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Optics Express

Rapid prototyping of grating magneto-optical traps using a focused ion beam

Xiao Sun, William D.A. Rickard, Ben M. Sparkes, Ben R. White, Rachel F. Offer, Andre Nicholas Luiten, C. N. Ironside

Published Oct 21, 2021• 8 citations
Publisher

Abstract

We have developed a rapid prototyping approach for creating custom grating magneto-optical traps using a dual-beam system combining a focused ion beam and a scanning electron microscope. With this approach we have created both one- and two-dimensional gratings of up to 400 µm × 400 µm in size with structure features down to 100 nm, periods of 620 nm, adjustable aspect ratios (ridge width : depth ∼ 1 : 0.3 to 1 : 1.4) and sidewall angles up to 71°. The depth and period of these gratings make them suitable for holographic trapping and cooling of neutral ytterbium on the 1S0 → 1P1 399 nm transition. Optical testing of the gratings at this wavelength has demonstrated a total first order diffraction of 90% of the reflected light. This work therefore represents a fast, high resolution, programmable and maskless alternative to current photo and electron beam lithography-based procedures and provides a time efficient process for prototyping of small period, high aspect ratio grating magneto-optical traps and other high resolution structures.

DOI
10.1364/oe.439479

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We have developed a rapid prototyping approach for creating custom grating magneto-optical traps using a dual-beam system combining a focused ion beam and a scanning electron microscope. With this approach we have created both one- and two-dimensional gratings of up to 400 µm × 400 µm in size with structure features down to 100 nm, periods of 620 nm, adjustable aspect ratios (ridge width : depth ∼ 1 : 0.3 to 1 : 1.4) and sidewall angles up to 71°. The depth and period of these gratings make them suitable for holographic trapping and cooling of neutral ytterbium on the 1S0 → 1P1 399 nm transition. Optical testing of the gratings at this wavelength has demonstrated a total first order diffraction of 90% of the reflected light. This work therefore represents a fast, high resolution, programmable and maskless alternative to current photo and electron beam lithography-based procedures and provides a time efficient process for prototyping of small period, high aspect ratio grating magneto-optical traps and other high resolution structures.
The design, fabrication, and demonstration of a planar two-dimensional-crossed reflective diffractive grating are proposed to construct a novel optical configuration, to the best of our knowledge, potentially applied for atom cooling and trapping in a magneto-optical trap. Based on the proposed single-beam single-exposure scheme by means of an orthogonal two-axis Lloyd’s mirrors interferometer, we rapidly patterned a ∼ 1 µ m period grating capable of providing a uniform intensity of the diffracted beams. The key structural parameters of the grating including the array square hole’s width and depth were determined, aiming at providing a high energy of the diffracted beams to perform the atom cooling and trapping. To guarantee the diffracted beams to be overlapped possibly, we adopted a polarized beam splitter to guide the optical path of the incident and zero-order diffracted beams. Therefore, one zero-order diffracted beam with a retroreflected mode and four first-order diffracted beams with appropriate optical path constructed a three-dimensional optical configuration of three orthogonal pairs of counterpropagating beams. Finally, three pairs of the counterpropagating cooling laser beams with 9 mm diameter and > 10 % diffraction efficiencies were achieved, and the circular polarization chirality, purity, and compensation of the desired diffracted beams are further evaluated, which preliminarily validated a high applicability for the magneto-optical trap system.
We have made magneto-optical traps (MOTs) on a chip which is able to cool and trap ~108atoms directly from a ~1cm3thermal background of87Rb. Diffraction gratings are used to manipulate the light from a single input beam to create the beams required for a MOT [1,2]. The gratings are etched into the surface of a silicon or GaAs wafer by either electron beam, or photo-lithography making them simple to fabricate and integrate into other atom chip architectures. We have developed a variety of gratings for utilisation both inside and outside a vacuum chamber - facilitating their incorporation into both new and existing devices. Unlike previously integrated cold atom sources on a chip [3,4] the atoms now sit above the surface where they can be easily imaged, manipulated and transferred into other on-chip potentials.
Grating magneto-optical traps are an enabling quantum technology for portable metrological devices with ultracold atoms. However, beam diffraction efficiency and angle are affected by wavelength, creating a single-optic design challenge for laser cooling in two stages at two distinct wavelengths – as commonly used for loading, e.g., Sr or Yb atoms into optical lattice or tweezer clocks. Here, we optically characterize a wide variety of binary gratings at different wavelengths to find a simple empirical fit to experimental grating diffraction efficiency data in terms of dimensionless etch depth and period for various duty cycles. The model avoids complex 3D light-grating surface calculations, yet still yields results accurate to a few percent across a broad range of parameters. Gratings optimized for two (or more) wavelengths can now be designed in an informed manner suitable for a wide class of atomic species enabling advanced quantum technologies.
Grating-based structures have recently been used as components of magneto-optical traps (MOT) to simplify the setup for trapping Rb atoms. Here, we design diffractive chips to trap more than one atom species. Our full-wave simulations show that a two-dimensional (2D) grating chip can simultaneously have high force-balancing efficiency for a wavelength of 780 nm for trapping Rb atoms and a wavelength of 852 nm for Cs atoms. We fabricated and characterized a mm-scale grating chip using electron-beam lithography, and are in the process of trapping experiments. Our work opens the door to compact multi-species MOTs.
Grating magneto-optical traps are an enabling quantum technology for portable metrological devices with ultracold atoms. However, beam diffraction efficiency and angle are affected by wavelength, creating a single-optic design challenge for laser cooling in two stages at two distinct wavelengths - as commonly used for loading, e.g., Sr or Yb atoms into optical lattice or tweezer clocks. Here, we optically characterize a wide variety of binary gratings at different wavelengths to find a simple empirical fit to experimental grating diffraction efficiency data in terms of dimensionless etch depth and period for various duty cycles. The model avoids complex 3D light-grating surface calculations, yet still yields results accurate to a few percent across a broad range of parameters. Gratings optimized for two (or more) wavelengths can now be designed in an informed manner suitable for a wide class of atomic species enabling advanced quantum technologies.
We report a programmable multiple ion beam system developed by combing a magneto-optical trap ion source with a spatial light modulator (SLM). Neutral rubidium atoms are trapped into a magneto-optical trap and cooled to 700 μK. An excitation laser beam, the intensity distribution of which is shaped into a square array by the SLM, selectively excites the cold atoms, which are subsequently ionized by an ionization laser beam. The ions are then extracted by an electric field to produce multiple ion beams. A 3×3 ion beam array has been generated. The size of each beams is 180 μm, and the transversal reduced emittance of multiple ion beams at the source is evaluated to be 1.65 × 10−9 m radeV. We also demonstrate the generation of ion bunches with a user-defined spatial pattern. In the future, by integrating this programmable multiple ion beam system with high reduction ion optics, it is possible to generate nanoscale multiple focused ion beams for the potential applications in maskless patterning and direct writing lithography.