantum mechanical two‐photon phenomenon but not a violation of the uncertainty principle.
The second-order Talbot effect is analyzed for a periodic object illuminated by entangled photon pairs in both the quantum imaging and quantum lithography configurations. The Klyshko picture is applied to describe the quantum imaging scheme, in which self-images of the object that may or may not be magnified can be observed nonlocally in the photon coincidences but not in the singles count rate. In the quantum lithography setup, we find that the second-order Talbot length is half that of the classical first-order case, thus the resolution may be improved by a factor of 2.