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Journal of the Optical Society of America B

High-precision three-dimensional atom localization via Kerr nonlinearity

Yin Hong, Zhiping Wang, Benli Yu

Published Feb 20, 2019• 23 citations
Publisher

Abstract

Recently, there have been many schemes for achieving high-dimensional atom localization via measuring the first-order linear susceptibility. Here, we present a new scheme for high-precision three-dimensional (3D) atom localization in a three-level atomic system based on the Kerr nonlinearity, which refers to the real part of the third-order nonlinear susceptibility. Due to the space-dependent atom-field interaction, the position information of the atom can be determined by measuring Kerr nonlinearity in 3D space. Interestingly, by properly varying the parameters of the system, we find that there is only a small sphere in 3D space, which means the probability of finding the atom at a particular position can be 100%. Our scheme not only shows a new way to achieve high-precision and high-efficiency 3D atom localization but also provides some potential applications in high-dimensional atom nanolithography.

DOI
10.1364/josab.36.000746

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Recently, there have been many schemes for achieving high-dimensional atom localization via measuring the first-order linear susceptibility. Here, we present a new scheme for high-precision three-dimensional (3D) atom localization in a three-level atomic system based on the Kerr nonlinearity, which refers to the real part of the third-order nonlinear susceptibility. Due to the space-dependent atom-field interaction, the position information of the atom can be determined by measuring Kerr nonlinearity in 3D space. Interestingly, by properly varying the parameters of the system, we find that there is only a small sphere in 3D space, which means the probability of finding the atom at a particular position can be 100%. Our scheme not only shows a new way to achieve high-precision and high-efficiency 3D atom localization but also provides some potential applications in high-dimensional atom nanolithography.
We present a new scheme for high-efficiency three-dimensional (3D) atom localization in a three-level atomic system via measuring the absorption of a weak probe field. Owing to the space-dependent atom–field interaction, the position probability distribution of the atom can be directly determined by measuring the probe absorption. It is found that, by properly varying the parameters of the system, the probability of finding the atom at a particular position can be almost 100%. Our scheme opens a promising way to achieve high-precision and high-efficiency 3D atom localization, which provides the possibility to realize laser cooling or atom nanolithography via 3D atom localization.
Abstract We present a new scheme for high-efficiency three-dimensional (3D) atom localization in a four-level atomic system via measuring the populations in two excited states. Owing to the space-dependent atom–field interaction, the position probability distribution of the atom passing through the standing waves can be directly determined by measuring the populations in two excited states. It is found that the phase-sensitive property of the atomic system reduces the uncertainty in the position measurement of the atom. In particular, the probability of finding the atom in 3D space can be almost 100% via properly varying the parameters of the system. Our scheme opens a promising way to achieve high-precision and high-efficiency 3D atom localization, which provides some potential applications in the atom nanolithography via 3D atom localization.
We present a new scheme for three-dimensional (3D) atom localization in a three-level atomic system via measuring the absorption of a weak probe field. Owing to the space-dependent atom-field interaction, the position probability distribution of the atom can be directly determined by measuring the probe absorption. It is found that, by properly varying the parameters of the system, the probability of finding the atom in 3D space can be almost 100%. Our scheme opens a promising way to achieve high-precision and high-efficiency 3D atom localization, which provides some potential applications in laser cooling or atom nano-lithography via atom localization.
We investigate high-precision three-dimensional (3D) atom localization in a coherently-driven, fourlevel atomic system via spontaneous emission. Space-dependent atom-field interactions allow atomic position information to be obtained by measuring spontaneous emission. By properly varying system parameters, atoms within a certain range can be localized with nearly a probability of 100% and a maximal resolution of ~ 0.04λ. This scheme may be useful for the high-precision measurement of the center-of-mass wave functions of moving atoms and in atom nanolithography.
We propose a new scheme for three-dimensional (3D) atom localization controlled by incoherent pump in a three-level Λ-type atomic system. The spatial position information of an atom in 3D space can be achieved via measuring probe gain and absorption when the atom passes through three mutually perpendicular standing-wave fields. It is found that high-detecting-probability and high-precision 3D atom localization can be obtained via properly adjusting the relevant parameters in the presence of the combination of a traveling-wave field and three orthogonal standing-wave fields. Furthermore, it is also shown that the incoherent pumping field can switch the localization patterns from the probe-gain sphere to the probe-absorption sphere and enhance 3D atom-localization precision.
Abstract We present a new scheme for three-dimensional (3D) atom localization in a four-level atomic system based on the interference of double-dark resonances. Owing to the space-dependent atom-field interaction, the position probability distribution of the atom can be directly determined by measuring the probe absorption. It is found that, by properly varying the parameters of the system, the probability of finding the atom in 3D space can be 1/2. Our scheme opens a promising way to achieve high-precision and high-efficiency 3D atom localization, which provides some potential applications in the atom nanolithography via 3D atom localization.