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Bulletin of the American Physical Society

Formation and Annealing Behaviors of Qubit Centers in 4H-SiC from First Principles

Mingwen Zhao, Xiaopeng Wang, Hongxia Bu, Hongyu Zhang, Xiujie He, Aizhu Wang

Published Mar 15, 2016• 0 citations
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Quantum Information Applications with Single Defect Centers in 4H-SiC

Naoya Morioka

ICSCRM2019 Organizing Committee•Jul 19, 2019•0 citations

Ab Initio Study of Erbium Point Defects in 4H-SiC for Quantum Devices

Michael Kuban

Identifying scalable materials systems that exhibit quantum behavior is a central challenge in quantum information science. Point defects in certain wide-bandgap semiconductors are promising in this regard due to the maturity of semiconductor manufacturing and ion implantation technology. Single erbium defect centers in 4H-SiC are examples of such defects that provide access to discrete defect-induced electron energy levels within the bulk material bandgap, which can be utilized for a variety of quantum technologies, such as single-photon emission for secure communication and distributed quantum computing. This work presents a first-principles study of erbium point defects in 4H-SiC using density functional theory. These results provide materials-level support for the development of Er point defects in 4H-SiC as a scalable platform for quantum devices, helping to bridge the gap between quantum physics and the practical realization of quantum networks.

quant-pharXiv:2603.15343•Mar 17, 2026

High-yield engineering and identification of oxygen-related modified divacancies in 4H-SiC

Qi-Cheng Hu, Ji-Yang Zhou, Shuo Ren +9 more

Modified divacancies in the 4H polytype of silicon carbide (SiC) exhibit enhanced charge stability and spin addressability at room temperature, making them attractive for quantum applications. However, their low formation yield and lack of direct structural identification have hindered progress. Here, we demonstrate a controllable method for high-yield engineering and identification of oxygen-related modified divacancy color centers in 4H-SiC via oxygen-ion implantation. Based on their distinct optical and spin-resonance characteristics, we experimentally resolve four types of modified divacancies. Furthermore, by measuring isotope-resolved 17O hyperfine interactions, we identify them as the four crystallographic configurations of oxygen-vacancy (OV) complexes. Remarkably, single OV centers account for over 90% of the total defect population and exhibit superior optical properties and spin coherence compared with defects created by conventional carbon or nitrogen implantation. We characterize the zero-phonon lines of these OV centers and reveal distinct temperature-dependent behavior in spin-readout contrast. By optimizing implantation dose and annealing temperature, we achieve high-density ensembles and observe Rabi-oscillation beating patterns associated with different orientations of basal-type defects. These results establish a high-yield route for scalable engineering of these four oxygen-related modified divacancies in 4H-SiC and clarify their atomic structure, opening new opportunities for solid-state quantum technologies.

quant-pharXiv:2511.22608•Nov 28, 2025

Recent Advances in Materials and Technologies for Semiconductor Qubits

Tomohiro Otsuka

The Journal of the Institute of Electrical Engineers of Japan•Jun 30, 2026•0 citations

Quantum Simulations of Fermionic Hamiltonians with Efficient Encoding and Ansatz Schemes

Benchen Huang, Nan Sheng, Marco Govoni +1 more

We propose a computational protocol for quantum simulations of fermionic Hamiltonians on a quantum computer, enabling calculations on spin defect systems which were previously not feasible using conventional encodings and a unitary coupled-cluster ansatz of variational quantum eigensolvers. We combine a qubit-efficient encoding scheme mapping Slater determinants onto qubits with a modified qubit-coupled cluster ansatz and noise-mitigation techniques. Our strategy leads to a substantial improvement in the scaling of circuit gate counts and in the number of required qubits, and to a decrease in the number of required variational parameters, thus increasing the resilience to noise. We present results for spin defects of interest for quantum technologies, going beyond minimum models for the negatively charged nitrogen vacancy center in diamonds and the double vacancy in 4H silicon carbide (4H-SiC) and tackling a defect as complex as negatively charged silicon vacancy in 4H-SiC for the first time.

arXiv:2212.01912•Journal of Chemical Theory and Computation•Feb 15, 2023•19 citations

Efficient formation and identification of single emitters in 4H-SiC following maskless heavy ion implantation

