Bulletin of the American Physical Society
Surface reflection of submillikelvin atomic hydrogen from superfluid {sup 4}He: Quantum reflection in the thick film limit and substrate effects
Ite A. Yu, John M. Doyle, Jon C. Sandberg, Claudio Lenz Cesar
Abstract
We present the results of experiments measuring the film thickness dependence of the sticking probability for H on superfluid {sup 4}He for H atom temperatures of 0.3-5.0 mK. Data is presented for 3 nm to 1 mm thick films on a silver sinter substrate. For the 0.3 mK H atoms, the sticking probability varies from 0.4 for a film 3 nm thick to 6 x 10{sup -3} for films thicker than 100 nm. In the case of the thick films the temperature dependence of the sticking probability is consistent with the observation of pure quantum reflection. Our data are in reasonable agreement with recent theoretical calculations.