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New Journal of Physics

Direct writing of single germanium vacancy center arrays in diamond

Yu Zhou, Zhao Mu, Giorgio Adamo, Sven Bauerdick, Axel Rudzinski, Igor Aharonovich, Weibo Gao

Published Nov 21, 2018• 49 citations
Publisher

Abstract

Color centers in diamond are promising solid-state qubits for scalable quantum photonics applications. Amongst many defects, those with inversion symmetry are of an interest due to their promising optical properties. In this work, we demonstrate a maskless implantation of an array of bright, single germanium vacancy (GeV) centers in diamond. Employing the direct focused ion beam technique, single GeV emitters are engineered with the spatial accuracy of tens of nanometers. The single GeV creation ratio reaches as high as 53% with the dose of 200 Ge + ions per spot. The presented fabrication method is promising for future nanofabrication of integrated photonic structures with GeV emitters as a leading platform for spin-spin interactions.

DOI
10.1088/1367-2630/aaf2ac

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Color centers in diamond are promising solid-state qubits for scalable quantum photonics applications. Amongst many defects, those with inversion symmetry are of an interest due to their promising optical properties. In this work, we demonstrate a maskless implantation of an array of bright, single germanium vacancy (GeV) centers in diamond. Employing the direct focused ion beam technique, single GeV emitters are engineered with the spatial accuracy of tens of nanometers. The single GeV creation ratio reaches as high as 53% with the dose of 200 Ge + ions per spot. The presented fabrication method is promising for future nanofabrication of integrated photonic structures with GeV emitters as a leading platform for spin-spin interactions.
Abstract The nanoscale fabrication of μm-spaced single-photon emitter arrays is crucial for the development of integrated photonic chips. We report on the fabrication and systematic characterization of germanium-vacancy (GeV) color centers arrays in diamond obtained upon ion implantation at the nanoscale. Ge2+ ion implantations at 35 keV and 70 keV energies were carried out using a focused ion beam (FIB) equipped with a liquid metal alloy ion source. The arrays of emitters are subsequently aligned to ø300 nm nanopillar waveguiding structures, fabricated using a combination of electron-beam lithography and plasma etching. The photon collection efficiency and photoluminescence (PL) signal-to-background ratio increased by a factor 8 with respect to the unstructured sample. The photophysical properties of the GeV emitters fabricated by this approach were unaltered with respect to those found in unprocessed diamond. The efficiency of the overall manufacturing process to fabricate individual GeV centers was assessed. Up to 33% of the fabricated nanopillars, depending on ion implantation parameters, were found to contain single emitters.
Negatively charged germanium vacancy centers (GeV) in diamond are a promising platform for quantum computing and quantum communication. However, these applications require the precise incorporation of GeV centers with good optical properties inside of nanophotonic structures. In this work, we demonstrate the highly efficient local creation of GeV centers in diamond via focused-ion-beam implantation, followed by high-temperature annealing. We report the successful creation of GeV centers over the depth range of 5.5 - 30 nm. Implantation at low fluence enables the creation of single GeV centers. The formation yield strongly depends on implantation energy and fluence, reaching up to 33% at energies of 35 and 70 keV. This method, therefore, enables the efficient creation of GeV centers within a small, well-defined local sample volume and offers a potential means of incorporating them into photonic structures.
Atomic-sized fluorescent defects in diamond are widely recognized as a promising solid state platform for quantum cryptography and quantum information processing. For these applications, single photon sources with a high intensity and reproducible fabrication methods are required. In this study, we report a novel color center in diamond, composed of a germanium (Ge) and a vacancy (V) and named the GeV center, which has a sharp and strong photoluminescence band with a zero-phonon line at 602 nm at room temperature. We demonstrate this new color center works as a single photon source. Both ion implantation and chemical vapor deposition techniques enabled fabrication of GeV centers in diamond. A first-principles calculation revealed the atomic crystal structure and energy levels of the GeV center.
Color centers in diamond are widely recognized as a promising solid state platform for quantum cryptography and quantum information processing. For these applications, single photon sources with a high intensity and reproducible fabrication methods are required. Here, we report a novel color center in diamond, composed of a germanium (Ge) and a vacancy (V) and named the GeV center, which has a sharp and strong photoluminescence band with a zero-phonon line at 602 nm at room temperature. We demonstrate this new color center works as a single photon source. Both ion implantation and chemical vapor deposition techniques enabled fabrication of GeV centers in diamond. A first-principles calculation revealed the atomic crystal structure and energy levels of the GeV center.
Among promising color centers for single-photon sources in diamond, the negatively charged silicon-vacancy (SiV − ) has 70% of its emission to the zero-phonon line (ZPL), in contrast to the negatively charged nitrogen vacancy (NV − ), which has a broad spectrum. Fabricating single centers of useful defect complexes with high yield and excellent grown-in defect properties by ion implantation has proven to be challenging. We have fabricated bright single SiV − centers by 60-keV focused ion beam implantation and subsequent annealing at 1000 °C with high positioning accuracy and a high yield of 15%.
Split-vacancy color centers in diamonds are promising solid-state platforms for the implementation of photonic quantum technologies. These luminescent defects are commonly fabricated upon low-energy ion implantation and subsequent thermal annealing. Their technological uptake will require the availability of reliable methods for the controlled, large-scale production of localized individual photon emitters. This task is partially achieved by controlled ion implantation to introduce selected impurities in the host material and requires the development of challenging beam focusing or collimation procedures coupled with single-ion detection techniques. We report on the protocol for the direct optical activation of split-vacancy color centers in diamond via localized processing with a continuous-wave laser at mW optical powers. We demonstrate the activation of photoluminescent Mg- and Sn-related centers at both the ensemble and single-photon emitter levels in ion-implanted, high-purity diamond crystals without further thermal processing. The proposed lithographic method enables the activation of individual color centers at specific positions of a large-area sample by means of a relatively inexpensive equipment offering real-time, in situ monitoring of the process.