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Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)

Molecular lithography - A quantum optical approach

Stefan Truppe, Thomas Juffmann, P. Geyer, A Major, Hendrik Ulbricht, Markus Arndt

Published Jun 1, 2009• 0 citations
Publisher

Abstract

A new detection method for molecular interferometry reveals the wave particle duality of large molecules in its clearest form and enables us to impress nanolitographic structures on a silicon surface. We discuss the deposition of a quantum interference pattern composed of individual high mass molecules on a silicon substrate.
DOI
10.1109/cleoe-eqec.2009.5192061

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