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Journal of Modern Optics

Two-dimension atom nano-lithograph via atom localization

Luling Jin, Hui Sun, Yueping Niu, Shiqi Jin, Shangqing Gong

Published Nov 10, 2008• 65 citations
Publisher

Abstract

We propose a method for a two-dimension atom nano-lithograph based on two-dimension atom localization. By applying two orthogonal standing-wave fields, the atoms can be localized on some special positions, leading to the formation of sub-wavelength two-dimension periodic patterns. The pattern topographies can be modified by adjusting the intensities of the standing wave fields.

DOI
10.1080/09500340802267134

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We propose a method for a two-dimension atom nano-lithograph based on two-dimension atom localization. By applying two orthogonal standing-wave fields, the atoms can be localized on some special positions, leading to the formation of sub-wavelength two-dimension periodic patterns. The pattern topographies can be modified by adjusting the intensities of the standing wave fields.
We propose a scheme for two-dimensional (2D) atom localization based on the controlled spontaneous emission, in which the atom interacts with two orthogonal standing-wave fields. Due to the spatially dependent atom-field interaction, the position probability distribution of the atom can be directly determined by measuring the resulting spontaneously emission spectrum. The phase sensitive property of the atomic system leads to quenching of the spontaneous emission in some regions of the standing-waves, which significantly reduces the uncertainty in the position measurement of the atom. We find that the frequency measurement of the emitted light localizes the atom in half-wavelength domain. Especially the probability of finding the atom at a particular position can reach 100% when a photon with certain frequency is detected. By increasing the Rabi frequencies of the driving fields, such 2D sub-half-wavelength atom localization can acquire high spatial resolution.
We discuss formation of two-dimensional spatial structures of atoms due to atomic diffraction on two crossed standing electromagnetic fields. This analysis proposed for V-type atomic configuration under dispersive atom-field interactions in quantum regime. Localization of the position of atoms passing through standing light wave is initiated by making a quadrature phase measurement on the light fields. We develop the procedure for strong two-dimensional spatial localization of atomic beam within the optical wavelength. Considering atomic spatial localization in the presence of entanglement of two light beams various two-dimensional patterns for V-type atoms are reported.
A new approach for achieving two - dimensional (2D) atom localization microscopy based on the projection of three - dimensional (3D) localization in the plane of the detector is described in the present work. Spatial variation of the position-dependent 2D-localization pattern in the xy-plane is obtained with the shifting of the position of the detector along the z-axis under the parallel- and cross- axis configurations of the standing-wave fields. An attempt is made to study the 2D-localization characteristics in the specific parametric conditions for which the localization structures evolve with different shapes eventually leading to 100% detection probability of the atom both in the sub-wavelength and sub-half-wavelength regimes. The scope of tuning the cross-axis configuration over a wide range adds novelty and robustness to this model. Apart from the 2D-localization, various localization patterns with eight- to single-peak structures appear as interesting outcomes through the efficient manipulation of control parameters in the study of one-dimensional (1D) atom localization. The application of the traveling-wave field or its equivalent appears to be unique in achieving high-precision localization with maximal probability (100%) in both the 1D and 2D field-configuration schemes. Proper tuning of the traveling wave accompanied by the standing wave in the 1D scheme results in the single-peak localization in the sub-half-wavelength range. As a whole, the present work seems to be very much efficient for high-precision optical lithography.
We propose a scheme for two-dimensional (2D) atom localization based on the controllable Autler–Townes spontaneous spectrum in a three-level ladder-type atomic system. The two upper levels are driven by two orthogonal standing-wave fields, where each standing-wave field is constituted of the superposition of two standing-wave fields along the corresponding direction. It is found that, depending on the effect of the asymmetric superposition, the maximal probability of finding an atom within the sub-half-wavelength domain of the standing waves can reach unity with appropriate values of the frequency detuning of the spontaneously emitted photon and the Rabi frequencies and phase shifts associated with the standing-wave fields. Our scheme may provide a promising way to achieve high-precision and high-resolution 2D atom localization.