S. Eserin, L. K. S. Zimmermann, E. Schneider +12 more

Single photon emitters in silicon carbide (SiC) are a leading platform for scalable quantum technologies. Recent interest has focused on oxygen-vacancy-related emitters, which show exceptionally high optical brightness and strong spin readout contrast. One barrier to scalable quantum devices based on these emitters is the challenge of maskless formation and rapid identification. Here, we demonstrate the formation of isolated bright single emitters in 4H-SiC, using low-energy maskless implantation of heavy ions bismuth and tin. Following annealing, up to 18% of implanted sites host a single emitter, with optimal yields achieved at annealing temperatures of 900-1000 degrees C. Occupancy statistics are modelled to estimate the implantation dose that maximises single-emitter yield. We introduce a tiered characterisation scheme, where a simple intensity threshold isolates single-emitter candidates, confirmed through photon correlation measurements, after which correlations between polarisation, saturation count rate and magnetic resonance frequency assign emitter type. It is shown that time-consuming low-temperature spectroscopy is not necessary to distinguish emitter types. Together, maskless heavy-ion implantation and selective screening offer an efficient route to forming and rapidly identifying near-surface single emitters for room-temperature quantum technologies such as quantum sensing.

quant-pharXiv:2608.27281•Aug 28, 2026•0 citations
Identifying scalable materials systems that exhibit quantum behavior is a central challenge in quantum information science. Point defects in certain wide-bandgap semiconductors are promising in this regard due to the maturity of semiconductor manufacturing and ion implantation technology. Single erbium defect centers in 4H-SiC are examples of such defects that provide access to discrete defect-induced electron energy levels within the bulk material bandgap, which can be utilized for a variety of quantum technologies, such as single-photon emission for secure communication and distributed quantum computing. This work presents a first-principles study of erbium point defects in 4H-SiC using density functional theory. These results provide materials-level support for the development of Er point defects in 4H-SiC as a scalable platform for quantum devices, helping to bridge the gap between quantum physics and the practical realization of quantum networks.
Modified divacancies in the 4H polytype of silicon carbide (SiC) exhibit enhanced charge stability and spin addressability at room temperature, making them attractive for quantum applications. However, their low formation yield and lack of direct structural identification have hindered progress. Here, we demonstrate a controllable method for high-yield engineering and identification of oxygen-related modified divacancy color centers in 4H-SiC via oxygen-ion implantation. Based on their distinct optical and spin-resonance characteristics, we experimentally resolve four types of modified divacancies. Furthermore, by measuring isotope-resolved 17O hyperfine interactions, we identify them as the four crystallographic configurations of oxygen-vacancy (OV) complexes. Remarkably, single OV centers account for over 90% of the total defect population and exhibit superior optical properties and spin coherence compared with defects created by conventional carbon or nitrogen implantation. We characterize the zero-phonon lines of these OV centers and reveal distinct temperature-dependent behavior in spin-readout contrast. By optimizing implantation dose and annealing temperature, we achieve high-density ensembles and observe Rabi-oscillation beating patterns associated with different orientations of basal-type defects. These results establish a high-yield route for scalable engineering of these four oxygen-related modified divacancies in 4H-SiC and clarify their atomic structure, opening new opportunities for solid-state quantum technologies.
We propose a computational protocol for quantum simulations of fermionic Hamiltonians on a quantum computer, enabling calculations on spin defect systems which were previously not feasible using conventional encodings and a unitary coupled-cluster ansatz of variational quantum eigensolvers. We combine a qubit-efficient encoding scheme mapping Slater determinants onto qubits with a modified qubit-coupled cluster ansatz and noise-mitigation techniques. Our strategy leads to a substantial improvement in the scaling of circuit gate counts and in the number of required qubits, and to a decrease in the number of required variational parameters, thus increasing the resilience to noise. We present results for spin defects of interest for quantum technologies, going beyond minimum models for the negatively charged nitrogen vacancy center in diamonds and the double vacancy in 4H silicon carbide (4H-SiC) and tackling a defect as complex as negatively charged silicon vacancy in 4H-SiC for the first time.
Single photon emitters in silicon carbide (SiC) are a leading platform for scalable quantum technologies. Recent interest has focused on oxygen-vacancy-related emitters, which show exceptionally high optical brightness and strong spin readout contrast. One barrier to scalable quantum devices based on these emitters is the challenge of maskless formation and rapid identification. Here, we demonstrate the formation of isolated bright single emitters in 4H-SiC, using low-energy maskless implantation of heavy ions bismuth and tin. Following annealing, up to 18% of implanted sites host a single emitter, with optimal yields achieved at annealing temperatures of 900-1000 degrees C. Occupancy statistics are modelled to estimate the implantation dose that maximises single-emitter yield. We introduce a tiered characterisation scheme, where a simple intensity threshold isolates single-emitter candidates, confirmed through photon correlation measurements, after which correlations between polarisation, saturation count rate and magnetic resonance frequency assign emitter type. It is shown that time-consuming low-temperature spectroscopy is not necessary to distinguish emitter types. Together, maskless heavy-ion implantation and selective screening offer an efficient route to forming and rapidly identifying near-surface single emitters for room-temperature quantum technologies such as quantum sensing.