Topical Meeting on Optical Bistability (OB3) held in Tuscon, Arizona on Dec 2-4, 1985.
Adolf W. Lohmann, Demetri Psaltis, Stanley Desmond Smith +2 more
The topical meeting on Optical Bistability provided an international interdisciplinary forum for the exchange of knowledge on the progress of various aspects of optical bistability and optical nonlinearities. The three day program addressed six key areas: 1) Optical bistability in various materials; physics and applications; optical logic gates; etalon and waveguide devices; 2) New schemes and models for optical bistability, including increasing absorption, polarization, crosstrapping bistability, and bistability with surface plasmons; 3) Transverse and longitudinal effects including diffusion, conduction, diffraction, and absorption; 4) Instabilities, noise, fluctuations, and optical chaos; 5) Optical nonlinearities and optical materials including organic, liquid crystal, and semiconductor and photorefractive materials; and 6) Optical computing including architecture, cascading problems, parallel operations, and associate memory phenomena. A total of 97 papers were presented during the three day meeting. Keywords: Symposia abstracts; Nonlinear optical materials; Optoelectronics; Nonlinear guided waves; Chaos and instabilities.
•Dec 31, 1986•0 citations