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IEEE Transactions on Magnetics

All refractory NbN/MgO/NbN tunnel junctions

Henry George LeDuc, J. A. Stern, S. Thakoor, S. K. Khanna

Published Mar 1, 1987• 38 citations
Publisher

Abstract

We report the fabrication of all-refractory superconductor-insulator-superconductor tunnel junctions of the form NbN/MgO/NbN. The MgO insulating barrier was deposited by e-beam evaporation. High quality junctions were fabricated with sum gaps of 5.2 meV, and a small subgap leakage parameter (Vm=30 mV, measured at 3mV). These devices are for eventual use as quasiparticle mixer elements in millimeter/submiltimeter wave heterodyne receivers. Fabrication techniques and current-voltage characteristics are discussed. We also propose a new growth mode for MgO films on NbN.

DOI
10.1109/tmag.1987.1064988

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The authors report on the fabrication and testing of all-refractory NbN/MgO/NbN SIS (superconductor-insulator-superconductor) tunnel junctions for use as high-frequency mixers. Progress in the development of techniques for the fabrication of submicron-area tunnel junctions is described. Junction structures which have been investigated include mesa, crossline, and edge geometries. Using reactive sputtering techniques, NbN tunnel junctions with critical currents in excess of 10/sup 4/ A/cm/sup 2/ have been fabricated with V/sub m/ values as high as 65 mV and areas down to 0.1 mu m/sup 2/. Specific capacitance measurements on NbN/MgO/NbN mesa-type tunnel junctions give values in the range 60-90 fF/ mu m/sup 2/. These SIS tunnel junctions have been integrated with antennas and coupling structures for mixer tests in a waveguide receiver at 207 GHz. Preliminary mixer results are reported.>

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Development of NbN Josephson Junction technology

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A novel process suitable for fabrication superconducting circuitry based on the all refactory material NbN is described. In this process, and in-situ trilayer film composed of NbN/MgO/NbN is used to fabricate Josephson tunnel junctions. Reactive ion etching processes are used to delineate devices and pattern insulators and metallizations. Fabricated junctions have yielded good tunneling characteristics with reasonable current density uniformity and reproducibility. Devices with gap voltages close to 3mV have been achieved for high quality junctions (Vm 20 mV). In addition to the trilayer, there are two wiring layers, two resistor depositions, and two insulation layers, constituting a full NbN based fabrication technology. Using this process, we fabricated and successfully tested thin film DC SQUID and time domain reflectometer (TDR) circuits. Preliminary measurements suggest that the critical temperature of these circuits is well within the operating temperature of commercial two-stage closed cycle refrigerators. (Author)

