We present the results of experiments measuring the film thickness dependence of the sticking probability for H on superfluid {sup 4}He for H atom temperatures of 0.3-5.0 mK. Data is presented for 3 nm to 1 mm thick films on a silver sinter substrate. For the 0.3 mK H atoms, the sticking probability varies from 0.4 for a film 3 nm thick to 6 x 10{sup -3} for films thicker than 100 nm. In the case of the thick films the temperature dependence of the sticking probability is consistent with the observation of pure quantum reflection. Our data are in reasonable agreement with recent theoretical calculations.
We have measured the sticking probability of atomic hydrogen on a superfluid
4He surface for atom energies between 100 \ensuremath{\mu}K and 1 mK. The sticking probability shows little variation with energy over this interval, and is close to the value 0.2. The studies were carried out using a magnetic trap that produced a density of 8\ifmmode\times\else\texttimes\fi{}
1013 ${\mathrm{cm}}^{\mathrm{\ensuremath{-}}3}$ at a temperature of 100 \ensuremath{\mu}K.