Ultracold Rb focused ion beam

Photoionizing a beam of ultracold atoms can provide a high-brightness ion beam, to improve resolution in focused-ion-beam nanofabrication. With this aim, the authors use laser cooling and compression to give a ${}^{85}$ Rb atomic beam an equivalent brightness better than the current standard for the semiconductor industry. This could represent an important step toward smaller feature sizes in integrated circuits.Photoionizing a beam of ultracold atoms can provide a high-brightness ion beam, to improve resolution in focused-ion-beam nanofabrication. With this aim, the authors use laser cooling and compression to give a ${}^{85}$Rb atomic beam an equivalent brightness better than the current standard for the semiconductor industry. This could represent an important step toward smaller feature sizes in integrated circuits.

arXiv:1612.01883Physical Review AppliedMay 22, 201713 citations

Ultracold ion beams using laser cooling

Ejd Edgar Vredenbregt, Shw Steinar Wouters, G. ten Haaf +1 more

Focused ion beam instruments a"re indispensable tools for the semiconductor\nindustry due to their ability to image and modify structures on the nanometer\nlength scale. For milling and deposition, the industry standard is the gallium\nliquid-metal ion source which enables a resorution of 5-10 nm at a current\nof a few pA. with the quest towards smaller features on integrated circuits,\nthere is a need for novel ion sources that allow for better resolution. Several\nresearch groups are working towards applying laser-intensified alkali-metal ion\nbeams for this purpose [1].\ns-uch ultra-low temperature (1 mK) ion beams can be created by lasercooling\nand photo-ionization of a thermal atomic beam or vapor. The Rb ion\nsource under development in Eindhoven in collaboration with FEI cFocused ion beam instruments a"re indispensable tools for the semiconductor\nindustry due to their ability to image and modify structures on the nanometer\nlength scale. For milling and deposition, the industry standard is the gallium\nliquid-metal ion source which enables a resorution of 5-10 nm at a current\nof a few pA. with the quest towards smaller features on integrated circuits,\nthere is a need for novel ion sources that allow for better resolution. Several\nresearch groups are working towards applying laser-intensified alkali-metal ion\nbeams for this purpose [1].\ns-uch ultra-low temperature (1 mK) ion beams can be created by lasercooling\nand photo-ionization of a thermal atomic beam or vapor. The Rb ion\nsource under development in Eindhoven in collaboration with FEI c

Jan 1, 20150 citations

{}^{85}

Rb atomic beam an equivalent brightness better than the current standard for the semiconductor industry. This could represent an important step toward smaller feature sizes in integrated circuits.