Final Report•Jul 24, 1986•0 citations
We report the fabrication of all-refractory superconductor-insulator-superconductor tunnel junctions of the form NbN/MgO/NbN. The MgO insulating barrier was deposited by e-beam evaporation. High quality junctions were fabricated with sum gaps of 5.2 meV, and a small subgap leakage parameter (Vm=30 mV, measured at 3mV). These devices are for eventual use as quasiparticle mixer elements in millimeter/submiltimeter wave heterodyne receivers. Fabrication techniques and current-voltage characteristics are discussed. We also propose a new growth mode for MgO films on NbN.
Within the past few years all-refractory superconductor-insulator-superconductor (SIS) tunnel junctions based on Nb/Al/AlO/sub x//Nb technology have displaced lead alloy devices as the preferred junctions for SIS mixers. There is growing interest in materials with higher superconducting energy gaps. NbN has a high gap ( approximately 3 meV) and higher critical temperature than Nb. Its main drawback, apart from the greater complexity of the material itself, stems from its short superconducting coherence length which results in a decrease in the measured gap voltage in proximity barrier structures, as generally used for Nb-based junctions. For this reason, most recent work has concentrated on the direct deposition of MgO as a tunnel barrier. The authors summarise work on Nb devices for MM-wave mixers and then report recent work performed at Cambridge on the fabrication of high quality NbN device structures.
All-NbN Josephson tunnel junctions with sputter-deposited magnesium oxide barriers have been fabricated using single-crystal NbN films for the base electrodes. Fabricated Josephson junctions have shown good tunneling characteristics with large gap voltages (5.6-5.8 mV), narrow gap widths (0.1-0.2 mV, from 30 to 70%), and small subgap leakage currents (V/sub m/=20-30 mV, measured at 3 mV). The results of a measurement of a subgap structure for a fabricated junction suggest that the excess leakage currents of fabricated junctions are due to multiparticle tunneling through locally thin areas in the MgO barriers.
This thesis describes the development and testing of NbN/MgO/NbN tunnel junctions for use as superconductor-insulator-superconductor (SIS) mixers. SIS mixers are the most sensitive heterodyne detectors in the millimeter wavelength region. Most SIS mixers use Pb alloy tunnel junction. These tunnel junctions have several problems associated with the soft nature of Pb and its low superconducting transition temperature. NbN-based tunnel junctions are being developed to overcome these difficulties. These devices are intended to be used as mixers at millimeter and submillimeter wavelengths. This thesis describes the fabrication process involved in making NbN junctions, and the results of measurements on these devices. The purpose of these measurements is to determine the future possibilities of NbN tunnel junctions as high-frequency mixers. The first chapter is an introduction to SIS mixers and explains how tunnel junction properties affect mixer performance. The basic theory of tunneling and mixing in SIS mixers is first presented. A description of quantum mixer theory is included in this presentation. This theory makes several interesting predictions that cannot be explained using classical theories. This is followed by a description of how real SIS tunnel junctions differ from ideal junctions. The physical origin of these differences is discussed, along with how they affect SIS mixer performance. Finally, the advantages and disadvantages of the various superconducting materials available are discussed. The decision to develop NbN devices is based on these material properties. The second chapter describes the methods used to fabricate small-area NbN/MgO/NbN tunnel junctions. The chapter begins with a description of the various methods that have been used to deposit NbN films. Reactive magnetron sputtering is chosen as the best method for tunnel junction fabrication. Details on the vacuum systems and the methods used for depositing superconducting NbN are discussed. Next, the process used for depositing junction trilayers (NbN/MgO/NbN) is described. The probable growth mode of MgO on NbN is presented. The importance of this growth mode to the junction quality is explained in some detail. Next, standard junction processing steps are reported. The details and limitations of each step are put forth. The standard process allows for the fabrication of 1 [square micron] tunnel junctions. Finally, this chapter discusses several methods of fabaricating submicron junctions that are being pursued. The status of this work is given. The third chapter describes the characterization of NbN films and NbN/Mg0/NbN tunnel junctions. Film properties are described first. The correlation of these properties to deposition conditions is discussed in some detail. Next, values for the various features of the I-V characteristic are given; typical and exceptional values are noted. How these features limit mixer results is described in detail. Several important device attributes were measured using superconducting-quantum-interference-devices (SQUIDs). These attributes are the junction's specific capacitance and the film's magnetic penetration depth. The theory and results of measuring specific capacitance and penetration depth are presented. Following the SQUID results is a large section on RP testing. Mixer tests were made at 205 GHz. The receiver design used, integral inductive tuning circuit used and results are discussed. These results are well understood, with the exception of the temperature dependence of the mixer performance. Finally, measurements of the uniformity of many junctions on a single wafer are presented. The importance of junction uniformity is also described. The final chapter discusses the ultimate limits on NbN mixers, and tells what future work must be done to achieve these limits. The primary high-frequency limit on NbN junctions is the capacitance of NbN/MgO/NbN junctions. The limit imposed by the junction capacitance and circuits used to tune out this capacitance are discussed. Also, the low-frequency limits on NbN junctions are discussed. The status of submicron devices is presented. Junction area is the most immediate limitation on NbN mixer results. The possibility of using other barrier materials to increase the RC speed of NbN junctions is presented. Finally, the possibility of operating NbN junctions at temperatures above 4.2 K is discussed.
The authors report on the fabrication and testing of all-refractory NbN/MgO/NbN SIS (superconductor-insulator-superconductor) tunnel junctions for use as high-frequency mixers. Progress in the development of techniques for the fabrication of submicron-area tunnel junctions is described. Junction structures which have been investigated include mesa, crossline, and edge geometries. Using reactive sputtering techniques, NbN tunnel junctions with critical currents in excess of 10/sup 4/ A/cm/sup 2/ have been fabricated with V/sub m/ values as high as 65 mV and areas down to 0.1 mu m/sup 2/. Specific capacitance measurements on NbN/MgO/NbN mesa-type tunnel junctions give values in the range 60-90 fF/ mu m/sup 2/. These SIS tunnel junctions have been integrated with antennas and coupling structures for mixer tests in a waveguide receiver at 207 GHz. Preliminary mixer results are reported.>
Niobium nitride-niobium nitride Josephson tunnel junctions have been fabricated using amorphous magnesium oxide (a-MgO) films as barriers. These junctions have excellent tunneling characteristics. For example, a large gap voltage (Vg=5.1 mV), a large product of the maximum critical current and the normal tunneling resistance (IcRn=3.25 mV), and a small subgap leakage current (Vm=45 mV, measured at 3 mV) have been obtained for a NbN/a-MgO/NbN junction. The critical current of this junction remains finite up to 14.5 K.
A novel process suitable for fabrication superconducting circuitry based on the all refactory material NbN is described. In this process, and in-situ trilayer film composed of NbN/MgO/NbN is used to fabricate Josephson tunnel junctions. Reactive ion etching processes are used to delineate devices and pattern insulators and metallizations. Fabricated junctions have yielded good tunneling characteristics with reasonable current density uniformity and reproducibility. Devices with gap voltages close to 3mV have been achieved for high quality junctions (Vm 20 mV). In addition to the trilayer, there are two wiring layers, two resistor depositions, and two insulation layers, constituting a full NbN based fabrication technology. Using this process, we fabricated and successfully tested thin film DC SQUID and time domain reflectometer (TDR) circuits. Preliminary measurements suggest that the critical temperature of these circuits is well within the operating temperature of commercial two-stage closed cycle refrigerators. (Author)